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1536 結果發現: 用 Reactors

  • NOVELLUS CONCEPT ONE

    NOVELLUS: CONCEPT ONE

    CVD System, 8" Process types: Undoped silane-base oxide Silicon nitride (2) Stages Transfer system: One arm robot Wafer on paddle sensor Cooling stage Software version: 4.431 RF Generator: ENI OEM 50, 13.56 MHz ENI PL-2HF, 400 kHz Match network: TRAZAR AMU2B-1 Match box Pressure control: TYLAN MDVHX-100B heated throttle valve with temperature controller TYLAN Throttle valve controller Independent gas cabinet Gas configuration: Mass flow controller: UNIT Gas types: N2, SiH4, C2F6, O2, NH3 Remote power AC box Currently warehoused 1991 vintage.
  • ASM POLYGON 8300  / EPSILON 3000

    ASM: POLYGON 8300 / EPSILON 3000

    EPI reactors, 12" One module, either Polysilicon or Nitride Various component pieces such as: Gas Modules, Beta Modules, and Power cabinets ~2004 vintage.
  • QUESTER / ALCANTECH APT 6000HP

    QUESTER / ALCANTECH: APT 6000HP

    System Includes: APT 4800 Quester/ASTEX Technology Ozone Analyzer (Qty 4) AX8200 Ozone Generators Does not include all cables / other items De-installed and wrapped 2001 vintage.
  • APPLIED MATERIALS P 5000

    APPLIED MATERIALS: P 5000

    Frame, as pictured Missing parts Stored in a cleanroom.
  • ULVAC: ENTRON T5

    Physical vapor deposition system.
  • APPLIED MATERIALS P 5000 MARK II

    APPLIED MATERIALS: P 5000 MARK II

    (3) Chamber hardware, 8" Nitride Configuration: Main body Cassette indexer, 8" Load lock: 8" Storage elevator (29) slots 8" Robot mechanism (missing blade assy 8") Slit door assy (3) units (A, B, C missing) Pumping port assy Missing: Interface B/D 0010-09006 VGA Video controller B/D 0190-70102 SBC B/D 0100-20001 Lift pin Process chamber: Susceptor nitride 8" (2) units (#Ch B, C susceptor missing) Lift hoop assy (3) units Susceptor lift assy (3) units Wafer lift assy (3) units (3) Process chamber body 8" RF Match assy (3) units Throttle valve assy dual spring (3) units (1ea fail) Gate valve assy (3) units (3ea fail) Lamp module (3) units (gold lamp module) Gas panel: (3) Gas line (3) chambers MFC: (2) UNIT UFC1660 (12) UNIT UFC8160 (1) UNIT UFC8161 (2) SAM SFC1480FPD (1) SAM SFC 1481FPD Remote AC rack (1 system): (3) HF generator OEM 12B Signal cable (3) RF coxial cable - APPLIED MATERIALS P 5000 : OK - SILANE OXIDE CVD : OK - STANDARD CVD CHAMBER : OK - VME: 21 SLOT : OK 1995 vintage.
  • AIXTRON AIX 2400 G2

    AIXTRON: AIX 2400 G2

    GaAr/InP Planetary reactor systems Set up to run Red LED's Configured for 8x3"(15x2") wafers Source configuration: TMGa-1, TMGa-2, TMAl-1, TMAl-2, TMIn-1, TMIn-2,Cp2Mg-1 Currently deinstalled 1998 vintage.
  • NIPPON SCIENTIFIC: PA103

    Decapsulation system Self-contained system performs the decapsulation of plastic mold IC packages. 120V, 60 Hz.
  • AIXTRON AIX 2400/2600 G3

    AIXTRON: AIX 2400/2600 G3

    MOCVD system LED Chip 2001 vintage.
  • ULVAC CERAUS ZX-1000

    ULVAC: CERAUS ZX-1000

    Metal PVD system, 8" Configured for: Al, Ti Not configured for: Mo (4) Process chambers: PVD Warehoused 2000 vintage.
  • ULVAC: EBX-10D

    Deposition system.
  • APPLIED MATERIALS: P 5000

    PCVD SiN System, 5" (2) Chambers Gases: CF4, O2, SiH4, NH3, N2 Currently warehoused.
  • APPLIED MATERIALS P 5000

    APPLIED MATERIALS: P 5000

    CVD system, 6" (2) Chambers Vacuum processing type Wafer type: Notch MFC: Gas #1: N2 1 slm Gas #2: C2F6 1 slm Gas #3: HE 1 slm Gas #4: N2 1 slm Gas #5: N2 1 slm Gas #6: N2 1 slm Gas #7: N2 3 slm Gas #8: HE 1 slm Gauge: MKS 122BA Baratron, 100 torr MKS 626A Baratron, 100 pa Includes: (2) AD Tec generators AX-1000 II (2) AMAT Matchers AC Rack Gas box (2) Chemical boxes DEFENSA UPS1010 Heat exchanger FUJI ELETRIC Transformer Main frame Currently stored in cleanroom 1991 vintage.
  • APPLIED MATERIALS: P 5000

    CVD System, 8" (3) Chambers: (2) SiO, (1) etch 1995 vintage.
  • APPLIED MATERIALS: CENTURA

    CVD systems, 8" DCVD (4) Chambers: ACL.
  • AIXTRON: CRIUS I

    31x2" GaN System (1) EpiTT Mikron M680 Thermal baths: (2) RM 25S and (6) RM 6S Source Configuration TMGa-1 TMGa-2 TMAl-1 Cp2Mg-1 Cp2Mg-2 TMIn-1 TMIn-2 TEGa-1 CBr4-1 DTBSi source lines 2008 vintage.
  • VARIAN: XM 90

    PVD system, 8" 4 to 8" wafer handling PC/PLC control system Turbo load lock CTI CT-8F cryo pump with compressor (3) Versamag target assemblies (3) A.E. MDX-5 DC P/S's ENI OEM-12 RF generator.
  • APPLIED MATERIALS: P 5000

    PECVD system Process: SiO4, SiN 1995 vintage.
  • APPLIED MATERIALS: P 5000

    PECVD system Process: SiO, SiN 1995 vintage.
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