二手 TEL / TOKYO ELECTRON Alpha 8SE #182012 待售
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ID: 182012
TEOS furnace, L-type
Medium temperature
General Configuration:
Safety Specification: TEL Standard
System Layout Type: 200mm configuration
System Paint Color: Biege white
Furnace Front Surface Finish: Painted / SS
Process Pressure (Torr): N/A
Process Temperature (ºC): 1000 (Max)
FTP Heater: Not Installed
Rapid Cooling Unit: Not Installed
Heater Type: Mid Temp VMM-40-101
Process Gasses:
Process Gas 1: N2 -
Process Gas 2: O2 -
Process Gas 3: ClF3
Process Gas 4: TEOS
Cleaning Gas 1: SETC-TEOS 200cc
Cleaning Gas 2: N/A
Gas Distribution System:
Basic Style: Integrated Gas System (Fujikin)
Tubing Material: Stainless Steel
Tubing Finish: Electro-polished
Tubing Bends: Mechanical Bends OK
Manual Valve: Fujikin
Air-Operated Valve: Fujikin
Filter: Millipore
Regulator: Fujikin
MFC: AERA
Press. Transducer: MKS/NAGANO KEIKI
Press. Transducer Display Reference: Compound
External Torch Unit: Std Flow Torch
Vaporizor: N/A
Liquid Source Auto-Refill: N/A
Auto-Refill Provided By: N/A
Auto-Refill Tubing Interconnect By: N/A
Auto-Refill Power Provided By: N/A
Gas System Schem. Dwg / Parts List: TEL Supplied
Panel Heater for Furnace Opening: N/A
Wafer/Cassette Handling:
Wafer Type: 200mm SEMI STD Notch
Wafer Notch / Flat Aligner: Installed
Cassette Type: Fluoroware KA200-80MHR
Cassette -Number of Wafers: 26
Cassette Storage Qty.: 21 or 16
Monitor Cassette Operation: IN In-batch/OUT In-batch
Cassette In-Out Sequence: In -P1,P2,..,M / Out -P1,P2,..,M
Transfer-stage Protrusion Sensor: Installed
Fork Type/Material: 1+4 / Al203
Fork -Wafer Presence Sensor: Installed
Fork -Wafer Position Sensor or Guide: Installed (Position Sensor)
Fork -Variable Pitch: Installed
Wafer Loading/Unloading Sequence: ED-->P-->M / M-->P-->ED
System Controls:
System Controller: Waves
Remote MMI and Gas Flowchart: FPD & GFC Installed
Signal Tower / Colors: Installed / 4-Color
Signal Tower Location(s): (Furnace Front)
Temperature Control:
Furnace Temperature Controller: M560A
Facility Elect. -Equip. Pwr Input( 2 line):
Voltage 3phase: 208VAC, 125A, 50Hz
Voltage 1phase: 100VAC, 50A, 50 Hz.
TEL/TOKYO ELECTRON ALPHA 8SE是一種用於生產外延離子植入晶片的擴散爐及輔助設備。該系統適用於中大規模生產用於制造計算機芯片等電子元件的半導體晶片。TEL ALPHA-8SE擴散爐的溫度範圍為400°C至1050°C,並裝有多個GaAs源。四個獨立調節的石英燈可在整個晶片表面提供穩態均勻加熱。此外,該單元還提供了專有的控制算法,允許用戶對石英燈的激活和停用序列進行編程。爐內設計為減少汙染,有陶瓷襯裏腔室和可拆卸的內熔殼襯裏,便於清洗。本機設有兩個同心鎖載室,方便安全地裝卸晶片。還包括一個自動卡帶到卡帶傳輸工具,以提高效率。這項資產還承認使用先進的光學識別模型來改進晶片的處理的形狀和大小不同的晶片的存在。TOKYO ELECTRON ALPHA-8 SE擴散爐設計具有自動關閉設備和接地故障電路中斷器等安全特性。該系統還具有編程的報警/記錄功能,可以提醒操作員當前和潛在的問題。其他功能如成熟的計算機接口和遠程操作也可用。總體而言,TOKYO ELECTRON ALPHA 8SE擴散爐及其附件是一種高效、準確的半導體晶圓生產應用解決方案。該機為外延離子植入晶片的高精度制造提供了安全可靠的環境。先進的控制工具和附件為操作員提供了提高晶圓產量的必要工具。
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