二手 DNS / DAINIPPON SK-2000 #118481 待售
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ID: 118481
晶圓大小: 8"
優質的: 2003
Spin coater / Developer DUV track system, 8"
Wafer flow direction: L-type
Wafer type: Notch
IF-B
Spinner unit configuration:
(2) Coaters
B-ARC (2) Coaters
(3) Developers
Indexer:
Left type
Wafers: SEMI Standard wafers / Notch type
Standard type
(4) Uni cassettes
Coater:
SC1 (Unit 3) & SC2 (Unit 4):
Includes:
Cups
EBR Function
Resist lines: 8 Line
Resist pump: PDS-105G-KPV4
Cup rinse function
Back side rinse
Cup rinse
Pot rinse
EBR (Edge bead removal)
Prewet function
SC3 (Unit 5) & SC4 (Unit 6):
Cups: 1
Includes:
EBR Function
Resist pump: PDS-105G-KPV4
Resist lines: 4 Line
Cup rinse function
Back side rinse
Cup rinse
Pot rinse
EBR (Edge bead removal)
Prewet function
Bake:
HP: (6) Units (8, 9, 11, 12, 17, 18)
RHP: (8) Units (25, 26, 28, 29, 31, 32, 35, 36)
CP: (7) Units (7, 10, 16, 24, 27, 30, 34)
AHL: (3) Units (13, 14, 15)
EEW: Unit (33)
Developer:
SC1 (Unit 3) & SC2 (Unit 4):
Cups
Developer number nozzle
DIW Rinse nozzle
Back side rinse line
Flow meters with sensor: DEV, DIW1, DIW2, Back-side rinse, ORG, FWD
Includes:
Dev1
Prewet
DIW1
Back side rinse
TR Includes:
TR1 Arm
TR2 Arm
TR3 Arm
Others:
Thermo controller model: CET-CU, Mass 7kg
THC Model: SPC-2313-UC-A
CP Controller model: FRD-A200-UC
HMDS Supply type: Quart bottle to buffer tank
Thinner supply type: Canister tank
Developer supply type: Facility supply
EEW:
Unit (33)
Lamp house type with lamp house
Miscellaneous:
Signal tower lamp: 3 Color (Red, orange, green)
Sub module configuration:
Source bottle cabinet
SC Cabinet
ETU Cabinet
Controller cabinet
IFB ACU Cabinet
Input power supply box
Main gas valve close
Gas (Air, N2) line purge
Chemical (Developer, DIW) line purge
Drain PCW end capping
Gas line (N2) end capping
Chemical (Developer, DIW) line end capping
Spin unit (Coater & developer) exhaust line caping
Bake unit exhaust line caping
Leak check
Main power: 3 Phase, 200 V, full load 20.44 kVA, 59A
50/60 Hz, 3 Wires and GND/PE
Rating 400A, AIC 65kA, motor 8A
2003 vintage.
DNS/DAINIPPON SK-2000是為處理微細圖案而開發的高性能光刻膠設備。該系統采用獨特、先進、精確的攝像機成像裝置,旨在提供完美的配準和曝光控制,並允許使用各種光阻材料。為了獲得最佳曝光和最大的靈活性,可以使用接觸和投影工具。先進的接觸曝光工具可產生極高質量的圖像配準,在整個光掩模表面提供完全均勻的曝光。投影曝光工具旨在通過應用高精度光學機器來減少精細設備的失真,最終提高曝光精度、線性度和屈服度。該工具還提供高級功能,如亞微米分辨率、0.15微米最小曝光均勻性和曝光穩定性控制功能。亞微米分辨率保證了極小的光刻特征能夠實現極好的精度和細節。曝光穩定性控制功能不僅允許精確調整曝光水平,還允許持續時間,這對於一致的結果至關重要。該資產擁有超高溫曝光的高速模式,提高了吞吐量,減少了工藝時間。該模型的另一個特點是它能夠從單個光源切換曝光波長,從而能夠對不同的曝光類型使用多種靈敏度。關於DNS SK2000光致抗蝕劑設備,該設計對溫度變化具有很強的魯棒性,顯著降低了顆粒,提高了整體暴露可靠性。總體而言,此系統為需要超精細圖案的光刻應用提供了最佳解決方案。
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