二手 AMAT / APPLIED MATERIALS Endura 5500 #190620 待售
看起來這件物品已經賣了。檢查下面的類似產品或與我們聯系,我們經驗豐富的團隊將為您找到它。
單擊可縮放
已售出
ID: 190620
晶圓大小: 8"
優質的: 1995
PVD Sputtering system, 8"
Chamber Type: 4 Chamber (1 Standard Body, 3 Wide Body), Pre-Clean 1 Type
Process: Al Cu, Ti, TiN
Wafer size: 8" / JMF
Configuration:
Chamber A: Pass through
Chamber B: Cool down
Chamber D: Preclean I
Chamber F: Orienter degas
Chamber 1: ALCu (clamp)
Chamber 2: TiN (101)
Chamber 3: Ti (101)
Chamber 4: Ti (clamp)
Robot:
Buffer: HP
Transfer: HP
Load Lock:
Narrow body with tilts in/out
No sliding sensor kit
Chamber A:
Type: pass through
Lid: metal
Cooling method: N/A
Chamber B:
Type: cool down
Lid: metal
Cooling method: by PCW / by gas
Chamber D:
Type: Preclean I
Process: oxide etch
RF Gen/DC power supply 1: CPS-1001
RF Gen/DC power supply 2: N/A
Leybold 361C: Turbo/Cryo pump Type
Chamber 1:
Type: standard body
Process: Al Cu, 0010-20225
RF Gen/DC power supply 1: AE MDX-L12M (Master)
RF Gen/DC power supply 2: AE MDX-L12 (Slave)
RF Gen/DC power supply 3: N/A
Turbo/Cryo pump Type: Cryo Pump, 3 phase
Gate valve type: 2-position
Pedestal type: Clamp (4F)
Process Gas:
Ar STEC 100 N2 100sccm
Ar-HTR STEC 100 N2 100sccm
Chamber 2:
Type: wide body
Process: TiN, 0010-20223 B+
RF Gen/DC power supply 1: AE MDX-L12
RF Gen/DC power supply 2: N/A
RF Gen/DC power supply 3: N/A
Turbo/Cryo pump Type: Cryo Pump, 3 phase
Gate valve: 3-position
Pedestal type: 101
Process Gas:
N2 STEC 200 N2 200sccm
Ar STEC 100 N2 100sccm
Chamber 3:
Type: wide body
Process: Ti, 0010-20223 B+
RF Gen/DC power supply 1: AE MDX-L12
RF Gen/DC power supply 2: N/A
RF Gen/DC power supply 3: N/A
Turbo/Cryo pump Type: Cryo Pump, 3 phase
Gate valve: 3-position
Pedestal type: 101
Process Gas:
N2 STEC 200 N2 200sccm
Ar STEC 100 N2 100sccm
Chamber 4:
Type: wide body
Process: Ti, 0010-20223 B+
RF Gen/DC power supply 1: AE MDX-L12
RF Gen/DC power supply 2: N/A
RF Gen/DC power supply 3: N/A
Turbo/Cryo pump Type: Cryo Pump, 3 phase
Gate valve type: 3-position
Pedestal type: clamp (4F)
Process gas:
N2 STEC 200 N2 200sccm
Ar STEC 100 N2 100sccm
Ar-HTR STEC 100 N2 100sccm
Heat exchanger: Neslab Type II
Compressor type: CTI 8500, CTI 9600
SBC type in controller: V21
Ion gauge type: nude
Main AC box: 220VAC, 3 Phase, 60Hz
System Monitor:
1st Monitor: stand alone
2nd Monitor: through the wall
3rd Monitor: -
Installed
1995 vintage.
AKT AMAT/APPLIED MATERIALS/AKT Endura 5500反應堆是一種先進的熱處理設備，設計用於高效燒結陶瓷電容器。該系統具有優化的熱工藝控制能力，保證了陶瓷材料的均勻重復加熱，在廣泛的工藝範圍內提供了更好的溫度控制。AKT Endura 5500還提供了高吞吐率和全面的汙染預防功能,可用於可靠且可重復的燒結過程。AMAT ENDURA 5500具有低壓、反應性氣體的最佳燒結環境.一個獨立的調制控制允許最大程度的靈活性，個別工藝參數。多區低壓加熱工藝室隔熱良好，可用於快速加熱和冷卻工件。APPLIED MATERIALS ENDURA 5500還允許修改周期時間以滿足特定要求。該單元配備了先進的過程監控功能，可用於優化機器性能。這些功能包括主動區域控制、溫度均勻性、故障恢復、過溫保護、熱失控保護、壓力監控、循環終止和剖面監控。這有助於用戶最大限度地提高燒結循環精度，以獲得更好的質量和可重復的結果。Endura 5500還具有自動晶圓映射和跟蹤功能,可在燒結過程中完全追溯。為了滿足最高的可靠性要求,該工具旨在支持過程清潔以防止汙染,並且符合行業標準。AMAT/APPLIED MATERIALS/AKT ENDURA 5500是專門為陶瓷電容器燒結而設計的先進可靠的反應器。該資產通過主動區域控制、溫度均勻性、故障恢復、過溫保護和壓力監控提供了增強的過程控制,以獲得更好的可重復結果。它還具有自動晶圓映射和跟蹤功能,以實現可追蹤性。該模型旨在防止汙染，符合行業標準，是陶瓷電容器燒結的理想選擇。
還沒有評論