二手 KOKUSAI Quixace II NITRIDE #9182061 待售
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ID: 9182061
晶圓大小: 12"
優質的: 2007
Vertical LPCVD furnace, 12"
Cartridge heater
Heater control
Over-temperature
Thyristor unit for control
I/O Shutter stage: AGV / PGV / OHT Stage
FOUP Loader
Rotation FOUP storage
FOUP Opener
Wafer detection
Wafer transfer
Variable wafer pitch converter
Boat elevator
Boat changer
Furnace port shutter
Boat rotation
AWTC Port
Flange-upper
Flange-lower
Quartz boat
Quartz outer tube
Quartz inner tube
Quartz adiabatic plate
Quartz boat fixing ring
Quartz nozzle 1: D4CN55589
Quartz nozzle 2: D4KN31319#D
Quartz boat fixing ring
Quartz boat
Quartz outer tube
Quartz inner tube
Quartz adiabatic plate
Quartz nozzle 1: D4CN55589
Quartz nozzle 2: D4KN31319#D
Quartz nozzle 3: D5CP15682
Quartz nozzle 4: D5CP15683
Quartz nozzle 5: D5CP15684
Quartz boat fixing ring
SiC Boat
Quartz outer tube
SiC inner tube
SiC adiabatic plate
Quartz nozzle 1
Quartz nozzle 2
Quartz boat fixing ring
Gas unit (IGS): D4VX38302
Tape heater:
Gas pipe 1: D4EX19130
Gas pipe 2: D4EX19131
Diffuser: D4CX33281
Mass flow controller: FC-PA785T-BW-TC Series
Filter: WGSLS Series
Regulator: PGM Series
Pressure gauge: ZT16-S01
Hand valve: MMGD5-11D-W Series
Check valve 1: MCGP5-F1X1 Series
Needle valve: MMGD5-11D-W Series
Air valve: MAGD5 Series
Connection & fittings: VCR / UPG / SWG
MFC 1: NH3, 0.5SLM
MFC 2: N2, 30SLM
MFC 3: SiH2Cl2, 0.2SLM
MFC 4: SiH2Cl2, 0.2SLM
MFC 5: SiH2Cl2, 0.2SLM
MFC 6: SiH2Cl2, 0.2SLM
MFC 7: NH3, 2SLM
MFC 8: NH3, 0.5SLM
MFC 9: NH3, 0.3SLM
MFC 10: NH3, 0.3SLM
MFC 11: NH3, 0.3SLM
MFC 12: NF3, 1SLM
Vacuum sensor (VG11): 1000 Torr
Vacuum sensor (VG12)
Vacuum sensor (VG13): 2 Torr
Vacuum sensor monitor
Main valve: VEC-SHA8-X0327
Exhaust piping: D4CX38671
Exhaust dilution line: D4CX38671
Reactor tube press leak line: D4CX38671
Jacket heater: 150° C
Exhaust pipe: 150° C
Process effluent trap: MKS
Baratron vacuum calibration port
Inlet flange heater: ESH-12964-01
(2) Injector port heaters:
ESH-12965-01
ESH-12966-01
Seal cap heater: ESH-12450-02
O2 Monitor / Detector
FOUP Opener system
N2 Purge system
Load area MFC
Loading area
Furnace port
Radiator
Filters:
Carbon / Chemical 1 filters
Carbon / Chemical 2 filters
Carbon / Chemical 3 filters
Main operation controller: SW Rev 01.05.05
EDA Controller: SW Rev 01.00.02
DDC Temperature controller: SW Rev 06.00.00
Process module controller: SW Rev 01.05.05
Wafer handling controller: SW Rev 02.04.06
(2) FOUP I/O
FOUP RFID Reader
Wafer mapping sensor: F3M-S1225
FOUP Sensor: E3T-ST11
SECS/GEM Communication: SW Rev 06.01.02
Includes:
Hazardous gases
Manual
Shut off valve
Lock out / Tag out
Electrical: Lock out / Tag out
Robot: Lock out / Tag out.
KOKUSAI Quixace II NITRIDE是專為氮化物加工而設計的擴散爐。它是在基板上沈積氮化物層以及各種金屬和其他材料的有效和可靠的工具。它的高級設計和模塊化結構為用戶的生產過程提供了更大的靈活性。該爐先進的氮氣註入設備確保所有氮化物過程在必要的受控環境下進行。該系統是可調的,可以根據每種基材的特定工藝要求量身定制,從而產生卓越的氮化物質量和可靠性。該裝置還提供精確的擴散溫度和時間控制,使得可重復和一致的結果。爐子的高性能得到了各種通用配件的進一步補充。其中有一臺用於更快工藝初創企業的快速降泵機、一個用於高溫退火的加權箱室和一個便於快速冷卻的蓋箱爐。所包括的自動氣體控制工具為用戶提供了為氮化物工藝預處理多種氣體的能力。Quixace II NITRIDE還具有一系列安全功能,可幫助維護安全環境。其中包括多點報警資產、互鎖診斷模型和過程監控設備。所有這些系統確保用戶在沈積過程中能夠保持對爐子的完全控制。KOKUSAI Quixace II NITRIDE擴散爐是一種先進可靠的氮化物加工工具以及一系列其他材料。其氮氣噴射控制系統、種類繁多的配件和方便用戶的操作,使其成為同類最高效可靠的擴散爐之一。結合其可用的安全功能,它是廣泛工業應用的完美工具。
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