二手 KOKUSAI Quixace II NITRIDE #9182061 待售

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ID: 9182061
晶圓大小: 12"
優質的: 2007
Vertical LPCVD furnace, 12" Cartridge heater Heater control Over-temperature Thyristor unit for control I/O Shutter stage: AGV / PGV / OHT Stage FOUP Loader Rotation FOUP storage FOUP Opener Wafer detection Wafer transfer Variable wafer pitch converter Boat elevator Boat changer Furnace port shutter Boat rotation AWTC Port Flange-upper Flange-lower Quartz boat Quartz outer tube Quartz inner tube Quartz adiabatic plate Quartz boat fixing ring Quartz nozzle 1: D4CN55589 Quartz nozzle 2: D4KN31319#D Quartz boat fixing ring Quartz boat Quartz outer tube Quartz inner tube Quartz adiabatic plate Quartz nozzle 1: D4CN55589 Quartz nozzle 2: D4KN31319#D Quartz nozzle 3: D5CP15682 Quartz nozzle 4: D5CP15683 Quartz nozzle 5: D5CP15684 Quartz boat fixing ring SiC Boat Quartz outer tube SiC inner tube SiC adiabatic plate Quartz nozzle 1 Quartz nozzle 2 Quartz boat fixing ring Gas unit (IGS): D4VX38302 Tape heater: Gas pipe 1: D4EX19130 Gas pipe 2: D4EX19131 Diffuser: D4CX33281 Mass flow controller: FC-PA785T-BW-TC Series Filter: WGSLS Series Regulator: PGM Series Pressure gauge: ZT16-S01 Hand valve: MMGD5-11D-W Series Check valve 1: MCGP5-F1X1 Series Needle valve: MMGD5-11D-W Series Air valve: MAGD5 Series Connection & fittings: VCR / UPG / SWG MFC 1: NH3, 0.5SLM MFC 2: N2, 30SLM MFC 3: SiH2Cl2, 0.2SLM MFC 4: SiH2Cl2, 0.2SLM MFC 5: SiH2Cl2, 0.2SLM MFC 6: SiH2Cl2, 0.2SLM MFC 7: NH3, 2SLM MFC 8: NH3, 0.5SLM MFC 9: NH3, 0.3SLM MFC 10: NH3, 0.3SLM MFC 11: NH3, 0.3SLM MFC 12: NF3, 1SLM Vacuum sensor (VG11): 1000 Torr Vacuum sensor (VG12) Vacuum sensor (VG13): 2 Torr Vacuum sensor monitor Main valve: VEC-SHA8-X0327 Exhaust piping: D4CX38671 Exhaust dilution line: D4CX38671 Reactor tube press leak line: D4CX38671 Jacket heater: 150° C Exhaust pipe: 150° C Process effluent trap: MKS Baratron vacuum calibration port Inlet flange heater: ESH-12964-01 (2) Injector port heaters: ESH-12965-01 ESH-12966-01 Seal cap heater: ESH-12450-02 O2 Monitor / Detector FOUP Opener system N2 Purge system Load area MFC Loading area Furnace port Radiator Filters: Carbon / Chemical 1 filters Carbon / Chemical 2 filters Carbon / Chemical 3 filters Main operation controller: SW Rev 01.05.05 EDA Controller: SW Rev 01.00.02 DDC Temperature controller: SW Rev 06.00.00 Process module controller: SW Rev 01.05.05 Wafer handling controller: SW Rev 02.04.06 (2) FOUP I/O FOUP RFID Reader Wafer mapping sensor: F3M-S1225 FOUP Sensor: E3T-ST11 SECS/GEM Communication: SW Rev 06.01.02 Includes: Hazardous gases Manual Shut off valve Lock out / Tag out Electrical: Lock out / Tag out Robot: Lock out / Tag out.
KOKUSAI Quixace II NITRIDE是專為氮化物加工而設計的擴散爐。它是在基板上沈積氮化物層以及各種金屬和其他材料的有效和可靠的工具。它的高級設計和模塊化結構為用戶的生產過程提供了更大的靈活性。該爐先進的氮氣註入設備確保所有氮化物過程在必要的受控環境下進行。該系統是可調的,可以根據每種基材的特定工藝要求量身定制,從而產生卓越的氮化物質量和可靠性。該裝置還提供精確的擴散溫度和時間控制,使得可重復和一致的結果。爐子的高性能得到了各種通用配件的進一步補充。其中有一臺用於更快工藝初創企業的快速降泵機、一個用於高溫退火的加權箱室和一個便於快速冷卻的蓋箱爐。所包括的自動氣體控制工具為用戶提供了為氮化物工藝預處理多種氣體的能力。Quixace II NITRIDE還具有一系列安全功能,可幫助維護安全環境。其中包括多點報警資產、互鎖診斷模型和過程監控設備。所有這些系統確保用戶在沈積過程中能夠保持對爐子的完全控制。KOKUSAI Quixace II NITRIDE擴散爐是一種先進可靠的氮化物加工工具以及一系列其他材料。其氮氣噴射控制系統、種類繁多的配件和方便用戶的操作,使其成為同類最高效可靠的擴散爐之一。結合其可用的安全功能,它是廣泛工業應用的完美工具。
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