二手 TEL / TOKYO ELECTRON Alpha 303i #9357815 待售
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ID: 9357815
晶圓大小: 12"
LP P-Doped poly furnace, 12"
Process: D-Poly-small flow
Boat operation: (2) Boats
ASYST / ATR9100
Furnace unit:
Heater type: VMM-56-002 5 zones / 500°C -1000°C
T/C For over temperature protection: Kit, chamber O.H.SNSR
Temperature controller: MA901-8FK09-Z250A
Wafer / Carrier handing:
Wafer type: Semi standard notch, 12"
Carrier type: FOUP / 25-Slots
(16) Carrier storages
Fork type / material: 1+4 / Al203
W/T Wafer I/F speed (U/D)
Wafer loading / Unloading sequence: ED => P => M / M => P => ED
Boat / Pedestal:
Production wafers: (100) Wafers
Boat material: SiC with CVD-coat
Boat type: (117) Slots ladder, 8mm
Boat rotation
Pedestal type: Quartz
Process tube:
Quartz outer and inner tube
Inner type: Straight
Internal T/C type
Outer tube interior wall type
Tube sealing: O-Ring seal
Fab constraint:
Waves system controller
Front operation panel
Front MMI and gas flow chart: MMI and GFC
General pressure display unit: Pressure-Mpa / Vac-Torr
Gas cabinet exhaust display unit: SI (Pa)
Furnace temperature controller: M560A
Vacuum system:
Main valve: CKD VEC
Vacuum exhaust system
Vacuum pressure controller: CKD VEC
Vacuum gage:
Pressure control: MKS Capacitance manometer
Press monitor: MKS Capacitance manometer (133 kPa)
Pump monitor: MKS Capacitance manometer
Gas distribution system:
Basic style: Integrated gas system
Tubing: Stainless steel / Electrical-polish (STD)
FUIJKIN Manual valve
FUIJKIN Air-operated valve
MYKROLIS Filter
VERIFLO Regulator
Soft backfill injector
MFC:
SiH4: 3 SLM
PH3: 500 SCCM
PH3: 50 SCCM
PH3: 30 SCCM
ClF3: 5 SLM
N2: 3 SLM
(4) N2: 5 SLM
Process pressure: 73 Pa, 133 Pa
Process temperature: 510°C, 525°C, 530°C.
TEL/TOKYO ELECTRON ALPHA 303i是設計用於IC相關生產的高性能擴散爐設備。它配備了先進的加熱系統，可以更快、更一致的結果。該爐由硬質和厚厚的不銹鋼構成，以確保長期的可靠性和準確性。它包括一個能夠以極高的速率將樣品放入爐中的自動化樣品轉移單元。在性能方面,TEL ALPHA-303I能夠在幾分鐘內執行高達900°C的快速加熱時間。它配備了創新的溫度控制機，確保在整個加熱過程中溫度極為均勻。即使在使用非常大的基板時，該工具也能保持一致的溫度而沒有任何差異。此外，TOKYO ELECTRON ALPHA-303 I還配備了先進的電子功率控制資產，可降低功耗並提供高質量的溫度控制。TEL/TOKYO ELECTRON ALPHA-303 I包含多種附加功能以改善其性能。它有一個集成的化學氣相沈積（CVD）模塊，能夠對電基板進行量身定制的摻雜，使其成為IC相關生產的理想選擇。除此之外，它還包括石英船、陶瓷蓋、鐘形罐等多種配件。這些附加組件通過改善熱量分配進一步提高了設備的性能。總體而言，TEL ALPHA-303 I是為IC相關生產而設計的高性能擴散爐模型。它由不銹鋼制成，以保證壽命和準確性。它還配備了包括自動化樣品傳輸設備、快速加熱時間、溫度控制系統、CVD模塊等多種功能。此外，它還包括各種配件，可以進一步提升其性能。
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