二手 ALCATEL / ADIXEN / PFEIFFER 601E I-Speeder #165552 待售
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ID: 165552
晶圓大小: 6"
優質的: 2001
Silicon etcher, 6"
Wafer size: 6", converted from 4"
Semco ESC
Genmark 4 robot with wafer aligner
4” single wafer vacuum loadlock assembly
Chuck table with controlled-temperature from –30°C~ +60°C
Substrate holder: 4” wafer electrostatic clamping system with center kit
Low-pressure plasma source with laser view port adaptor on top of the source
System control and monitoring with PLC & PC, Windows NT & Alcatel GUI
UPS power for PLC control
Operates the machine in manual, semi-automatic, or fully-automatic modes
Chamber primary pump: ADP122
Cold trap with heated pump line
Maglev turbomolecular pump: ATH 1300M
DN 200 heated throttle & isolation valve VAT series 64 + By-pass + line with controller
Loadlock dry pump ACP28
Loadlock molecular pump MDP 5011
Lauda Chiller RK8CP
Power transformer: input AC200-220V, output AC400V
Baratron 100Pa
Source power supply: 2kW RF with RF20S generator controller
Bias power supply: 500W with RF5S generator controller
Robot loading version
User’s manual on CD ROM and PC HD
Electrical schematics on cleanroom paper
Telediagnostic (modem+software)
Process Module:
Room (Bosch) temperature process. (including Bosch patent)
Substrate holder electrostatic clamping system
Wafer centering kit 100mm
Source: 2kW RF
Bias: 0.5kW RF
Heated process chamber walls
Laser view port adapter on top of the source
Reactor Pumping:
Alcatel ADP 122
Maglev turbomolecular pump ATH 1300M
DN200 heated throttle & isolation valve VAT series 64 + by-pass
Completed pumping line is heated, while a coldtrap is installed before the dry pump
Gas lines:
4 UNIT mfc’s, type 1 gas lines, installed in the main frame of the A601E
SF6-500 sccm, C4F8 – 200400 sccm, O2 –20 sccm, O2-200 sccm
oad/Unload Module:
Robot loading
Optical fiber for wafer localization
Ferrofluidics feedthrough on transfer arm
Molecular drag pump MDP 5011
Mechanical pump needed
Control Module:
PLC & PC
Windows NT & Alcatel GUI
Telediagnostic(modem & software)
Substrate holder:
Electrostatic clamping system version
Additional spare electrostatic ceramic (4”): yes, but used
Pumping station:
ADP122 and ACP28 dry pumps pack for process chamber and loadlock
Gas lines:
Gas cabinet for 6 gas lines
Different UNIT MFC’s flow range/standard
Transfer module and loadlock
GENMARK cassette loading robot
Flat finder/aligner
Documentation:
Hard copy of the user manual
Documentation set on cleanroom paper
CD-ROM with User manual
Normal Paper: manuals of all sub-units
Cleanroom Paper: Electrical diagrams
Additional Parts:
Cryo kit for Bosch and Cryo process
Electrostatic Chuck 6” wafer size kit for manual or robot loading version
Tool has been mainly used for R&D purposes
Modifications:
RK8CP chiller
Upgrade of Maglev ATH 1300 to ATH 1600 turbomolecular pump
Upgrade of ACP20 to ACP28 dry pump
51 foot pump cable
Light tower
Upgrade of 2 kW RFPP generator to ENI 3 kW RF generator
UNIT MFC: SF6 / 1000 sccm UFC 180
SECS II protocol
Software upgrade (PC and pLC)
2001 vintage.
ALCATEL/ADIXEN/PFEIFFER 601E I-Speeder是為半導體和微電子應用而設計的高性能蝕刻器和asher。該設備的設計可提供卓越的性能和最佳的吞吐量(特征尺寸可低至2.5µm,工藝包括蝕刻、粘合、清潔和拆卸。I-Speeder配備了可靠的雙梁系統,在整個工件上提供精確的精度和均勻性。它的流體電阻率和靈活性,以適應多個過程使它成為一個通用的工具,大多數半導體的需求。I-Speeder利用先進真空技術的專門單元,實現了優越的蝕刻速率、更低的顆粒計數和減少的氧化物汙染。該單元采用雙循環控制器,可精確調整工藝參數。獨特的組合等離子體錐機和專利陶瓷磁場線圈有助於保護工件,同時確保卓越的蝕刻效果。I-Speeder總共配備了八個預先安裝的自動化流程,提供了一致的結果,減少了操作員培訓和設置時間。這一功能強大的單元旨在允許安裝第三方硬件和軟件,而無需額外的硬件。此外,它還自動記錄詳細的過程參數,從而使跟蹤蝕刻過程變得簡單。I-Speeder是一個全面的蝕刻器和asher解決方案,具有多種功能和優點。它提供了一個強大、高效、可靠的過程,導致優越的微型化成型和優越的控制。通用工具非常適合大多數半導體蝕刻要求,並提供卓越的性能,其功能尺寸可降低到2.5 μ m,處理時間更快。此外,該部門還得到ADIXEN和ALCATEL的支持,提供卓越的客戶服務和技術支持。
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