二手 LAM RESEARCH 2300 Kiyo #174756 待售
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ID: 174756
晶圓大小: 12"
優質的: 2006
Metal dry etch system, 12"
Type of Loadport: SMIF
Number of Process Chamber: (2) Metal Etch & (2) MWAVE STRPR
Configuration of SMIF:
Signal Tower: 3-colors
Number of Loadport: 3
Parts No. of Loadport: 799-901175-004
Number of ATM Robot: 1
Parts No. of ATM Robot: 121668
Buffer Station: 25 slots, 2 Buffer Station
Aligner: 1 Aligner
Configuration of Transfer Chamber
Number of Loadlock: 2 LL / 4 Slot Cool Chamber
Model of Transfer Robot: Magnatran7 / Borrks
Parts No. of Lock Valve: 853-007859-005 / 4ea
TM Pressure Gauge: HPS Series907 / MKS
TM Pressure Control: MKS Series640
LL Pressure Gauge: HASTING
Configuration of Etch Chamber:
PM2:
Model of Chamber: 2300 Metal
Year of Construction: 2005
Model of Pressure Gauge: MKS, 0.1Torr
Model of Throttle Gate Valve: 65048-PH52-ADR1 VAT
Model of Turbo Pump: ATH2300M Alcatel
Model of TCP RF Generator: RFG / AE
Model of Bias RF Generator: APEX1513 / AE
Configuration of Etch Chamber:
PM3:
Model of Chamber: 2300 Metal
Year of Construction: 2005
Model of Pressure Gauge: MKS, 0.1Torr
Model of Throttle Gate Valve: 65048-PH52-ADR1 VAT
Model of Turbo Pump: ATH2300M Alcatel
Model of TCP RF Generator: RFG / AE
Model of Bias RF Generator: APEX1513 / AE
Configuration of MW Chamber:
PM1:
Model of Chamber: 2300 MWAVE STRPR
Year of Construction: 04-2006
Model of Pressure Gauge: MKS, Dual range
Model of Throttle Gate Valve: MKA, 253B-24836
Model of Vaporizer: MKS, WODMB-23398
Model of MW Generator: ASTEX, FI120160-3
Configuration of MFC: O2 5slm, N2 1slm
Configuration of MW Chamber:
PM4:
Model of Chamber: 2300 MWAVE STRPR
Year of Construction: 04-2006
Model of Pressure Gauge: MKS, Dual range
Model of Throttle Gate Valve: MKA, 253B-24836
Model of Vaporizer: MKS, WODMB-23398
Model of MW Generator: ASTEX, FI120160-3
Configuration of MFC: O2 5slm, N2 1slm
Configuration of Gas Panel, Etch Chamber:
Type of Gas Panel: IGS Bolck Type
No of Gas Channel: 8 Channel
Model of MFC: UFG8561
PM2:
BCL3 300sccm
N2 50sccm
Ar 500sccm
O2 1slm
CH4 50sccm
SF6 200sccm
Cl2 300sccm
CHF3 50sccm
PM3:
BCL3 301sccm
N2 51sccm
Ar 501sccm
O2 2slm
CH4 51sccm
SF6 201sccm
Cl2 301sccm
CHF3 51sccm
Gas Box 1.25C Seal Type
TMP Axiden ATH2300M
Micro Wave Power Gen MKS FI20160-3
RF Generator AE APEX-1513 and AE RFDS-1213
Chiller Unisem RCS 2500A
Power: 208VAC 3ph 4Wires 400AMPS 50/60Hz
2006 vintage.
LAM RESEARCH 2300 Kiyo是一款革命性的蝕刻/asher設備,專為精度、可靠性和靈活性而設計。此高級蝕刻器/asher系統旨在支持各種大小和配置的設備。其架構允許在蝕刻和粉刷各種基材時進行精確的過程控制和可重復性。2300 Kiyo單元使用智能算法計算每種基材類型的最佳蝕刻和灰化參數,保證每次結果一致。它被設計為進行化學機械平面化(CMP)、化學機械拋光(CMP)、化學蝕刻(ISO蝕刻)、深反應性離子蝕刻(DRIE)和反應性離子蝕刻(RIE)工藝。此外,該機還能夠進行精密的背面清潔.LAM RESEARCH 2300 Kiyo工具配備了氣流分析能力、壓力範圍溫度控制、敏感器調諧、基板溫度控制模式等多項先進功能。這些功能允許操作員自定義和調整資產以獲得所需的蝕刻和灰化結果。此外,利用綜合智能流程控制,該模型可以自動跟蹤和調整相關流程參數,最終產生可重復的結果。2300 Kiyo設備還配備了直觀的軟件,便於系統控制和數據收集。該單元的GUI和軟件為用戶提供了完整的蝕刻和灰化環境,從而實現了可重現和可靠的流程性能。該機器還允許用戶通過直接、多站點連接實時監控和分析流程數據,使用戶能夠快速做出知情決策。總體而言,LAM RESEARCH 2300 Kiyo 蝕刻器/asher工具為各種基材的蝕刻和灰化提供了無與倫比的可靠性和性能。其先進的功能和直觀的軟件提供了簡單高效的用戶體驗,讓用戶每次都能獲得可重復、一致的結果。2300 Kiyo資產結合了這些特性和功能,為半導體器件制造提供了全面的蝕刻和灰化解決方案。
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