二手 LAM RESEARCH 2300 Versys Kiyo #9301851 待售
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ID: 9301851
晶圓大小: 12"
優質的: 2016
Etcher, 12"
Seismic brackets system
SEMI Wafer
Cassette type: 25-Slots
Gas system type: IGS Gas box
Mylar floor template
Manuals electronic CD-ROM
Positions:
Position 1: 2300 Microwave strip
Position 2 and 3: 2300 Versys Kiyo
Non-standard systems:
NSR300156 Kiyo
NSR301982 RMV Kiyo PM Position-4
Process modules:
(2) Quick clean kits for 2300 Versys Kiyo
(1) Quick clean kit for 2300 MW Strip
Options:
Standard chamber pinnacle (-814)
Tunable ESC Wafer clamping mechanism
Standard fingers RF Ground bracket (-006)
Quartz edge ring
Standard Quartz tunable injector
Standard injector shield
Standard plasma screen (-032)
Gas weldment: Enhanced passivated (-110)
Standard ESC Hose kit
Compression ESC Facility plate
Liner: ACME Coated universal (-838)
Standard chamber manometer
Wafer lift mechanism: Direct drive
Voltage control interface: 800 V
O-rings: Chemraz
Standard TCP Coil
TCP Source dual: 1500 W
300MM Turbo pump: 2200 L/S BOCE (Seiko Seiki)
Heated foreline
Endpoint detection: 2300 LSR with OES 2
Standard chamber viewport window
Chamber isolation valve: Barrier seal door
Viton vacuum valve
Lower isolation valve: Chemraz dry (-006)
Water control passive:
RF PCW Control
Pump to TCU: 25ft
TCU to PM: 50ft
PM to Pump interconnect: 50ft
TCU to RPDB: 25ft
Pump to RPDB: 25ft
Microwave strip options:
O-rings: Fluorosilicon / TEV
Microwave source: Quartz
Baffle: Quartz
Leak check port
Chamber isolation valve: Barrier seal door
Throttle valve (-003)
2-Line on-board gas delivery
PM to Pump interconnect: 50ft
Pump to RPDB: 25ft
Gas box:
Standard gas containment
Top exhaust gas system
Gas box:
Advanced chamber condition control
MFC Type: STEC SEC-Z313
No display in transducer
(16) Gas lines
Heated gas lines: Position 1 and 2
Gas box inlet option: Regulated inlet gas panel
Standard gas filter
Non-standard PM/GB Feature:
(2) FUJIKIN NSR 301983 MFC on PM4 IGSGB <PM4>
Line6 : FUJIKIN FCST1005NZFC_4J2, SO2 at 200sccm
Line16 : FUJIKIN FCST1005NZFC_4J2, Ar at 500sccm
2300 Platform
Standard front fascia
Front end load port cassette: (3) FOUPs
Cassette ID: Keyence BCR Carrier ID
Factory automation: OHT PIO Sensor
Airlock wafer fingers: Stainless wafer pads
EPX Backing pumps for TM
Control rack configuration:
Side monitor user interface
Earth Leakage Breaker (ELB)
RPDB
Interconnect cables: TM to RPDB, 50ft
Signal tower
System options:
System calibration and alignment
Service step for PM
Robot CDM
Non-Standard TM Feature:
NSR6975 Facility IF board kit and SW Key
NSR101080 Vespel endeffector on V2 TM
Gas box configuration:
PM2:
Line / MFC Type / Gas type / Gas Flow
Line 01 / SZ313 / SICL4 / 50
Line 03 / SZ313 / NF3 / 500
Line 04 / SZ313 / CL2 / 200
Line 05 / SZ313 / HBr / 500
Line 06 / SZ313 / SO2 / 200
Line 07 / SZ313 / CH2F2 / 200
Line 09 / SZ313 / O2 / 10
Line 10 / SZ313 / SF6 / 50
Line 11 / SZ313 / O2 / 500
Line 12 / SZ313 / N2 / 100
Line 13 / SZ313 / CF4 / 200
Line 14 / SZ313 / CHF3 / 300
Line 15 / SZ313 / He / 500
Line 16 / SZ313 / Ar / 500
PM3:
Line / MFC Type / Gas type / Gas Flow
Line 01 / SZ313 / SICL4 / 50
Line 03 / SZ313 / NF3 / 500
Line 04 / SZ313 / CL2 / 200
Line 05 / SZ313 / HBr / 500
Line 06 / SZ313 / SO2 / 200
Line 07 / SZ313 / CH2F2 / 200
Line 09 / SZ313 / O2 / 10
Line 10 / SZ313 / SF6 / 50
Line 11 / SZ313 / O2 / 500
Line 12 / SZ313 / N2 / 100
Line 13 / SZ313 / CF4 / 200
Line 14 / SZ313 / CHF3 / 300
Line 15 / SZ313 / He / 500
Line 16 / SZ313 / Ar / 500
PM4:
Line / MFC Type / Gas type / Gas flow
Line 01 / SZ313 / SICL4 / 50
Line 03 / SZ313 / NF3 / 500
Line 04 / SZ313 / CL2 / 200
Line 05 / SZ313 / HBr / 500
Line 06 / SZ313 / SO2 / 200
Line 07 / SZ313 / CH2F2 / 200
Line 09 / SZ313 / O2 / 10
Line 10 / SZ313 / SF6 / 50
Line 11 / SZ313 / O2 / 500
Line 12 / SZ313 / N2 / 100
Line 13 / SZ313 / CF4 / 200
Line 14 / SZ313 / CHF3 / 300
Line 15 / SZ313 / He / 500
Line 16 / SZ313 / Ar / 500
2016 vintage.
LAM RESEARCH 2300 Versys Kiyo是一款用途廣泛、高效的蝕刻設備,專為矽單晶薄膜沈積、先進光刻、表面劃痕修復等應用而設計。該系統是一種高端蝕刻器/asher,配備了等離子體蝕刻、幹氧化物沈積、蝕刻、抗沈積等先進技術。2300 Versys Kiyo具有20kHz的等離子體輸入頻率,以及用於可靠蝕刻過程的各種工藝氣體。它是一個全自動的機器,照顧整個過程,從加載晶圓到卸載結果。為確保準確和可重復的結果,蝕刻器具有自動晶圓處理單元和內置真空室。LAM RESEARCH 2300 Versys Kiyo還采用了最新的原位成像和先進的工藝控制功能,允許用戶監控流程並即時進行快速更改。為確保一致、高精度的結果,該機配備了6軸傾斜和2軸偏航定位器。它還提供了一個可選的室內離子源,用於使用受控大氣工藝進行蝕刻。2300 Versys Kiyo具有先進的功能和耐用可靠的結構,是各種要求苛刻的蝕刻和灰化應用的絕佳選擇。該工具經認證符合嚴格的安全標準,並配備了在蝕刻過程中提供額外一層保護的故障安全資產。此外,LAM RESEARCH 2300 Versys Kiyo的效率高,周轉速度快,非常適合產品設計的快速原型設計和快速開發。
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