二手 LAM RESEARCH 2300 Versys Kiyo #9301851 待售

ID: 9301851
晶圓大小: 12"
優質的: 2016
Etcher, 12" Seismic brackets system SEMI Wafer Cassette type: 25-Slots Gas system type: IGS Gas box Mylar floor template Manuals electronic CD-ROM Positions: Position 1: 2300 Microwave strip Position 2 and 3: 2300 Versys Kiyo Non-standard systems: NSR300156 Kiyo NSR301982 RMV Kiyo PM Position-4 Process modules: (2) Quick clean kits for 2300 Versys Kiyo (1) Quick clean kit for 2300 MW Strip Options: Standard chamber pinnacle (-814) Tunable ESC Wafer clamping mechanism Standard fingers RF Ground bracket (-006) Quartz edge ring Standard Quartz tunable injector Standard injector shield Standard plasma screen (-032) Gas weldment: Enhanced passivated (-110) Standard ESC Hose kit Compression ESC Facility plate Liner: ACME Coated universal (-838) Standard chamber manometer Wafer lift mechanism: Direct drive Voltage control interface: 800 V O-rings: Chemraz Standard TCP Coil TCP Source dual: 1500 W 300MM Turbo pump: 2200 L/S BOCE (Seiko Seiki) Heated foreline Endpoint detection: 2300 LSR with OES 2 Standard chamber viewport window Chamber isolation valve: Barrier seal door Viton vacuum valve Lower isolation valve: Chemraz dry (-006) Water control passive: RF PCW Control Pump to TCU: 25ft TCU to PM: 50ft PM to Pump interconnect: 50ft TCU to RPDB: 25ft Pump to RPDB: 25ft Microwave strip options: O-rings: Fluorosilicon / TEV Microwave source: Quartz Baffle: Quartz Leak check port Chamber isolation valve: Barrier seal door Throttle valve (-003) 2-Line on-board gas delivery PM to Pump interconnect: 50ft Pump to RPDB: 25ft Gas box: Standard gas containment Top exhaust gas system Gas box: Advanced chamber condition control MFC Type: STEC SEC-Z313 No display in transducer (16) Gas lines Heated gas lines: Position 1 and 2 Gas box inlet option: Regulated inlet gas panel Standard gas filter Non-standard PM/GB Feature: (2) FUJIKIN NSR 301983 MFC on PM4 IGSGB <PM4> Line6 : FUJIKIN FCST1005NZFC_4J2, SO2 at 200sccm Line16 : FUJIKIN FCST1005NZFC_4J2, Ar at 500sccm 2300 Platform Standard front fascia Front end load port cassette: (3) FOUPs Cassette ID: Keyence BCR Carrier ID Factory automation: OHT PIO Sensor Airlock wafer fingers: Stainless wafer pads EPX Backing pumps for TM Control rack configuration: Side monitor user interface Earth Leakage Breaker (ELB) RPDB Interconnect cables: TM to RPDB, 50ft Signal tower System options: System calibration and alignment Service step for PM Robot CDM Non-Standard TM Feature: NSR6975 Facility IF board kit and SW Key NSR101080 Vespel endeffector on V2 TM Gas box configuration: PM2: Line / MFC Type / Gas type / Gas Flow Line 01 / SZ313 / SICL4 / 50 Line 03 / SZ313 / NF3 / 500 Line 04 / SZ313 / CL2 / 200 Line 05 / SZ313 / HBr / 500 Line 06 / SZ313 / SO2 / 200 Line 07 / SZ313 / CH2F2 / 200 Line 09 / SZ313 / O2 / 10 Line 10 / SZ313 / SF6 / 50 Line 11 / SZ313 / O2 / 500 Line 12 / SZ313 / N2 / 100 Line 13 / SZ313 / CF4 / 200 Line 14 / SZ313 / CHF3 / 300 Line 15 / SZ313 / He / 500 Line 16 / SZ313 / Ar / 500 PM3: Line / MFC Type / Gas type / Gas Flow Line 01 / SZ313 / SICL4 / 50 Line 03 / SZ313 / NF3 / 500 Line 04 / SZ313 / CL2 / 200 Line 05 / SZ313 / HBr / 500 Line 06 / SZ313 / SO2 / 200 Line 07 / SZ313 / CH2F2 / 200 Line 09 / SZ313 / O2 / 10 Line 10 / SZ313 / SF6 / 50 Line 11 / SZ313 / O2 / 500 Line 12 / SZ313 / N2 / 100 Line 13 / SZ313 / CF4 / 200 Line 14 / SZ313 / CHF3 / 300 Line 15 / SZ313 / He / 500 Line 16 / SZ313 / Ar / 500 PM4: Line / MFC Type / Gas type / Gas flow Line 01 / SZ313 / SICL4 / 50 Line 03 / SZ313 / NF3 / 500 Line 04 / SZ313 / CL2 / 200 Line 05 / SZ313 / HBr / 500 Line 06 / SZ313 / SO2 / 200 Line 07 / SZ313 / CH2F2 / 200 Line 09 / SZ313 / O2 / 10 Line 10 / SZ313 / SF6 / 50 Line 11 / SZ313 / O2 / 500 Line 12 / SZ313 / N2 / 100 Line 13 / SZ313 / CF4 / 200 Line 14 / SZ313 / CHF3 / 300 Line 15 / SZ313 / He / 500 Line 16 / SZ313 / Ar / 500 2016 vintage.
LAM RESEARCH 2300 Versys Kiyo是一款用途廣泛、高效的蝕刻設備,專為矽單晶薄膜沈積、先進光刻、表面劃痕修復等應用而設計。該系統是一種高端蝕刻器/asher,配備了等離子體蝕刻、幹氧化物沈積、蝕刻、抗沈積等先進技術。2300 Versys Kiyo具有20kHz的等離子體輸入頻率,以及用於可靠蝕刻過程的各種工藝氣體。它是一個全自動的機器,照顧整個過程,從加載晶圓到卸載結果。為確保準確和可重復的結果,蝕刻器具有自動晶圓處理單元和內置真空室。LAM RESEARCH 2300 Versys Kiyo還采用了最新的原位成像和先進的工藝控制功能,允許用戶監控流程並即時進行快速更改。為確保一致、高精度的結果,該機配備了6軸傾斜和2軸偏航定位器。它還提供了一個可選的室內離子源,用於使用受控大氣工藝進行蝕刻。2300 Versys Kiyo具有先進的功能和耐用可靠的結構,是各種要求苛刻的蝕刻和灰化應用的絕佳選擇。該工具經認證符合嚴格的安全標準,並配備了在蝕刻過程中提供額外一層保護的故障安全資產。此外,LAM RESEARCH 2300 Versys Kiyo的效率高,周轉速度快,非常適合產品設計的快速原型設計和快速開發。
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