二手 LAM RESEARCH 2300 Versys #9161243 待售

LAM RESEARCH 2300 Versys
ID: 9161243
晶圓大小: 12"
Metal etcher, 12" EFEM: Part no Load port (1): 002-7200-21 Load port (2): 002-7200-32 Atm robot: No Wafer alignment: 03121001 Power control rack: AC Rack: Model no: 2300 Vintage: 2003 Rear user interface monitor: Yes Robot controller: No P/C: Yes Vacuum TM: Airlock (Right): Yes Airlock (Left): Yes VTM Robot: No TM / PM Facility lines: Yes Slop valve load lock (Right): Yes Slop valve load lock (Left): Yes Vacuum TM: Part No Inner door Assy (Air lock Right): 853-007861-231 Inner door Assy (Air lock Left): 853-007861-003 Inner door Assy (PM2): 853-007859-002 Inner door Assy (PM3): 853-007859-212 Inner door Assy (PM4): 853-007859-212 Process module: PM2: 2300 Poly: Model no: Metal 2300 Vintage: 2003 TCP Match: Yes TCP Coil: Yes Bias match: Yes Process manometer: Model no: E28B-23747 Range: 0.1 Torr Process manometer valve assy: Yes AC/SSR Box: Yes Fore line manometer: Yes Turbo pump fore line isolation valves, manometers: Yes Turbo pump: Yes (ATM2300M) VME Assembly: Yes VAT Pendulum valve: Yes Fore line Assy: Yes He cooling / Lift box: Yes Motor stepper board: Yes RF Cart: PM2 Turbo controller: Yes Generator (TCP): Yes (660-900984-008) Generator (BIAS): Yes (3155059-026) PM1: Gas box (GIB): Yes MFC 1_CL2: Yes MFC 2_HBR: Yes MFC 3_SF6: Yes MFC 4_AR: Yes MFC 5_N2: Yes MFC 6_CF4: Yes MFC 7_O2: Yes MFC 8_SF6: Yes MFC 9_HE: Yes MFC 10_O2: Yes MFC 11_NF3: Yes MFC 12_30%O2/HE: Yes Regulator (12/12): 12/12 RPDB Power box: Yes PM3: TCP Match: Yes TCP Coil: Yes Bias match: Yes Process manometer: Model no: E28B-23743 Range: 0.1 Torr Process manometer valve assy: Yes AC / SSR Box: Yes Fore line manometer: Yes Turbo pump fore line isolation valves, manometers: Yes Turbo pump: Yes (ATM2300M) VME Assembly: Yes VAT Pendulum valve: Yes Fore line Assy: Yes He cooling / Lift box: Yes Motor stepper board: Yes RF Cart: PM2 Turbo controller: Yes Generator (TCP): Yes (660-900984-008) Generator (BIAS): Yes (3155059-026) PM2: Gas box (GIB): Yes MFC 1_CL2: Yes MFC 2_HBR: Yes MFC 3_SF6: Yes MFC 4_AR: Yes MFC 5_N2: Yes MFC 6_CF4: Yes MFC 7_O2: No MFC 8_SF6: Yes MFC 9_HE: Yes MFC 10_O2: Yes MFC 11_NF3: Yes MFC 12_30%O2/HE: Yes Regulator(12/12): 10/12 PM4: TCP Match: Yes TCP Coil: Yes Bias match: Yes Process manometer: Model no: E28B-23743 Range: 0.1 Torr Process manometer valve assy: No AC / SSR Box: Yes Fore line manometer: Yes Turbo pump fore line isolation valves, manometers: Yes Turbo pump: Yes (ATM2300M) VME Assembly: Yes VAT Pendulum valve: Yes Foreline Assy: No He cooling / Lift box: Yes Motor stepper board: Yes RF Cart: PM2 Turbo controller: Yes Generator (TCP): Yes (660-900984-008) Generator (BIAS): Yes (3155059-026) PM3: Gas box (GIB): Yes MFC 1_CL2: Yes MFC 2_HBR: Yes MFC 3_SF6: Yes MFC 4_AR: Yes MFC 5_N2: Yes MFC 6_CF4: Yes MFC 7_O2: Yes MFC 8_SF6: Yes MFC 9_HE: Yes MFC 10_O2: Yes MFC 11_NF3: Yes MFC 12_30%O2/HE: Yes Regulator(12/12): 12/12.
LAM RESEARCH 2300 Versys是一個全自動蝕刻/asher平臺,由半導體制造技術的領先供應商LAM RESEARCH開發。它旨在滿足設備生產商的具體需求,包括先進的CMOS、MEMS和電力行業的需求。Versys利用等離子體蝕刻和灰燼技術,精確創建高精度的特征,以嚴格的公差。蝕刻組件具有優化的LAMSource微波發生器、精密蝕刻室和專有的氣體輸送設備。Ashing組件采用ChamberPlus ashing工藝,高反應性、低泄漏、低溫ashing系統。Versys的設計帶有嚴密的工藝窗口,使其能夠蝕刻、灰燼,並以微米級的精度定義特征。其高可靠性和可重復性進一步確保了精度,即使在復雜且最具挑戰性的配置文件上也是如此。蝕刻和灰分過程由劑量監控和邊緣管理,從而可以完全控制預定義和自定義地形中的蝕刻和灰分剖面。晶圓處理單元是完全自動化和基於解決方案的,這簡化了在一臺機器上按時處理和加倍作業的交付。Versys用戶友好,具有大而易於閱讀的觸摸屏界面、全面的蝕刻和灰庫,以及強大的數據收集功能。它還提供實時性能監測和控制,包括對狀態、警報和跟蹤的審查。Versys是一個完整的蝕刻/灰分解決方案,旨在提高產品性能和生產力。Versys是一款可靠的工具,具有較高的工藝產量和最長的正常運行時間,旨在以可靠、經濟高效的方式快速提供產品改進。
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