二手 LAM RESEARCH 2300e4 Kiyo EX #293619084 待售

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ID: 293619084
晶圓大小: 12"
優質的: 2012
Poly etcher, 12" (3) Load ports SEMI Wafer Cassette type: 25-Slots Gas box type: Jetstream 2300 Platform Chamber type: Versys Kiyo E Series 2300 Versys Kiyo E Series PTK Chamber Temperature controlled window HP Crystal window Coated ceramic injector Standard bayonet style injector shield Gas weldment with coated Standard injector shield Enhanced plasma screen SRC Enhanced grounded liner Top and side gas feed TCP Source: Plasma 2000 W Enhanced TCP Coil support: Bias match: 1.5 kW HVBP Electrostatic chuck: EPX ERMZ ESC Facility plate: Pl with routing ESC Hose kit: Low temperature Wafer lift mechanism: Prime movers Voltage control interface: 1200 V High bias kit Single piece QUARTZ edge ring Turbo pump, 12" OES2 Endpoint detection Standard chamber viewport window Heated foreline clamp cover Chamber isolation valve: Barrier seal door Vacuum valve: Viton Lower isolation valve: Valqua Chamber manometer UPC Enhanced Water control: Passive RF PCW control PCW Hoses: Chemical resistant Exhaust duct: Reduced profile Standard service cover Pump to TCU, 50 ft TCU to PM, 100 ft Interconnect: Pump to PM, 100 ft TCU to RPDB, 25 ft Pump to RPDB, 25 ft Regulated inlet gas panel Gas system: Jetstream Mounting location: Transport module Window door Lock-out tag-out manual valve FIB Facilitization Facility box: Top gas connection Enhanced containment Regulated with filter regulation Nickel filter SST Filter Future PM: 4 Positions Jetstream gases of 2302 Kiyo E Series: Tuning gas Heated lines position 1 and 2 Gas no / Gas / MFC Size / MFC Model 1 / SiCL4 / 100 SCCM / STEC Z719 2 / CL2 / 500 SCCM / STEC D219 3 / HBr / 500 SCCM / STEC D219 4 / CF4 / 400 SCCM / STEC D219 5 / BCl3 / 200 SCCM / MFC Z719 6 / He / 500 SCCM / STEC D219 7 / CH2F2 / 200 SCCM / STEC D219 8 / Ar / 1000 SCCM / STEC D219 9 / 30%HE/O2 / 50 SCCM / STEC D219 10 / NF3 / 1000 SCCM / STEC D219 11 / N2 / 250 SCCM / STEC D219 12 / SO2 / 200 SCCM / MFC D219 13 / SF6 / 200 SCCM / STEC D219 14 / CHF3 / 200 SCCM / MFC D219 15 / O2 / 500 SCCM / STEC D219 17 / C4F6 / 200 SCCM / MFC D219 ATM: Front end load port: 3 FOUP BROOKS Cassette ID: Hermos carrier ID Factory automation: OHT PIO Sensor Input buffer station: 25-Slot CTC Computer storage: Hard Disk Drive (HDD) mirrored VTM Load lock A and B: Standard RPDB Subpanel R-O-G-B Signal tower Pre-facilities: PM Peripherals backing pumps: ESR100WN RPDB Backing pump CB Size: 30 A TCU CB Size: 30A TCU YR-8020 2300 Versys Kiyo E Series process module (PM1, PM2, PM3 and PM4): SiCl4, Cl2, HBr, CF4, He, Ar, CH2F2, 30%He/O2, NF3, N2, SO2, SF6, CHF3, O2 Does not include: Dry pumps Hard Disk Drive (HDD) Power supply: 208 AC, 3 Phase 2012 vintage.
LAM RESEARCH 2300e4 Kiyo EX是一款為半導體器件制造而設計的高性能蝕刻器/asher。它是一種堅固的工具,能夠在高達1000攝氏度的溫度下蝕刻和粉刷各種材料,包括矽、二氧化矽、鋁和鎢等。2300e4 Kiyo EX以RF阻抗匹配和預配置蝕刻/灰分兩種主要配置運行。在射頻阻抗匹配模式下,可以處理六種基材類型,提供高產、低成本的加工。它配備了射頻發生器,產生高精度和可重復的結果。它還具有一個綜合壓力裝置,在最佳壓力條件下維持工藝氣體。在預配置的蝕刻/灰分模式下,LAM RESEARCH 2300e4 Kiyo EX具有先進的幾個特點,如先進的離子束光學、多室等離子體控制系統和碳化矽室門。先進的離子束光學提高了過程控制和輪廓精度,而多腔等離子體控制系統為蝕刻和灰分配方提供了靈活性。此外,碳化矽室門使用戶能夠管理等離子體反應和減少碎片。除了蝕刻/灰燼功能外,2300e4 Kiyo EX還提供高精度的輪廓測量設備。此系統允許用戶以高分辨率監視蝕刻/灰燼配置文件,從而確保始終保持高質量的過程。為了進一步提高其蝕刻/灰分能力,LAM RESEARCH 2300e4 Kiyo EX包含一個溫度控制器,可以對沈積和蝕刻進行精確的溫度控制。它還具有數字數據記錄和存儲功能、用於配方優化的可編程控制器以及用於設備維護的自動診斷測試臺。2300e4 Kiyo EX是為生產優質半導體器件而設計的可靠高效的蝕刻器/asher。它提供了先進的離子束光學和溫度控制功能、高精度的輪廓測量機、數字數據記錄和存儲功能、用於配方優化的可編程控制器以及用於刀具維護的自動診斷測試臺。LAM RESEARCH 2300e4 Kiyo EX具有強大的特性和易用性,是任何半導體器件制造工廠的絕佳選擇。
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