二手 LAM RESEARCH 2300e4 Kiyo EX #293619084 待售
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ID: 293619084
晶圓大小: 12"
優質的: 2012
Poly etcher, 12"
(3) Load ports
SEMI Wafer
Cassette type: 25-Slots
Gas box type: Jetstream
2300 Platform
Chamber type: Versys Kiyo E Series
2300 Versys Kiyo E Series
PTK Chamber
Temperature controlled window
HP Crystal window
Coated ceramic injector
Standard bayonet style injector shield
Gas weldment with coated
Standard injector shield
Enhanced plasma screen
SRC Enhanced grounded liner
Top and side gas feed
TCP Source: Plasma 2000 W
Enhanced TCP Coil support:
Bias match: 1.5 kW HVBP
Electrostatic chuck: EPX ERMZ
ESC Facility plate: Pl with routing
ESC Hose kit: Low temperature
Wafer lift mechanism: Prime movers
Voltage control interface: 1200 V
High bias kit
Single piece QUARTZ edge ring
Turbo pump, 12"
OES2 Endpoint detection
Standard chamber viewport window
Heated foreline clamp cover
Chamber isolation valve: Barrier seal door
Vacuum valve: Viton
Lower isolation valve: Valqua
Chamber manometer
UPC Enhanced
Water control: Passive RF PCW control
PCW Hoses: Chemical resistant
Exhaust duct: Reduced profile
Standard service cover
Pump to TCU, 50 ft
TCU to PM, 100 ft
Interconnect: Pump to PM, 100 ft
TCU to RPDB, 25 ft
Pump to RPDB, 25 ft
Regulated inlet gas panel
Gas system:
Jetstream
Mounting location: Transport module
Window door
Lock-out tag-out manual valve
FIB Facilitization
Facility box:
Top gas connection
Enhanced containment
Regulated with filter regulation
Nickel filter
SST Filter
Future PM: 4 Positions
Jetstream gases of 2302 Kiyo E Series:
Tuning gas
Heated lines position 1 and 2
Gas no / Gas / MFC Size / MFC Model
1 / SiCL4 / 100 SCCM / STEC Z719
2 / CL2 / 500 SCCM / STEC D219
3 / HBr / 500 SCCM / STEC D219
4 / CF4 / 400 SCCM / STEC D219
5 / BCl3 / 200 SCCM / MFC Z719
6 / He / 500 SCCM / STEC D219
7 / CH2F2 / 200 SCCM / STEC D219
8 / Ar / 1000 SCCM / STEC D219
9 / 30%HE/O2 / 50 SCCM / STEC D219
10 / NF3 / 1000 SCCM / STEC D219
11 / N2 / 250 SCCM / STEC D219
12 / SO2 / 200 SCCM / MFC D219
13 / SF6 / 200 SCCM / STEC D219
14 / CHF3 / 200 SCCM / MFC D219
15 / O2 / 500 SCCM / STEC D219
17 / C4F6 / 200 SCCM / MFC D219
ATM:
Front end load port: 3 FOUP BROOKS
Cassette ID: Hermos carrier ID
Factory automation: OHT PIO Sensor
Input buffer station: 25-Slot
CTC Computer storage: Hard Disk Drive (HDD) mirrored
VTM Load lock A and B: Standard
RPDB Subpanel
R-O-G-B Signal tower
Pre-facilities:
PM Peripherals backing pumps: ESR100WN
RPDB Backing pump CB Size: 30 A
TCU CB Size: 30A
TCU YR-8020
2300 Versys Kiyo E Series process module (PM1, PM2, PM3 and PM4): SiCl4, Cl2, HBr, CF4, He, Ar, CH2F2, 30%He/O2, NF3, N2, SO2, SF6, CHF3, O2
Does not include:
Dry pumps
Hard Disk Drive (HDD)
Power supply: 208 AC, 3 Phase
2012 vintage.
LAM RESEARCH 2300e4 Kiyo EX是一款為半導體器件制造而設計的高性能蝕刻器/asher。它是一種堅固的工具,能夠在高達1000攝氏度的溫度下蝕刻和粉刷各種材料,包括矽、二氧化矽、鋁和鎢等。2300e4 Kiyo EX以RF阻抗匹配和預配置蝕刻/灰分兩種主要配置運行。在射頻阻抗匹配模式下,可以處理六種基材類型,提供高產、低成本的加工。它配備了射頻發生器,產生高精度和可重復的結果。它還具有一個綜合壓力裝置,在最佳壓力條件下維持工藝氣體。在預配置的蝕刻/灰分模式下,LAM RESEARCH 2300e4 Kiyo EX具有先進的幾個特點,如先進的離子束光學、多室等離子體控制系統和碳化矽室門。先進的離子束光學提高了過程控制和輪廓精度,而多腔等離子體控制系統為蝕刻和灰分配方提供了靈活性。此外,碳化矽室門使用戶能夠管理等離子體反應和減少碎片。除了蝕刻/灰燼功能外,2300e4 Kiyo EX還提供高精度的輪廓測量設備。此系統允許用戶以高分辨率監視蝕刻/灰燼配置文件,從而確保始終保持高質量的過程。為了進一步提高其蝕刻/灰分能力,LAM RESEARCH 2300e4 Kiyo EX包含一個溫度控制器,可以對沈積和蝕刻進行精確的溫度控制。它還具有數字數據記錄和存儲功能、用於配方優化的可編程控制器以及用於設備維護的自動診斷測試臺。2300e4 Kiyo EX是為生產優質半導體器件而設計的可靠高效的蝕刻器/asher。它提供了先進的離子束光學和溫度控制功能、高精度的輪廓測量機、數字數據記錄和存儲功能、用於配方優化的可編程控制器以及用於刀具維護的自動診斷測試臺。LAM RESEARCH 2300e4 Kiyo EX具有強大的特性和易用性,是任何半導體器件制造工廠的絕佳選擇。
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