二手 LAM RESEARCH 490 / 590 #9077769 待售

ID: 9077769
Etcher Main Chamber: Chamber Bottom chamber and exhaust ring Lower electrode assembly with focus ring style electrode (Boxed separately) Vacuums Rotary O-rings Seals Pneumatic tubing and fittings Pneumatic cylinders Upper electrode is process dependent and not supplied Load Locks: Vacuums Rotary O-rings Seals Pneumatic tubing and fittings Pneumatic cylinders Wafer arms and wafer guides are size dependent and not supplied Machine Mainframe: Pneumatic tubing Connectors and fittings Cables re-bundled and ty-wrapped Frame Top panels Front and side panels Elevators: (Packed separately) Top plastic dust covers not supplied Baratron head not supplied Gap Drive head and Automatch: (Packed separately) Front display panel and operator interface Electronics drawer (Packed separately) Factory manuals are included Complete frame RF Power supply is not supplied nor are any external cables, gas lines, throttle valve, or vacuum fittings.
LAM RESEARCH 490/590是一種適合於各種基材材料的蝕刻/asher設備。設計用途廣泛,支持使用反應性離子蝕刻和抗灰化技術。該系統包括一個完全由計算機控制的蝕刻室,能夠精確控制和重復蝕刻過程。蝕刻室的腔室容積為40升,能夠達到1 x 10-5 torr以下的真空水平。它裝有雙頻射頻源電源和陶瓷渦輪分子泵。該腔室具有標準的12 "x 12"基板支撐,可配置為允許最多8"晶片。它還具有一個過程監視窗口,允許實時監視蝕刻過程。反應性離子蝕刻(RIE)是該單元的關鍵能力,允許蝕刻由包括矽、聚酰亞胺、聚碳矽烷甚至金屬合金在內的材料制成的底物。它允許形成邊緣尖銳的復雜圖案。它還能夠在正面和負面的抗灰效果.該機還具有精選的氣體化學氣相沈積(CVD)功能。這包括脈沖模式CVD、雙頻CVD、雙功率CVD,可用於在晶圓上沈積SiO2、SiN、Al2O3等材料。490/590 蝕刻器/asher工具是一種功能強大的蝕刻工具,它提供各種功能和功能來處理各種基板。它具有用戶友好的界面、靈活的配置以及集成的射頻源,可以精確控制蝕刻過程。它能夠安全可靠地產生高質量的蝕刻結果,同時減少生產時間和成本。
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