二手 LAM RESEARCH A6 9600 PTX #201020 待售
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ID: 201020
Etcher
Process: metal
SMIF type: API
Chamber type: PTX
Chambers: (2) PM, (2) Strip
Automation online component: SECS I/II, SECSGEM
Chamber config
Process module 1:
Focus ring: 716-460216-002
Quartz plate: 716-000941-001
Process module 2:
Esc: 718-094523-281
Liner, chamber, vat 65, Trnsn manf: 839-495013-002
Liner, chamber, trnsn manf, adptr: 715-495014-001
Liner, chamber, trnsn manf: 714-495015-001
Liner, chamber, al, alli, bsr, 9600XX: 715-330825-007
Top quartz: 716-330891-002
Insul, esc, 9600XX: 716-330915-001
Pl, sh hd, cer, 21 hole, 9600PTX: 716-330892-007
Ring, gnd, chamber, bsr, ac cpld: 715-330889-002
Edge ring: 716-330045-281
Uniformity ring: 716-331051-002
Process module 3:
Esc: 718-094523-281
Liner, chamber, vat 65, Trnsn manf: 839-495013-002
Liner, chamber, trnsn manf, adptr: 715-495014-001
Liner, chamber, trnsn manf: 714-495015-001
Liner ,chamber, al, alli, bsr, 9600XX: 715-330825-007
Top quartz: 716-330891-002
Insul, esc, 9600XX: 716-330915-001
Pl, sh hd, cer, 21 hole, 9600PTX: 716-330892-007
Ring, gnd, chamber, bsr, ac cpld: 715-330889-002
Edge ring: 716-330045-281
Uniformity ring: 716-331051-002
Process module 4:
Focus ring: 716-460216-002
Quartz plate: 716-000941-001
EPD
Channel: end point filter box for PM 1 and PM 2
Channel (nm): 853-540066-011 703/261nm, 853-540066-011 703/261nm
Gas and B/H module (PM 1, 2, 3, 4 respectively)
Gas line qty (analog): 3, 8, 8, 3
Gas box model (analog): all universal
Gas 1: O2 5000, BCl3 200, BCl3 200, O2 5000
Gas 2: N2 1000, O2 1000, O2 1000, N2 1000
Gas 3: H2O 1000, Cl2 400, Cl2 400, H2O 1000
Gas 4: n/a, N2 200, N2 200, n/a
Gas 5: n/a, CF4 100, CF4 100, n/a
Gas 6: n/a, Ar 200, Ar 200, n/a
Gas 7: n/a, N2 20, N2 20, n/a
Gas 8: n/a, CHF3 50, CHF3 50, n/a
Helium pressure control unit: n/a, UPC-1300, UPC-1300, n/a
VAC (PM 1, 2, 3, 4 respectively)
Turbo pump: n/a, ATH-1600, ATH-1600, n/a
Turbo pump controller: n/a, ACT1300M/1600M, ACT1300M/1600M, n/a
Dry pump (TM and VCE): all single pump
Chamber manometer: MKS 10Torr, MKS 0.1Torr, MKS 0.1Torr, MKS 10Torr
Turbo manometer: n/a, MKS 10Torr 625A, MKS 10Torr 625A, n/a
Foreline manometer: all MKS 10Torr 625A
Pressure control valve: VAT64, Pendulum VAT65, Pendulum VAT65, VAT64
VAT controller: all software 65PM.3E.20
Temperature control (PM 1, 2, 3, 4 respectively)
Temperature control system: all 16 channel
Chiller type: 1 CH TCU, n/a, n/a, 1 CH TCU
RF generator: UPPER:RFDS1250/LOW:RFDS1250-HALO, n/a, n/a, UPPER:RFDS1250/LOW:RFDS1250-HALO
Match: (L-853-330951-021)/(U-853-032294-002), Stripper SmatchMatch, Stripper SmatchMatch, (L-853-330951-021)/(U-853-032294-002)
TR system
Platform: A6
Light tower: standard 4 light
Robot type: Brooks Mag-7
Arm type: dual arm
Wafer handling interface: Kalrze end effector
TM cover lift arm with PRK function
VCE inspection: lip seal
Computer system:
PC
Software version 2.2
Remote UI
Standard power
1996 vintage.
LAM RESEARCH A6 9600 PTX是一種蝕刻/灰化設備，用於生產微電子器件，如半導體IC和晶體管的蝕刻和灰化工藝。該系統旨在產生高分辨率的結果，在蝕刻和灰燼處理過程中具有極好的均勻性和對器件層的最小損傷。該單元由多個組件組成,這些組件協同工作,為用戶提供高效的蝕刻/灰化過程。機器的主要部件是等離子源組件、外部加工室、真空泵及其相關的控制電子設備。這些組件協同工作以創建化學反應環境,允許用戶控制成功蝕刻和灰化過程所需的反應和條件。等離子源組件被設計為產生一個高密度的等離子束，它將與過程腔內包含的材料發生反應。該工藝室設計用於容納樣品材料，並用反應性氣體混合物填充。真空泵用於排出工藝室以及排出蝕刻和灰分工藝產生的任何副產物。該工具由控制電子設備控制，包括頻率合成器、幅度調制器和事件控制接口。頻率合成器負責為用戶提供在過程中準確調整等離子體參數以獲得最佳吞吐量和均勻性的能力。振幅調制器用於調節射頻輸入功率，從而產生所需的等離子束密度和輪廓。事件控制界面允許用戶設置多級進程，如蝕刻和灰燼。A6 9600 PTX能夠處理從晶圓小於3「到12」的生產尺寸。該資產能夠蝕刻金屬、聚合物和電介質等多種材料。該模型還能夠進行高度各向異性的蝕刻過程。該設備的均勻性和可重復性使其非常適合用於集成電路和晶體管的生產。
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