二手 MATTSON Aspen II #9398659 待售
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ID: 9398659
晶圓大小: 8"
ICP System, 8"
MATTSON Endpoint detection system
With fixed filters: 430 and 520
Cable length: 19 ft
(3) RF Cables and signal cables
(2) Heaters
MFC
Chambers:
Back chamber:
366 MHz CPU: Analog in and PCB out
Floppy Disk Drive (FDD): DI/DO Cards
Chassis: Power supply
Gas channel: Bottom feed channel
Cool down station: No water cooling
Gas lines
Right chamber:
366 MHz CPU: SEC II Card
Floppy Disk Drive (FDD): Robot stepper (SMC-PC3)
Chassis: Backing plain
Gas channel: Junction box
Cool down station: Lexan plates
Gas lines with filters
Front end:
26" Opening with separate operator interface
4-Color light tower
Operator / Engineering monitor: TFT Design monitor
Gas box with sub frames
EMO Buttons
Interlock circuit: Push button switches
Hanging panels
Load lock:
Single load lock
(2) Cassette stations
Capability of queuing lots
Pin search assembly: Proximity sensors
Load lock seal: Lip seal
Platform and cassette:
(4) 25-Slot cassettes
Rotating cassette nests, 8"
Cool down station: Flat cool down station without water lines
Load lock fast exchange
Transfer robot:
Main robot: 3-Axis robot with flex cable
Robot arm: (4) Adjustable paddles with standard arm
Slit door
Wafer sensors: Paddles, front and rear cassettes
Shuttle: 26"
Process module:
Chamber right and back:
Tube type: Quartz tube
Standard process window
ICP Chamber O-ring type: Flurosilicon
Temperature controller: WATLOW 988 / EZ Zone
Thermal couples: Spring loaded TC
Lift pin assembly
Grids / Guide rings: Extended guide ring
Electrical feed through
Manifold and ceramic parts
Isolation valve
Top plate
Load lock
Chamber
Pressure controller:
VAT Valve pressure controller
Chamber manometer: 10 Torr
Load lock manometer: 100 Torr
Shuttle manometer: 1000 Torr
RF / MW System:
RF System: Top RF 13.56 MHz
(3) RFPP10 RF Generators: (2) Power cables missing
TRAZER AMU 10D-2 RF Top match, P/N: 914-92003-00: (2) Vacuum capacitors missing
Re-silvered RF coils
(125) RF Vacuum caps: 100PF
AC Box: 2-3 Phase generators with safety cover
DC Box
Gas system:
Gas VCR gasket: Stainless steel and Nickel
Gas line / Gas / Range
Gas 1 / O2 / 1000 SCCM
Gas 2 / N2 / 1000 SCCM
Gas 3 / N2/H2 (4%) / 2000 SCCM
Gas 4 / CF4 / 100 SCCM
Side:
Gas 1 / O2 / 5 SLM
Gas 2 / N2 / 1 SLM
Gas 3 / CF4 / 200 SCCM
Gas 4 / O2 / 1 SLM
Rear:
Gas 1 / O2 / 10 SLM
Gas 2 / N2 / 1 SLM
Gas 3 / CF4 / 200 SCCM
Gas 4 / O2 / 1 SLM.
MATTSON Aspen II是一款先進的蝕刻設備,提供高吞吐量、低擁有成本的精密蝕刻。它旨在提高生產率,同時提供高度的靈活性和對蝕刻參數的控制。Aspen II用於需要蝕刻各種材料的多種類型的應用和研究項目。適用於蝕刻矽、石英、鉬和不銹鋼等多種基材。該系統具有可調節的臺階,可輕松蝕刻大或小基板,包括角、邊和臺階。大蝕刻室允許一次蝕刻多個晶片,以加快生產速度。MATTSON Aspen II很好地配備了超精密機器人X、Y、Z驅動器,最大速度為11毫米/秒。它還具有基於視覺的高速對準和自動聚焦功能。該單元還具有一個冷卻器,以最佳冷卻基板,以穩定蝕刻過程。蝕刻速率非常穩定,提供靈活的蝕刻條件,具有重復高性能結果的能力。該機裝有真空泵,能夠創造低真空環境,腔室壓力為5 mTorr。該工具還有一個內置的預室除氣資產,允許原始蝕刻條件。Aspen II還能夠在沿垂直軸的蝕刻速率高於沿水平軸的蝕刻速率的情況下進行各向異性蝕刻。MATTSON Aspen II具有廣泛的蝕刻化學,包括氧氣、氯氣、六氟化硫和氟基。為了確保可重現的結果,該模型還具有對電力、溫度和離子源等關鍵參數的遠程控制功能。此外,這些設備可以很容易地集成到現有的半導體工藝中。Aspen II是高性能、高通量蝕刻的絕佳選擇。其堅固的結構和精密的性能使其成為許多不同蝕刻應用的理想選擇。
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