二手 MATTSON Aspen II #9398659 待售

ID: 9398659
晶圓大小: 8"
ICP System, 8" MATTSON Endpoint detection system With fixed filters: 430 and 520 Cable length: 19 ft (3) RF Cables and signal cables (2) Heaters MFC Chambers: Back chamber: 366 MHz CPU: Analog in and PCB out Floppy Disk Drive (FDD): DI/DO Cards Chassis: Power supply Gas channel: Bottom feed channel Cool down station: No water cooling Gas lines Right chamber: 366 MHz CPU: SEC II Card Floppy Disk Drive (FDD): Robot stepper (SMC-PC3) Chassis: Backing plain Gas channel: Junction box Cool down station: Lexan plates Gas lines with filters Front end: 26" Opening with separate operator interface 4-Color light tower Operator / Engineering monitor: TFT Design monitor Gas box with sub frames EMO Buttons Interlock circuit: Push button switches Hanging panels Load lock: Single load lock (2) Cassette stations Capability of queuing lots Pin search assembly: Proximity sensors Load lock seal: Lip seal Platform and cassette: (4) 25-Slot cassettes Rotating cassette nests, 8" Cool down station: Flat cool down station without water lines Load lock fast exchange Transfer robot: Main robot: 3-Axis robot with flex cable Robot arm: (4) Adjustable paddles with standard arm Slit door Wafer sensors: Paddles, front and rear cassettes Shuttle: 26" Process module: Chamber right and back: Tube type: Quartz tube Standard process window ICP Chamber O-ring type: Flurosilicon Temperature controller: WATLOW 988 / EZ Zone Thermal couples: Spring loaded TC Lift pin assembly Grids / Guide rings: Extended guide ring Electrical feed through Manifold and ceramic parts Isolation valve Top plate Load lock Chamber Pressure controller: VAT Valve pressure controller Chamber manometer: 10 Torr Load lock manometer: 100 Torr Shuttle manometer: 1000 Torr RF / MW System: RF System: Top RF 13.56 MHz (3) RFPP10 RF Generators: (2) Power cables missing TRAZER AMU 10D-2 RF Top match, P/N: 914-92003-00: (2) Vacuum capacitors missing Re-silvered RF coils (125) RF Vacuum caps: 100PF AC Box: 2-3 Phase generators with safety cover DC Box Gas system: Gas VCR gasket: Stainless steel and Nickel Gas line / Gas / Range Gas 1 / O2 / 1000 SCCM Gas 2 / N2 / 1000 SCCM Gas 3 / N2/H2 (4%) / 2000 SCCM Gas 4 / CF4 / 100 SCCM Side: Gas 1 / O2 / 5 SLM Gas 2 / N2 / 1 SLM Gas 3 / CF4 / 200 SCCM Gas 4 / O2 / 1 SLM Rear: Gas 1 / O2 / 10 SLM Gas 2 / N2 / 1 SLM Gas 3 / CF4 / 200 SCCM Gas 4 / O2 / 1 SLM.
MATTSON Aspen II是一款先進的蝕刻設備,提供高吞吐量、低擁有成本的精密蝕刻。它旨在提高生產率,同時提供高度的靈活性和對蝕刻參數的控制。Aspen II用於需要蝕刻各種材料的多種類型的應用和研究項目。適用於蝕刻矽、石英、鉬和不銹鋼等多種基材。該系統具有可調節的臺階,可輕松蝕刻大或小基板,包括角、邊和臺階。大蝕刻室允許一次蝕刻多個晶片,以加快生產速度。MATTSON Aspen II很好地配備了超精密機器人X、Y、Z驅動器,最大速度為11毫米/秒。它還具有基於視覺的高速對準和自動聚焦功能。該單元還具有一個冷卻器,以最佳冷卻基板,以穩定蝕刻過程。蝕刻速率非常穩定,提供靈活的蝕刻條件,具有重復高性能結果的能力。該機裝有真空泵,能夠創造低真空環境,腔室壓力為5 mTorr。該工具還有一個內置的預室除氣資產,允許原始蝕刻條件。Aspen II還能夠在沿垂直軸的蝕刻速率高於沿水平軸的蝕刻速率的情況下進行各向異性蝕刻。MATTSON Aspen II具有廣泛的蝕刻化學,包括氧氣、氯氣、六氟化硫和氟基。為了確保可重現的結果,該模型還具有對電力、溫度和離子源等關鍵參數的遠程控制功能。此外,這些設備可以很容易地集成到現有的半導體工藝中。Aspen II是高性能、高通量蝕刻的絕佳選擇。其堅固的結構和精密的性能使其成為許多不同蝕刻應用的理想選擇。
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