二手 SEZ / LAM RESEARCH DV-34 #9233096 待售
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ID: 9233096
晶圓大小: 12"
優質的: 2007
Single wafer processing system
Particle, polymer, & residue removal
Wafers
Wafer type: Standard
Wafer surface treatment
Cassette interfaces
(25) Wafers
Wafer robot (dual arm): BROOKS DBM-2406 V
Robot controller: BROOKS EDC-2400
Dual ceramic end effector
End effector size: 12
Options:
OHT (Over Head Transfer)
Light curtain
Ionizer: 5285e / 4630
No open cassette adapter
No wafer protrusion sensor (200mm)
No carrier ID reader (RFID)
No AGV
Process modules: 4 / 8 Chambers (L / R) 4 chambers
PSL-1 & PSL-2 (Left side):
Medium-1 arm (Standard): Chemical used
Medium-2 arm (Option): Chemical used
DIW Arm
Chuck (ADV pin)
Spindle & elevating units
PM I/O & Safety Box
No active jet nozzle
PSR-1 & PSR-2 (Right side):
Medium-1 arm (Standard): Chemical used
Medium-2 arm (Option): Chemical used
DIW Arm
Chuck (ADV pin)
Spindle & elevating units
PM I/O & Safety box
No active jet nozzle
Liquid / Chem supply cabinets (CHC1 / CHC2):
CHC1: (Standard & Dual tank)
Tank A:
Medium REZI38 Mix ratio / Temperature 25°C
Medium fill port, type: Auto fill
Medium paddle wheel
DIW Fill port, type: Auto fill
DIW Paddle wheel
Medium in-line filtration system
Sampling port
Buffer tank
Suckback valves
ULTRASONIC Flow meter
Tank B:
Used for chemical
Medium REZI38 Mix ratio / Temperature 25°C
Medium fill port, type: Auto fill
Medium paddle wheel
DIW Fill port, type: Auto fill
DIW Paddle wheel
Medium in-line filtration system
Sampling port
Buffer tank
Suckback valves
ULTRASONIC Flow meter
Dual in-line heater & cooler
No DI/O3 line
Process pump
No booster pump
Recirculation pump
Drain pump
CHC2:
System standard: (8) Chambers
System option: (4) Chambers
Tank A:
Medium paddle wheel
DIW Paddle wheel
No medium in-line filtration system
Sampling port
No buffer tank
Suckback valves
ULTRASONIC Flow meter
Tank B:
Medium paddle wheel
DIW paddle wheel
No medium in-line filtration system
Sampling port
No buffer tank
Suckback valves
ULTRASONIC Flow-meter
Dual in-line heater & cooler
No DI/O3 line
Process pump
No booster pump installed
Recirculation pump
Drain pump
CDS I/O & safety box
Separate drain
Chemical supply:
Med-1 Pre mix
Med-2 Pre mix
DIW
Option: HORIBA Chemical analyzer
Safety:
Earthquake protection
FM 4910 Compliant material
No main unit drip pan
No drip pan leak detection
Host control:
SECS II (HSMS)
No SECS II (RS232)
User interface:
Status lamp (R/Y/B/G)
Sound module
Front & back side UI (touch+keyboard)
Options:
Wafer handling robot display (CCD / Monitor)
Process chamber display
No dedicated backing pump
No XRD module
No ozone module
Transformer: 30 kVA
Transformer CE compliant (Input 208 Y)
No transformer CE compliant with GFI (Input 208 Y)
UPS
No entire system (30 kVA): In 400 VAC / Out 400 VAC
No control PC only (2 kVA): In 230 VAC / Out 230 VAC
No pre-etch thickness
No post-etch thickness
No target uniformity of etch
No backside surface conditioning
No rough finish
No polished finish
No front-side etch
No back-side etch
No backside etch & bevel clean
No oxide thinning / Removal
No nitride thinning / Removal
No polysilicon thinning / Removal
No bevel clean
No undercut
Missing parts:
(2) ECO Tune motors
(8) Dispenser motors
(2) Brake pin cylinders
(2) Dispenser nozzles
(2) VALVlE SAM-3250-NZD401FFI(12)
Drain pump
Filter
Power supply: 208 VAC, 20 kVA
Power Distribution Box (PDB)
CE Color code
No UL color code
2007 vintage.
SEZ/LAM RESEARCH DV-34是一種高性能的蝕刻器/asher,可提供最高效可靠的基板加工。該工具具有先進的特點和卓越的精度,非常適合許多不同的應用,從濺射和陽極氧化到抗去除和光刻。蝕刻器/灰燼氣體輸送設備旨在最大限度地提高吞吐量,同時最大限度地減少基板損壞。它還提供了對氣流和工藝參數的精確控制,以提供一致的結果。蝕刻器/asher的旋轉基板允許對所有尺寸不超過8英寸的基板進行快速旋轉和移動處理。它采用通用驅動系統,壓力和流量可調節,以適應不同的基板和工藝。此外,其氣體輸送裝置是可調的,以匹配所需的工藝參數,允許在蝕刻和灰化過程中精確控制。它還在向上或向下縮放時配備了腔室保護裝置,確保設備和基板保持在最佳狀態。在軟件方面,SEZ DV-34 蝕刻器/asher有一個靈活的控制機器,用於高級工藝優化和監控。它提供了氣體流動和腔室狀況的實時反饋,以及報警通知、自動超時和遙控功能。用戶界面直觀易用,提供簡單的編程和過程控制。這使得LAM RESEARCH DV-34一個可靠和通用的工具,適用於許多不同的應用.高均勻性、重復性和可靠性使得DV-34蝕刻器/灰度器成為半導體研究和生產的絕佳選擇。它能夠以高達200微米的精度進行濕蝕刻、幹蝕刻和灰化處理。低功耗和工具級診斷使其成為高通量生產環境的一個有吸引力的選擇,而其靈活性和易用性也使其成為高級研究的絕佳選擇。
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