二手 SEZ / LAM RESEARCH DV-34 #9233096 待售

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ID: 9233096
晶圓大小: 12"
優質的: 2007
Single wafer processing system Particle, polymer, & residue removal Wafers Wafer type: Standard Wafer surface treatment Cassette interfaces (25) Wafers Wafer robot (dual arm): BROOKS DBM-2406 V Robot controller: BROOKS EDC-2400 Dual ceramic end effector End effector size: 12 Options: OHT (Over Head Transfer) Light curtain Ionizer: 5285e / 4630 No open cassette adapter No wafer protrusion sensor (200mm) No carrier ID reader (RFID) No AGV Process modules: 4 / 8 Chambers (L / R) 4 chambers PSL-1 & PSL-2 (Left side): Medium-1 arm (Standard): Chemical used Medium-2 arm (Option): Chemical used DIW Arm Chuck (ADV pin) Spindle & elevating units PM I/O & Safety Box No active jet nozzle PSR-1 & PSR-2 (Right side): Medium-1 arm (Standard): Chemical used Medium-2 arm (Option): Chemical used DIW Arm Chuck (ADV pin) Spindle & elevating units PM I/O & Safety box No active jet nozzle Liquid / Chem supply cabinets (CHC1 / CHC2): CHC1: (Standard & Dual tank) Tank A: Medium REZI38 Mix ratio / Temperature 25°C Medium fill port, type: Auto fill Medium paddle wheel DIW Fill port, type: Auto fill DIW Paddle wheel Medium in-line filtration system Sampling port Buffer tank Suckback valves ULTRASONIC Flow meter Tank B: Used for chemical Medium REZI38 Mix ratio / Temperature 25°C Medium fill port, type: Auto fill Medium paddle wheel DIW Fill port, type: Auto fill DIW Paddle wheel Medium in-line filtration system Sampling port Buffer tank Suckback valves ULTRASONIC Flow meter Dual in-line heater & cooler No DI/O3 line Process pump No booster pump Recirculation pump Drain pump CHC2: System standard: (8) Chambers System option: (4) Chambers Tank A: Medium paddle wheel DIW Paddle wheel No medium in-line filtration system Sampling port No buffer tank Suckback valves ULTRASONIC Flow meter Tank B: Medium paddle wheel DIW paddle wheel No medium in-line filtration system Sampling port No buffer tank Suckback valves ULTRASONIC Flow-meter Dual in-line heater & cooler No DI/O3 line Process pump No booster pump installed Recirculation pump Drain pump CDS I/O & safety box Separate drain Chemical supply: Med-1 Pre mix Med-2 Pre mix DIW Option: HORIBA Chemical analyzer Safety: Earthquake protection FM 4910 Compliant material No main unit drip pan No drip pan leak detection Host control: SECS II (HSMS) No SECS II (RS232) User interface: Status lamp (R/Y/B/G) Sound module Front & back side UI (touch+keyboard) Options: Wafer handling robot display (CCD / Monitor) Process chamber display No dedicated backing pump No XRD module No ozone module Transformer: 30 kVA Transformer CE compliant (Input 208 Y) No transformer CE compliant with GFI (Input 208 Y) UPS No entire system (30 kVA): In 400 VAC / Out 400 VAC No control PC only (2 kVA): In 230 VAC / Out 230 VAC No pre-etch thickness No post-etch thickness No target uniformity of etch No backside surface conditioning No rough finish No polished finish No front-side etch No back-side etch No backside etch & bevel clean No oxide thinning / Removal No nitride thinning / Removal No polysilicon thinning / Removal No bevel clean No undercut Missing parts: (2) ECO Tune motors (8) Dispenser motors (2) Brake pin cylinders (2) Dispenser nozzles (2) VALVlE SAM-3250-NZD401FFI(12) Drain pump Filter Power supply: 208 VAC, 20 kVA Power Distribution Box (PDB) CE Color code No UL color code 2007 vintage.
SEZ/LAM RESEARCH DV-34是一種高性能的蝕刻器/asher,可提供最高效可靠的基板加工。該工具具有先進的特點和卓越的精度,非常適合許多不同的應用,從濺射和陽極氧化到抗去除和光刻。蝕刻器/灰燼氣體輸送設備旨在最大限度地提高吞吐量,同時最大限度地減少基板損壞。它還提供了對氣流和工藝參數的精確控制,以提供一致的結果。蝕刻器/asher的旋轉基板允許對所有尺寸不超過8英寸的基板進行快速旋轉和移動處理。它采用通用驅動系統,壓力和流量可調節,以適應不同的基板和工藝。此外,其氣體輸送裝置是可調的,以匹配所需的工藝參數,允許在蝕刻和灰化過程中精確控制。它還在向上或向下縮放時配備了腔室保護裝置,確保設備和基板保持在最佳狀態。在軟件方面,SEZ DV-34 蝕刻器/asher有一個靈活的控制機器,用於高級工藝優化和監控。它提供了氣體流動和腔室狀況的實時反饋,以及報警通知、自動超時和遙控功能。用戶界面直觀易用,提供簡單的編程和過程控制。這使得LAM RESEARCH DV-34一個可靠和通用的工具,適用於許多不同的應用.高均勻性、重復性和可靠性使得DV-34蝕刻器/灰度器成為半導體研究和生產的絕佳選擇。它能夠以高達200微米的精度進行濕蝕刻、幹蝕刻和灰化處理。低功耗和工具級診斷使其成為高通量生產環境的一個有吸引力的選擇,而其靈活性和易用性也使其成為高級研究的絕佳選擇。
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