二手 SEZ / LAM RESEARCH RST 201 #293600300 待售

Spin etcher (4) Vertical ring chambers Single wafer process for front and back side Dispenser system CDS System DIW Arm N2 Arm Load system: (2) Open cassettes, 8" Single arm robot with AL vacuum end effector (2) ECO Swivel levers: Front / Back side wafer handling Standard chuck, 8" Vacuum end effector LAUDA Heater exchanger Temperature: 65°C Power: 2.3 kW Dry N2 monitor Suck back system Chemical drain tank PVDF Tube / Tank material PD Box Speed motor CDS With PC Front side control table PC and motor controller Cables Offline monitor Heat exchanger temperature: Warm / Fault: 65 ±2°C Warm / Fault: 65 ±3°C Medium X Flow: Medium 3 Flow (SLM/MN): (HF: CH3COOH 505 LPM) Safety: EMO Type: Turn to release Label: Emergency off EMO Button guard ring Water leak detector DI Rinse flow: DIW (SLM/MN) N2 Dry flow: (SLM/MN) Chuck N2 Flow (SLM/MN): 275 ±25 Chuck spin speed (RPM): During process step: 1000 ±100 Clean process step DI: 1000 ±100 Clean process step N2: 2000 ±100 Chuck pin, P/N: 2006830 ECO Pin, P/N: 2010343 ECO Motor, P/N: 2006775 Pump: Return: Nippon pillar (Bellow pump) Supply: Nippon pillar (Bellow pump with accumulator) Suck back valve: Filter Chuck motor hauser 63A Line amperage 400 LPM Glass flow MFM Flow warm / Fault Frequency: 50 Hz Does not include: Wafer defect system: Glass Chemical filter Touch screen monitor Power supply: 200-208 V, 4 W, 3 Phase.