二手 TEGAL 6550 #9155217 待售
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ID: 9155217
晶圓大小: 8"
優質的: 2003
Reactive Ion Etcher (RIE) system, 8"
Platform: Rinse / Strip, through-the-wall, signal tower
PDM: Standard
System includes:
(2) Patented spectra plasma process modules
Standard ceramic electrostatic clamp (200 mm)
High temperature electrostatic clamp (200 mm)
(2) Integrated diode array optical analyzers
(2) Recirculating temperature control units
Vacuum cassette elevator loadlock
Core vacuum transport module with robot
Wafer aligner module
ICP Strip process module
Spin rinse / Dry process module
Atmospheric transport module with robot
Remote RF generator cabinet
Remote power distribution module
Integrated human interface and control system
Remote LCD interface module
Cleanroom signal tower (3 Color standard)
PM 1: Spectra 1.0, Special HT-ESC
MFC Type: MYKROLIS TYLAN FC2900
Gas 1: BCl3, 0-200sccm
Gas 2: Cl2, 0-50sccm
Gas 3: SF6, 0-50sccm
Gas 4: HBr, 0-50sccm
Gas 5: CF4, 0-50sccm
Gas 6: Ar, 0-200sccm
Gas 7: He (Water temperature control)
LF Generator: 600 watts
HF Generator: 1200 watts
Gas injection: Open ring
PM Turbo pump: 1000L/s
End point: Diode array
LE Temp range: Filtered house cooling water
PM 2: Spectra, special high vacuum mod's
MFC Type: MYKROLIS TYLAN FC2900
Gas 1: Spare
Gas 2: Spare
Gas 3: He, 0-200sccm
Gas 4: Spare
Gas 5: Ar, 0-100+sccm
Gas 6: Ar, 0-500+sccm
Gas 7: He (Water temperature control)
LF Generator: 300 watts
HF Generator: 1200 watts
Gas injection: Open ring
PM Turbo pump: 1000L/s
End point: Diode array
LE Temperature range: Noah precision: GALDEN PFPE HT170
PM 3: ICP Strip module
MFC Type: MILLIPORE TYLAN 2900
Gas 1: O2, 0-2000sccm
Gas 2: N2, 0-500sccm
Gas 3: He, 0-500sccm
PM4: DI Water rinse module
Gas 3: PM3 (strip)
Gas 4: PM2 (etch)
Gas 5: PM2 (etch)
Chambers:
ICP Cl2 / CFxHy Etch chamber (primary etch chamber)
ICP Low-voltage Ar mill "SOM"
Anti-corrosion treatment used with He / H2 or N2 / H2
Anti-corrosion water rinser
O2-Based asher
EDWARDS QDP-40,80
Gas reactor column EDWARDS M150
CE Marked
AC Supply: 400 V, 3 Phase, 50 Hz, 5 wire
2003 vintage.
TEGAL 6550是一種蝕刻器/asher，設計用於正面和背面晶片處理。該系統提供了在基板層內創建3維圖案的高效和經濟高效的方法。6550實現了高度選擇性的加工，同時利用幹蝕刻和濕蝕刻。蝕刻器/asher在基板內具有3維視場,可創建精確的圖樣,而不會造成層的任何物理變形。它還具有6位高分辨率機械移位,非常適合自動和手動對準。TEGAL 6550具有基板移位速率的可調速度，以及用於跟蹤較寬圖樣的激光掃描系統。蝕刻器/asher利用先進的計算機控制平臺,具有可集成到其他系統的聯網功能。此外，6550還配備了一個內置軟件包，用於執行不同的蝕刻任務。該軟件包用戶友好、直觀，方便用戶理解和優化蝕刻過程。TEGAL 6550配有多種組件,包括驅動板、電源和冷卻系統。它還提供了一個集成的、隔離的射頻發生器，以提高蝕刻工藝的吞吐量。此功能可確保最大程度地控制蝕刻過程。6550還具有多項高級安全功能,包括自動斷電功能,該功能在不使用時關閉系統,以及內置的ETCHER安全開關,該開關允許僅訪問已批準的用戶。總而言之，TEGAL 6550是為高精度基板加工而設計的先進蝕刻器/asher。它具有很高的可靠性和經濟效益,並具有精確和精確蝕刻所需的所有功能。
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