二手 TEL / TOKYO ELECTRON Unity IIe #9093721 待售

TEL / TOKYO ELECTRON Unity IIe
ID: 9093721
晶圓大小: 8"
優質的: 1998
Dry etcher, 8" Configuration: Unity 2 DRM Chamber type: DRM Software version: Ver 3.61-Rev 212 Wafer type: Flat Main body type: Wide Chamber: 2-Chamber Robot type: Yaskawa/Twin arm Robot drive: Yaskawa/VS2A Robot drive: Yaskawa/Vosh Pendulum valve: VAT/65046-PH52 Isolations V/V: Present Pressure gauge: MKS/627A-13614-S TMP1: Seiko Seiki/STP-1303W1 TMP2: Seiko Seiki/STP-1303W1 TMP Con't1: Seiko Seiki/STP-1303W1 TEMP Con't2: Seiko Seiki/STP-1303W1 Generator1: ENI/OEM-25B-01 Generator2: ENI/OEM-25B-01 Matcher1: ENI/MWD-25LD Matcher2: ENI/MWD-25LD Chiller1: SMC INR499-201 Gas: 8-Line STEC/Aera B.HE (CNT): STEC/SEC-7440 B.HE (Edge): STEC/SEC-7440 Main controller: ISA SLOT1 NE2000 PLUS3N-2 Present ISA SLOT2 IBX4101 Present ISA SLOT3 EMPTY Present ISA SLOT4 AT-BCN/A Present HDD(SYSTEM) Present HDD(DATA) Present VME slot 1 SVA 004a Present VME slot 2 SVA603 Present VME slot 3 MVME612 Present VME slot 4 GST-M-SET-312 Present VME slot 5 TVB0002 Present VME slot 6 TVB0010-1 Present VME slot 7 TEB102-1 Present VME slot 8 EMPTY VME slot 9 TVB0008 Present VME slot 10 TEB3101-1 Present TYB221-1/PUMP Present TYB415-1/RF Present TYB212-1/RF Present TYB416-1/PUMP Present TYB414-1/CONT Present TYB425-1/INT Present P/C1 Controller: Slot 1 APC(PB-2) Present Slot 2 TYB112-1/DIO Present Slot 3 TYB111/MAIO Present Slot 4 TYB121/COM Present Slot 5 TYB121/COM Present Slot 6 TEMP Present Slot 7 EMPTY P/C2 Controller: Slot 1 APC(PB-2) Present Slot 2 TYB112-1/DIO Present Slot 3 TYB111/MAIO Present Slot 4 TYB121/COM Present Slot 5 TYB121/COM Present Slot 6 TEMP Present Slot 7 EMPTY T/C Controller: Slot 1 COM Present Slot 2 TYB112-1/DIO1 Present Slot 3 TYB112-1/DIO2 Present Slot 4 TYB112-1/DIO3 Present Slot 5 MAIO Present Slot 6 TYB131-1/ILK Present Gas Box module: TYB 211-A/GAS(1) Present TYB 211-A/GAS(2) Present 1998 vintage.
TEL/TOKYO ELECTRON UNITY IIe 蝕刻器/asher是一種可靠、經濟高效、高效的蝕刻和灰化工藝,非常適合設備級處理、產量管理和產品創新。TEL Unity IIe是TEL先進的等離子體蝕刻器和分離器之一,旨在提供極其精確的處理。該工藝室額定為10,000級清潔,並配備了自動燃氣開關、自動平衡配電等先進的工藝控制功能,確保了優越的蝕刻和灰化性能。TOKYO ELECTRON UNITY IIe使用低壓等離子體蝕刻工藝,非常適合創造高縱橫比特性。它采用了PECVD塗層,可創建精確的保形塗層以提高蝕刻和灰化精度。為了提高工藝經濟性,Unity IIe能夠單次處理大型晶片。它采用8x300mm晶圓尺寸,溫度可編程用於優越的基材粘附。TEL/TOKYO ELECTRON UNITY IIe還附有多站晶片卡帶加載、自動清除故障安全保護以及直觀的自動晶片加載技術,以確保出色的晶片處理和吞吐量。TEL Unity IIe還具有可配置的工藝氣體管線,可用於蝕刻、灰化或兩種工藝的組合。它有五個獨立的氣體輸送系統,能夠優化蝕刻剖面以獲得最佳蝕刻結果。此外,TOKYO ELECTRON UNITY IIe還配備了可定制的工藝配方、可調參數,以及高級在線反饋控制,以獲得卓越的蝕刻精度。Unity IIe設計用於各個行業,如半導體、消費電子、MEMS和LED制造。TEL/TOKYO ELECTRON UNITY IIe憑借其強大的蝕刻和灰化能力,每小時可快速處理260-300個晶圓,同時實現優越的均勻性。它能夠完全控制過程參數,以確保重復和一致的結果,提高產品的可靠性和產量。
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