二手 EATON NOVA / AXCELIS GSD 200E2 #9026352 待售
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ID: 9026352
Ion implanter, 8"
(13) Batch wafers
Application process: High current implanter
System software Version: 4.9.1 (Sun OS)
Utility gas:
CDA, Machine air, Swagelok, 3/8" Sus male
Ar, Process air, Swagelok, 3/8" Sus male
PN2, Process vent, Swagelok, 3/8" Sus male
GN2, Purge vent, Swagelok, 3/8" Sus male
Exhaust:
(2) Environment, GEX, 500 CFM, 8" PVC, has exhaust hood
(2) RP Exhaust, SEX, 2" Sus, has exhaust hood
(1) Cyro pump, SEX, 20 CFM, 2" Sus, no exhaust hood
(1) Gas cabinet, SEX, 500 CFM, 8" PVC, 1, has exhaust hood
(1) Source cleaning exhaust, SEX, 65, 2.5" PVC, no exhaust hood
Cooling water:
(2) RP Cooling water, 14~28 psi, 5~8 GPM, 24º C, 3/8"
(1) City water, 55~75 psi, 7.5 GPM, 24º C, 1", to DI cooling water
(1) Cyro compressor, 14~28 psi, 5~8 GPM, 24º C, 1"
Endstation module:
(4) Cassette table (280 mm)
(2) Load buffer
(1) Dummy buffer
Mini-environment: Synetics
ATM Robot: OK
Notch/Flat finder: Notch type
Vacuum cassette: STD (VESPEL Support pin)
Load port interface: N/A
Beam profile oscilloscope: Tektronix TDS 210
Cell controller/version: Cell 177 (1915690, Rev. A)
Loadlock type: STD
Main SUN computer: Sparc station 5
Main monitor: 17", LCD
Second SUN computer: Yes (function unknown)
Second SUN monitor: N/A
Tape reader: NG
Printer: N/A
Process module:
Disk: Seg Si Coated, P/N: 11027061
Flag faraday with SRA: OK (11019550)
Electron/plasma shower: P-shower (1190160)
Plasma shower filament PS: Yes (EMS)
Bias aperature: Yes
Shower gas panel: Yes (STEC SEC-7320, 2 sccm)
Water bleed MFC: MKS (Type: 1150)
Ar/Xe Beamguide gas: Motor control
In-Vac arm: Yes
Wafer holder: Yes
Disk wafer clamp/unclamp: Roller type (1180270)
Gyro/Angle: NV-GSD-100
Linear drive: OK
Rotary drive: Direct drive
HYT Sensor: Yes (20SX)
Beam profile holes: N/A
Disk RGA Port: Yes
Resolving housing RGA Port: N/A
Wafer charge sensor: Yes
P-Shower charge monitor: Yes
P-Shower disk current: Yes
Loadlock controller type: 4-Axis DI
In-air wafer xfer controller: 4-Axis DI
Robot controller: 4-Axis DI
Beamline module:
HV Power supply: Hitek Power Inc.
HV Stack: OL8000/104/30, 100 KV
Post Accel. Volt: N/A
Extraction suppression PS: Glassman, PS/NV-15NN33, 2200158
AMU: Acelis
AMU PS: EMS 40-150-2-D0816
Hall probe: Axcelis
Max. extraction voltage: 90 KeV
Beam profiler hole: N/A
Decel function: N/A
Beamline purge kit: N/A
Source module:
Source head/vaporizer: ELS/No vaporizer
Filament PS: EMS 10-60
Arc PS: EMS 150-7
Cathode PS: yes
Vaporizer PS: N/A
Source magnet: Axcelis
Source magnet PS: EMS 25-25
Source bushing: Orange
Extraction assembly: Yes
Variable resolving aperture: Yes
Source ISO Transformer: STD
Source injection kit: N/A
Source cleaning exhaust: Yes
Block type: N/A
Gas box module:
Gap Loop #1: Ar, HP
Gap Loop #2: BF3, SDS
Gap Loop #3: AsH3, SDS
Gap Loop #4: PH3, SDS
Loop #1 MFC: MKS 1179A-14493, Ar, 10 sccm
Loop #2 MFC: MKS 1640A-011, BF3, 10 sccm
Loop #3 MFC: MKS 1640A-011, AsH3, 10 sccm
Loop #4 MFC: MKS 1640A-011, PH3, 10 sccm
Vacuum system:
P1/Source turbo: A2203C, SEIKO SEIKI
P1 Controller: STP-A2203C, SEIKO SEIKI
P2/Beamguide Cyro pump: CTI OB-8
P3/V3 Cyro pump: CTI OB-10
P9/Disk Cyro pump: N/A
RP1: Remote
RP2: Remote
IG1: SUZUKI G-75-NTT
P IG1: SUZUKI G-75-NTT
IG2: SUZUKI G-75-NTT
IG3: Stabile ion gauge
IG Controller: M/N: 360
Safety options:
(4) Smoke detectors
VESDA: N/A
CES Options: N/A
Others:
(2) Ground bars
Enclosures: OK
Ground indication lamp: N/A
INO Kit: N/A
Drawings/Manuals: N/A
SECS/GEM Function: OK
System 24V UPS: N/A
Light tower: G/Y/R
SPC Function: OK
Does controller pcomp. algorithm type: Turbo dose DI (1526990)
Spare parts: N/A
Alignment tools: N/A
Sub-systems:
Main Transformer: TAVR, 3 Phase, 60 Hz, 50 KVA, Pri. 440 V
RP1: Ebara, A70WN
RP2: Ebara, A70W
Compressor 1: CTI_CRYOGENICS, 9650
Input power: 208 V, 60 Hz, 3 Phase, 95 A, 35 KVA
Output power: 90 KeV, 20 mA
2001 vintage.
EATON NOVA/AXCELIS GSD 200E2是由EATON NOVA Technologies, Inc.的子公司AXCELIS開發的離子植入器和監視器。它為離子植入過程提供了卓越的性能、可靠性和多功能性。AXCELIS GSD 200E-2提供各種植入深度和直徑,分別高達8kV和3.0 T/m。它結合了封閉式束流設計,並配備了源和束流氣體系統。氣體系統,從束線外調節,提供最佳的粒子能量,工作壓力,角度形狀,和燈絲的位置。EATON NOVA GSD 200 E2配備了最先進的手動和自動操作控制系統。在觸摸面板顯示屏上,用戶可以控制腔室壓力、燈絲和設置。它還具有內置的診斷功能,使操作員能夠實時和遠程監視系統,包括溫度、電壓和氣體水平。EATON NOVA/AXCELIS GSD 200E-2采用可移動機械快門打造,提供額外的安全性和準確性。在安全性等性能特點上,AXCELIS GSD 200 E2配備了聲學外殼,以及符合半導體加工安全要求的輻射和真空外殼。AXCELIS GSD 200E2是高性能植入器服務市場中唯一能夠提供快速、精確讀數的離子植入器和顯示器。不僅GSD 200E2提供精確的植入,它還監控和控制整個過程中的環境。它能夠檢測和響應粒子軌跡、光束輪廓和統計參數。通過先進的傳感器和軟件設計,系統能夠確保精確的植入性能和更少的顆粒損傷。此外,EATON NOVA/AXCELIS GSD 200 E2允許小顆粒的緊密植入。這對於MEMS和其他微設備制造等技術過程至關重要。EATON NOVA GSD 200E-2還具有廣泛的粒子類型和大小,以及不同離子種類之間的高速切換。GSD 200E-2是市場上性能最高的離子植入器和監控器。
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