二手 EATON NOVA / AXCELIS GSD 200E2 #9312589 待售

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ID: 9312589
High current implanter, 8" SMIF System: Interface Handle systems: SDLC System In air robot Load buffer Dummy buffer Vacuum cassette Tilt stand Notch aligner Process chamber: Batch Disk 13-pads, 8" In-vacuum arm Wafer holder AFFINITY Disk chiller AFFINITY Single close loop cooling chiller Vacuum system: CTI-CRYOGENICS 8200 Cryo compressor CTI-CRYOGENICS 9700 Cryo compressor CTI-CRYOGENICS OB 8 Beam line cryo pump CTI-CRYOGENICS OB 10 Beam line cryo pump No process cryo pump EDWARDS STP-2203C Source high vacuum pump EDWARDS QDP Rough pump HCIG Vacuum gauge controller End station: 4-Cassette table Wafer aligner type: Notch aligner Wafer handling system: In air / In vacuum high throughput Particle filter system: Class 1 UPLA Implant angle: 2-Axis variable: ± 7° Quad implant capability Process disk spindle: GSD Direct drive Beam monitor system: In situ beam potential monitor Real-time patented dose control Real-time beam profiler (1D) Process disk: Silicon coated UHD small radius fences Process disk cooling interlock ASYST LTP2000 SMIF Interface Gas box option: Modular gas box / 4-Strings option 1 HP (MFC Unit 1660) 3 SDS (MFC Unit 1662) Extraction power supply: 90 keV Extraction voltage monitor Vaporizer Ion source: ELS Source bushing: Extended life bushing Extraction electrode: Type 34 Source injection kit AMU System: Triple index Post accel power supply: 90 keV Post accel electrode Terminal isolation transformer: Dry transformer Bias aperture assembly Flag faraday Secondary electron flood gun: PEF Control UPS Main isolation transformer Smoke detector Exhaust flow switch Water leak sensor Light tower No real-time particle detection Earthquake retrofit SUN Solaris operator workstation Hard Drive Drive (HDD) LCD Monitor, 21" SECS I and SECS II Protocols GEM Interface and Ethernet ports CIM: Solaris 2006 vintage.
EATON NOVA/AXCELIS GSD 200E2是一種離子植入器和監控設備,旨在提供卓越的離子植入性能、過程控制和均勻性。該系統為離子化和非離子化物種的高能離子註入提供了多種配置,性能和準確性都很高。AXCELIS GSD 200E-2是一個多軸單元,結合了2軸掃描加速器和4軸伺服運動工具,用於定位和優化離子植入。該資產使用直徑200毫米的射頻驅動植入槍在整個基板表面以光滑、均勻的輪廓產生離子。該槍的運動是通過先進的伺服控制器和獨立的磁場來實現的。該模型配備了一個板載探測器,用於監測植入過程。該檢測器還可以與專門的監控策略結合使用,以控制植入率和均勻性。EATON NOVA GSD 200 E2旨在滿足現代半導體加工的苛刻要求。它符合嚴格的安全法規,並配備了一系列安全功能,以保護操作員免受輻射風險和植入過程中使用的潛在危險材料的傷害。此外,該設備還配備了業界領先的自動化能力,允許直接操作和優化植入過程。總體而言,EATON NOVA GSD 200E-2是一個可靠、可控和精確的離子植入系統,旨在提供卓越的效果。它提供了廣泛的能力,包括電離和非電離物種的高能離子植入,出色的過程控制和舒適的操作。單位還符合嚴格的安全要求,保證了宜人安全的工作環境。
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