二手 EATON NOVA / AXCELIS NV GSD 200E2 #9224295 待售

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ID: 9224295
晶圓大小: 8"
High current ion implanter, 8" 180 keV SMIF System: ASYST LPT2200 SMIF Interface capability Hardware configuration (Subfab / Auxiliary units): Cryo compressor Disk chiller Vacuum system: Cryo compressor 1: CTI-8200 (P2) Cryo compressor 2: CTI-9700 (P3) Beam line cryo pump 1: OB 8 ( P2 ) Beam line cryo pump 2: OB 10 (P3 ) No process cryo P9 Source pump: STPA2203C ( P1 ) No AMU Turbo pump Terminal rough pump: EBARA Pump 40x20 ( RP1 ) Endstation rough pump: EBARA Pump 40x20 ( RP2 ) Vacuum controller: HCIG End station: (4) Cassettes Wafer notch alignment: Automatic notch alignment capability with buffer cassette Dummy wafer: Integrated dummy wafer fill-in capability Wafer handling system: In-air / In-vacuum high throughput wafer handling system Particle filter system: Class 1, UPLA filtered wafer handling system Implant angle capability: Two axis variable implant angle (+/- 11 deg in two axes) Quad implant capability Process disk spindle: GSD Series belt drive process disk With active cooling and external close loop chiller Beam monitoring system: In situ beam potential monitor Real-time patented dose control Real-time beam profiler (Single dimension) Process disk: Silicon coated process disk (UHD Small radius fence) Process disk cooling interlock Gas box options: Modular gas box (4) String gas box options High pressure string (2) SDS String hydride (Arsine and phosphine) SDS String flouride (Boron trifluoride) (3) Pressure transducers on SDS string: PSIA Mass flow controller: 1660 Kit (3) 1662 Kits Extraction PS: 0-90 kV Extraction voltage monitor Vaporiser Ion source: Eterna ELS (Extended life source) Source bushing: Extended life bushing Source liner for extended life bushing N2 Purge: Bypass valve and nitrogen purge Extraction electrode 34 Source injection kit AMU System: Triple indexed mass analysis magnet and power supply Post accel PS: 0 -90 kV No post accel electrode Terminal transfomer: Dry transformer Bias aperture assy Flag faraday Charge control technology: Secondary electron flood gun: PEF Closed-loop cooling system selection: Cooling system: Single loop affinity chiller Control UPS Main isolation transformer Abatement system: EGS237 Novapure Smoke detector Exhaust flow switch Water leakage sensor Light tower No real time particle detection system Advanced automation package: SUN SOLARIS Operator workstation: Hard drive, 21" monitor SECS I and SECS II Protocols GEM Interface and ethernet ports CIM Linked Missing parts: Gauss probe / Controller Arm servo motor assemble Wafer handler / Gyro controller Cryo controller interface Cell controller part Extraction electrode board MFC Interface board Source assembly Post stack assembly.
EATON NOVA/AXCELIS NV GSD 200E2是一種離子植入器和監控器。這類設備用於通過薄膜將離子植入基材或靶材中。該裝置專為高速高溫植入而設計,非常適合半導體等技術應用。AXCELIS NV GSD-200E2采用四極管類型的離子源,在2至200 KeV的能量下加速離子。這類離子源的覆蓋範圍很廣,可以精確定位離子束。該設備還具有可調的初級加速電壓,可以根據目標材料的需要進行更改。此功能可確保設備提供一致的離子束,從而實現最均勻的植入。此外,還可以調節離子源以提供一定範圍的離子束能量,從而確保目標材料的最佳植入深度。離子植入過程的監測是通過多種不同方式完成的。EATON NOVA NV-GSD 200E2配備了數字顯示屏,可以精確讀取離子電流、能級等等。此外,設備還配備了離子束數據記錄器,可以準確讀取所有離子註入參數。此外,該設備還能夠實時分析離子束參數,使操作員能夠快速響應束參數的任何變化。EATON NOVA NV-GSD 200E-2旨在在各種植入環境中提供安全可靠的操作。該裝置采用高壓隔離變壓器制造,防止對用戶造成危險的電擊。此外,該裝置設計為使用低氣壓環境,確保植入過程的安全。此外,此設備還配備了防錯誤讀出系統,使操作員能夠快速識別植入過程中的任何錯誤。總體而言,EATON NOVA/AXCELIS NV-GSD 200E-2是一種有效可靠的離子植入裝置和監測器。憑借其可調離子源、多種監控和分析選項,以及一系列安全特性,這款設備是半導體等技術應用的理想選擇。
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