二手 EATON NOVA / AXCELIS NV GSD 200E2 #9224295 待售
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ID: 9224295
晶圓大小: 8"
High current ion implanter, 8"
180 keV
SMIF System: ASYST LPT2200 SMIF Interface capability
Hardware configuration (Subfab / Auxiliary units):
Cryo compressor
Disk chiller
Vacuum system:
Cryo compressor 1: CTI-8200 (P2)
Cryo compressor 2: CTI-9700 (P3)
Beam line cryo pump 1: OB 8 ( P2 )
Beam line cryo pump 2: OB 10 (P3 )
No process cryo P9
Source pump: STPA2203C ( P1 )
No AMU Turbo pump
Terminal rough pump: EBARA Pump 40x20 ( RP1 )
Endstation rough pump: EBARA Pump 40x20 ( RP2 )
Vacuum controller: HCIG
End station:
(4) Cassettes
Wafer notch alignment: Automatic notch alignment capability with buffer cassette
Dummy wafer: Integrated dummy wafer fill-in capability
Wafer handling system: In-air / In-vacuum high throughput wafer handling system
Particle filter system: Class 1, UPLA filtered wafer handling system
Implant angle capability:
Two axis variable implant angle (+/- 11 deg in two axes)
Quad implant capability
Process disk spindle: GSD Series belt drive process disk
With active cooling and external close loop chiller
Beam monitoring system:
In situ beam potential monitor
Real-time patented dose control
Real-time beam profiler (Single dimension)
Process disk: Silicon coated process disk (UHD Small radius fence)
Process disk cooling interlock
Gas box options:
Modular gas box
(4) String gas box options
High pressure string
(2) SDS String hydride (Arsine and phosphine)
SDS String flouride (Boron trifluoride)
(3) Pressure transducers on SDS string: PSIA
Mass flow controller:
1660 Kit
(3) 1662 Kits
Extraction PS: 0-90 kV
Extraction voltage monitor
Vaporiser
Ion source: Eterna ELS (Extended life source)
Source bushing:
Extended life bushing
Source liner for extended life bushing
N2 Purge: Bypass valve and nitrogen purge
Extraction electrode 34
Source injection kit
AMU System: Triple indexed mass analysis magnet and power supply
Post accel PS: 0 -90 kV
No post accel electrode
Terminal transfomer: Dry transformer
Bias aperture assy
Flag faraday
Charge control technology:
Secondary electron flood gun: PEF
Closed-loop cooling system selection:
Cooling system: Single loop affinity chiller
Control UPS
Main isolation transformer
Abatement system: EGS237 Novapure
Smoke detector
Exhaust flow switch
Water leakage sensor
Light tower
No real time particle detection system
Advanced automation package:
SUN SOLARIS Operator workstation: Hard drive, 21" monitor
SECS I and SECS II Protocols
GEM Interface and ethernet ports
CIM Linked
Missing parts:
Gauss probe / Controller
Arm servo motor assemble
Wafer handler / Gyro controller
Cryo controller interface
Cell controller part
Extraction electrode board
MFC Interface board
Source assembly
Post stack assembly.
EATON NOVA/AXCELIS NV GSD 200E2是一種離子植入器和監控器。這類設備用於通過薄膜將離子植入基材或靶材中。該裝置專為高速高溫植入而設計,非常適合半導體等技術應用。AXCELIS NV GSD-200E2采用四極管類型的離子源,在2至200 KeV的能量下加速離子。這類離子源的覆蓋範圍很廣,可以精確定位離子束。該設備還具有可調的初級加速電壓,可以根據目標材料的需要進行更改。此功能可確保設備提供一致的離子束,從而實現最均勻的植入。此外,還可以調節離子源以提供一定範圍的離子束能量,從而確保目標材料的最佳植入深度。離子植入過程的監測是通過多種不同方式完成的。EATON NOVA NV-GSD 200E2配備了數字顯示屏,可以精確讀取離子電流、能級等等。此外,設備還配備了離子束數據記錄器,可以準確讀取所有離子註入參數。此外,該設備還能夠實時分析離子束參數,使操作員能夠快速響應束參數的任何變化。EATON NOVA NV-GSD 200E-2旨在在各種植入環境中提供安全可靠的操作。該裝置采用高壓隔離變壓器制造,防止對用戶造成危險的電擊。此外,該裝置設計為使用低氣壓環境,確保植入過程的安全。此外,此設備還配備了防錯誤讀出系統,使操作員能夠快速識別植入過程中的任何錯誤。總體而言,EATON NOVA/AXCELIS NV-GSD 200E-2是一種有效可靠的離子植入裝置和監測器。憑借其可調離子源、多種監控和分析選項,以及一系列安全特性,這款設備是半導體等技術應用的理想選擇。
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