二手 SEN / SUMITOMO EATON NOVA NV-GSD-HE3 #9283246 待售
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ID: 9283246
晶圓大小: 12"
High energy implanter, 12"
(4) FOUP
Energy range: 10 KeV to 3750 KeV with RTEM (Real Time Energy Monitoring Capability)
UPS: MUF3051-BL
Mass analysis magnet and power supply
Inject flag faraday
Power supply: 3 kW 13.56 MHz
High voltage beacon
Does not include Hard Disk Drive (HDD)
Liner accelerator:
(12) High energy resonator cavities
(14) Quadrupole
Quadrupole lens and power supply
Final energy magnet and power supply
Resolving faraday
Continuous variable aperature
End station wafer handling:
In-air / In-vacuum high throughput wafer handling system
Sub-class 1, ULPA filtered wafer handling area
Automatic notch alignment capability with buffer cassette
Integrated "dummy wafer fill-in capability
Slot to slot wafer integrity
End station disk:
Two axis variable implant angle
(13) Wafers process disk with direct, 12"
End station dose control:
Real time patented dose control
End station robot: SEN MACOROB 300
End station option:
Valved RGA Port on end station resolving
Valved RGA Port on disk module
Faraday burn through sense
Facilities utilities:
Feed from bottom
Feed gas box exhaust from top
Facilities cable:
Remote cryo pump compressor cable
Remote disk chiller cable
Facilities:
Main PD assembly
Signal tower light assy
(4) Light CE
Fire safety kit:
Smoke detector
VESDA
60 Hz Standard
Gas box exhaust needs to feed from top
High voltage warning display - English
Gas box:
Gas 1 type Gas box gas type position Ar with HP
Gas 2 type Gas box gas type position BF3 with SDS
Gas 3 type Gas box gas type position BF3 with SDS
Gas 4 type Gas box gas type position PH3 with SDS
Gas 5 type Gas box gas type position PH3 with SDS
MFC2 Unit 8160 10 ccm
MFC3 Unit 8162 5 ccm
MFC4 Unit 8162 10 ccm
MFC5 Unit 8162 10 ccm
Remote rack:
SEN chiller
Heater exchange from FAC
Service PC X-terminal
Door Bypass Switch:
Source head: ELS
3-AXIS Extraction electrode:
Vacuum Cryopump CP2 BROOKS OB-8
Vacuum Cryopump CP3 BROOKS OB-10
Vacuum Cryopump CP7 BROOKS OB-250F
Vacuum Cryopump CP8 BROOKS OB-250F
Vacuum STP-2203C TP1
Vacuum STP-A803C TP4
Vacuum STP-A1303C TP5
Vacuum STP-A803C TP10
Vacuum STP-A1303C TP11
Vacuum STP-A803C TP12
Manuals included.
SEN/SUMITOMO EATON NOVA NV-GSD-HE3是一種具有監控技術的高性能高能離子植入器。這種裝置能夠提供受控的、高效的重離子植入，如砷、的、和的，用於半導體制造。該植入器還提供超精密印跡和極快的高壓開關，用於精密植入控制。SEN NV-GSD-HE3可以接受廣泛的材料，包括金屬和無機材料，以及其他化合物和底物。它允許高精度的離子加速度和光束控制，具有廣泛的能量和劑量設置。該設備采用符合人體工程學的設計,以實現最高的效率和安全性。該裝置配有先進的光束監測系統，使用高精度探測器檢測光束漂移和汙染。此功能有助於確保材料的最高質量植入。該裝置具有高精度離子源、高精度光束光學器件、精確光束傳輸和高精度紫外線光學器件。由高品質材料打造而成，具有耐用性和高性能。該裝置提供對離子釋放量和位置的精確控制，以實現高度精確的離子註入。SUMITOMO EATON NOVA NV GSD-HE3最獨特的特點之一就是它能夠直接實時測量光束的劑量。這種技術和容量使用戶能夠調整其設置，就像他們正在改變其標線的電子束電流的輸出一樣。該設備還具有更高的吞吐量速率,從而提高了生產率。此外,此設備還提供閉環反饋調節,允許用戶以高精度調整光束移動速度。該裝置還可與各種類型的植入物，如線條、均勻、形狀植入物的多種圖案生成器配合使用。該裝置設計用於廣泛的應用，包括半導體晶片的處理、無機材料的退火以及基板膜的制造。也可用於制造薄膜，控制重離子和電荷交換元件的植入。NV GSD-HE3在安全和易於使用的封裝中提供高度先進的植入技術和性能。該設備非常適合各種植入和處理應用，並提供高精度、可靠和可重復的植入。這種可靠多用途的裝置在重離子和其他材料的植入方面提供了一致的性能、安全性和效率。
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