二手 VARIAN VIISta 3000HP #9203292 待售

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ID: 9203292
晶圓大小: 12"
優質的: 2005
High energy implanter, 12" Energy range: 10 keV to 3750 keV Voltage divider Base system Power Distribution: 60 Hz Solid state: 0.75 MV D.C.Tandetron(TM) Accelerator provides: High output tandem NSI power supply ASME/TUV Certified accelerator pressure vessel VIISta single wafer processing end station with integral orientation control 0º- 360º at +/-1º accuracy Precise control of tilt angle combined with fast recipe controlled stepped tilt modes up to +/- 60º at An accuracy of +/- 0.1º Gas cooled electro-static platen Vertical scanning using linear servo motor driven Industrial air bearing Dual wafer capacity: 25 Polished load-locks with independent vacuum control Load lock: 300 mm Automatic pumping system includes: VARIAN Triscroll 300 dry pump for the air-bearing differential seals stage One Diaphragm roughing pump for the air bearing differential seals stage two Venturi pump for the air-bearing differential seals stage three (5) HELIX cryo pumps (3)400mm HELIX standard capacity cryo pumps on the process chambers (2) 250F HELIX high capacity cryo pumps located on beamline (2) PFEIFFER TMH-261 turbomolecular pumps for the end station load locks Turbomolecular pumping system consisting of: PFEIFFER TPH 2101 for the source (2) PFEIFFER TPH 2101 Pumps for the beamline locations Remote pump kit: To locate two cryo compressors DI water system Remote power distribution system includes Standard and included in base system: 15 meters Base system does not include roughing pumps VARIAN VIISta control system Microsoft windows NT(TM)/Windows 2000(TM) Multitasking operating system Next generation software control system monitoring over 3500 implant Equipment parameters for optimal system performance Automatic recipe set-up Optimization Control Production scheduling WIP Tracking System diagnostics Single wafer data logging HSMS SECS / GEM Compliant Multilevel password protected security system SPC Capability Small WIP buffer with 4 load ports Toxic gas box including: Standard inert gas module Exhaust connections from the top source (3) Standard process gas modules (3) manometers (2) exhausts (5) Gas modules plus Inerts (3) Plus Inerts are supplied as standard Long life indirectly heated cathode ion source Differentially pumped ion source chamber System S2-93 CE Compliance High voltage warning displays 3 Locations System signal tower Telemechanique (3) Lights: Green Amber Red Un-interruptible power supply (UPS) to support control system platen EMO Interlocked vesda smoke detection system Source exhaust flow interlock Integrated weight handling tools EMO Safety interlock Lead floor not required Required selects Standard power kit: UES Standard frequency kit: 60 Hz Facilities from top Signal tower: 3 Light standard RYG Standard gas box internal process / External purge Gas box exhaust from the top HP Ar / N2 DISS 718 HP BF3 DISS 642 SDS PH3 VCR 1/2" SDS AsH3 VCR 1/2" Standard on tool chiller Phase 2 IHC source without vaporizer HELIX standard cryo kit: 400 Standard polyflow cryo exhaust Customer supplied pumps to VSEA - Edwards iH-80 VSEA Supplied pfeiffer turbo pump kit Load lock vent standard finish Vent connection standard finish High voltage warning display Remote connection kit standard cryos: 15 Meters (3)Anometer gauges 0: 1kPa Monitors exhaust pressure of the main gas box Source shroud Rough pump Standard UPS V3000 Factory automation kit: Micron Includes indicator control kit E11134600 Hermos integration kit E11139470 Hokuyu E20000323 x 4 Vacuum connections from the bottom Thru-beam wafer mapping Installed Options: Wafer viewing and wafer Id SW - SEMI E58 ARAMS compliance HP BF3 DISS 642 Graphite kit metals reduction Service monitor PC Modification in 2009: V-Mask II upgrade kit Roplat: 300MM NCS Computer kit Modification in 2013: VIISta 3000 S/N ES154017 upgrade E11451460 2Ghz Control system UES NCS IAN Dose controller eprom kit for medium current implanters E11408090 for EHP dose contrllers E11436450 for XP/XPT Dose controllers reference PSB3312L EHP dose contrllrs PSB3651-XP/XPT dose contrllrs 2005 vintage.
VARIAN VIISta 3000HP是一種先進的離子植入器設備,用於半導體晶圓或玻璃等基板中離子的植入和分析。該系統由幾個組件組成,使其能夠高精度運行。VARIAN VIISTA 3000 HP束線從離子源開始,在離子源產生、操縱和聚焦離子束。離子源既可以是金屬蒸發器,也可以是金屬氧化物源,例如鈦、鋅,也可以是移場離子槍。在形成初始光束後,光束線隨後穿過光束光學元件,包括質量分析儀和最終孔徑,以控制光束並調節能量。VIISta 3000HP包括各種分析和植入室。分析室允許同位素分離,而真空相容的植入室允許將離子植入底物和監測劑量均勻性。在該單元中發現的其他特征包括一個健壯的電容或電感耦合等離子體(CPI)源,它確保穩定和快速的植入,同時還允許低能量和單離子植入能力。VIISTA 3000 HP還配備了全方位的外圍設備,包括1kV安裝、四通道波束電流變壓器、節氣門和離子電流監視器。它還包括一個全自動的機器人樣機。所有這些組件協同工作,以確保可重復和準確的植入性能。VARIAN VIISta 3000HP位於植入技術的最前沿,允許精確的摻雜物控制與用戶友好和靈活的機器能力。這臺先進的機器提供低能量的高性能植入,在保持高植入率的同時最大限度地減少離子轟擊造成的傷害。它還具有高級控制工具,為自動化流程提供用戶可編程配方和參數設置。通過利用最新技術,VARIAN VIISTA 3000 HP提供了最可靠和一致的植入系統之一。
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