二手 EVG / EV GROUP 6200 Infinity #9189343 待售

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ID: 9189343
Bond aligner, 8" Wafer to wafer aligner: Subsequent wafer bonding applications General: Software adjustable Wafer separation distance: 0 - 300 μm Wafer thickness: 0.1 - 4.4 mm Total stack thickness: 4.5 mm Semi automatic loading with mechanical prealignment Quick change of chuck Automatic pressure Vacuum transfer Alignment accuracy: ± 1μm High process objectives NRTL Listing mark: UL STD 61010A-1 Storage rack: (5) Aligner tools Software: MS-Windows PC Controlled operating environment Self explaining commands Remote diagnostics1 Software for bond alignment: Recipe parameters User guidance Optical alignment: (2) Wafers Silicon direct bonding (SDB) Substrate configurations: Si+Glass, Si+Si Subsequent anodic Thermo-compression Fusion bonding processes: EVG 500 series bond system Nanoalign technology package: High performance frame grabber running COGNEX PatMax vision software technology Increases EVG aligner microscope resolution: Factor ~2 Image quality: 100 % Digital signal processing Key identification feature: Multi layer alignment key design Scaled (Over / Under etched) alignment keys Enhanced digital zoom capabilities Crosshair mode: Standard backside alignment processes Alignment stage motorized: Alignment stage: X, Y, theta, Z Joystick alignment: Via (3) axes DC Motor controllers: Cursor key fine alignment Automatic wedge compensation system: Optimized print gap control WEC Contact force: 0.5 - 40 N adjustable Shift between mask and wafer: No Automatic alignment for top / bottom side: Vision system (Integrated in PC) Storage: Trained mask Substrate patterns on hard disk Software integrated in EVG 6200 computer controller Alignment marks: Top / Bottom side alignment Alignment results: Process conditions Material properties Bottom side microscope: Motorized splitfield microscopes Visible light with high resolution CCD cameras Digitized alignment keys (Mask) / Cross hair Travel range: X: 78 mm - 180 mm Y: ± 12 mm (2) Objectives: 5x (3.6x - 20x) Objective: 3.6x: Field of view per objective: ~ 1.5 mm x 1 mm Rack unit: Integrates EVG 6200 system Operating elements Monitor vibration isolated Prepared for robotic auto load system Bond tool universal, 8": Anodic Thermo compression Silicon direct bonding process Bond chuck with mechanical clamping Loading chuck Separation flags Currently warehoused 2008 vintage.
EVG/EV GROUP 6200 Infinity是一款掩模對齊器,旨在幫助以更高效的方式制造和分析復雜的微型光學設備。EVG 6200 Infinity將專利蒙版和晶片級與軟件集成在一起,以創建高度可重復和精確的對齊過程。它由具有集成成像和自動化配方的全自動對齊系統組成,以幫助簡化整個流程。EV GROUP 6200 Infinity具有先進的功能,例如優化了兩個基板的定位,並具有頂部和底部成像功能,全面自動設置和執行各種過程,並能夠創建各種成像系統。6200 Infinity提供精確的對齊方式,特別是在光學過程中。它在兩個基板上對齊參考點,確保精確的配準和可重復性,即使結構較小或有多個方向。它還配備了一個獲得專利的0.3微米分辨率對準設備和一個最先進的光學系統,該系統能夠準確地檢測亞微米特征,並顯示單個或兩個基板應用中的特征的精確對準。此外,EVG/EV GROUP 6200 Infinity提高了運行速度,使用戶能夠在最短的時間內生成過程中的優化數據。EVG 6200 Infinity在機組中央進一步配備晶圓夾頭,即使在較高的溫度條件下也能提供長期的穩定性。它還具有擴展的運動功能,允許定制所有運動軸,包括XYZ/V/Z、XYZ/ICH/DCN、XYZ/E/PN和XYZ/V/CN。此外,該機器還提供各種吞吐量優化程序,以適應高容量的產量,以及各種輔助技術,以進一步降低總體成本,同時提高準確性和可重復性。EV GROUP 6200 Infinity確實是一款現代化的蒙版對齊器,為用戶提供精確、可重復的對齊能力,同時提高操作速度和準確性。這使得它成為創建復雜的微型光學設備的理想解決方案,這些設備需要高精度和重復性。
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