二手 EVG / EV GROUP 6200 Infinity #9189343 待售
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ID: 9189343
Bond aligner, 8"
Wafer to wafer aligner: Subsequent wafer bonding applications
General:
Software adjustable
Wafer separation distance: 0 - 300 μm
Wafer thickness: 0.1 - 4.4 mm
Total stack thickness: 4.5 mm
Semi automatic loading with mechanical prealignment
Quick change of chuck
Automatic pressure
Vacuum transfer
Alignment accuracy: ± 1μm
High process objectives
NRTL Listing mark: UL STD 61010A-1
Storage rack: (5) Aligner tools
Software:
MS-Windows
PC Controlled operating environment
Self explaining commands
Remote diagnostics1
Software for bond alignment:
Recipe parameters
User guidance
Optical alignment: (2) Wafers
Silicon direct bonding (SDB)
Substrate configurations: Si+Glass, Si+Si
Subsequent anodic
Thermo-compression
Fusion bonding processes: EVG 500 series bond system
Nanoalign technology package:
High performance frame grabber running
COGNEX PatMax vision software technology
Increases EVG aligner microscope resolution: Factor ~2
Image quality: 100 % Digital signal processing
Key identification feature: Multi layer alignment key design
Scaled (Over / Under etched) alignment keys
Enhanced digital zoom capabilities
Crosshair mode: Standard backside alignment processes
Alignment stage motorized:
Alignment stage: X, Y, theta, Z
Joystick alignment: Via (3) axes
DC Motor controllers: Cursor key fine alignment
Automatic wedge compensation system: Optimized print gap control
WEC Contact force: 0.5 - 40 N adjustable
Shift between mask and wafer: No
Automatic alignment for top / bottom side:
Vision system (Integrated in PC)
Storage:
Trained mask
Substrate patterns on hard disk
Software integrated in EVG 6200 computer controller
Alignment marks: Top / Bottom side alignment
Alignment results:
Process conditions
Material properties
Bottom side microscope:
Motorized splitfield microscopes
Visible light with high resolution CCD cameras
Digitized alignment keys (Mask) / Cross hair
Travel range:
X: 78 mm - 180 mm
Y: ± 12 mm
(2) Objectives: 5x (3.6x - 20x)
Objective: 3.6x:
Field of view per objective: ~ 1.5 mm x 1 mm
Rack unit:
Integrates EVG 6200 system
Operating elements
Monitor vibration isolated
Prepared for robotic auto load system
Bond tool universal, 8":
Anodic
Thermo compression
Silicon direct bonding process
Bond chuck with mechanical clamping
Loading chuck
Separation flags
Currently warehoused
2008 vintage.
EVG/EV GROUP 6200 Infinity是一款掩模對齊器,旨在幫助以更高效的方式制造和分析復雜的微型光學設備。EVG 6200 Infinity將專利蒙版和晶片級與軟件集成在一起,以創建高度可重復和精確的對齊過程。它由具有集成成像和自動化配方的全自動對齊系統組成,以幫助簡化整個流程。EV GROUP 6200 Infinity具有先進的功能,例如優化了兩個基板的定位,並具有頂部和底部成像功能,全面自動設置和執行各種過程,並能夠創建各種成像系統。6200 Infinity提供精確的對齊方式,特別是在光學過程中。它在兩個基板上對齊參考點,確保精確的配準和可重復性,即使結構較小或有多個方向。它還配備了一個獲得專利的0.3微米分辨率對準設備和一個最先進的光學系統,該系統能夠準確地檢測亞微米特征,並顯示單個或兩個基板應用中的特征的精確對準。此外,EVG/EV GROUP 6200 Infinity提高了運行速度,使用戶能夠在最短的時間內生成過程中的優化數據。EVG 6200 Infinity在機組中央進一步配備晶圓夾頭,即使在較高的溫度條件下也能提供長期的穩定性。它還具有擴展的運動功能,允許定制所有運動軸,包括XYZ/V/Z、XYZ/ICH/DCN、XYZ/E/PN和XYZ/V/CN。此外,該機器還提供各種吞吐量優化程序,以適應高容量的產量,以及各種輔助技術,以進一步降低總體成本,同時提高準確性和可重復性。EV GROUP 6200 Infinity確實是一款現代化的蒙版對齊器,為用戶提供精確、可重復的對齊能力,同時提高操作速度和準確性。這使得它成為創建復雜的微型光學設備的理想解決方案,這些設備需要高精度和重復性。
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