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25 結果發現: 用 Molecular Beam Epitaxy

  • VARIAN / VEECO GENXPLORER

    VARIAN / VEECO: GENXPLORER

    MBE Growth system R&D Epitaxial layers on substrates diameter, 3" GEN10™ growth chamber, 3" High-efficiency solar cells High-temperature superconductors Includes: GaGs Nitrides Oxides Direct scalability: GEN20™ GEN200® GEN2000® Capabilities: Extreme high temperature heater (>1850°C) Multiple E-beam source deposition Wafer holder exchange and/or flip Retractable sources System integration: Isolated preparation chamber Multi-system with dissimilar materials VEECO Legacy systems (GENII/GEN930) Atomic layer deposition Metrology (STM, Auger, ARPES, etc.) Platforms: GaAs Nitrides Oxides II/VI.
  • VARIAN / VEECO GEN II

    VARIAN / VEECO: GEN II

    MBE System (2) Sumo cells: In & Ga Cracker cell w/auto valve positioner 9.9^10 with LN2 CBr4 System for carbon Dry scroll pump.
  • VARIAN / VEECO GEN III

    VARIAN / VEECO: GEN III

    MBE System (3) Wafers: 2" Single: 4" Single: 3" Single: 2" / 3 x 2" 1999-2002 vintage.
  • VARIAN / VEECO GEN II

    VARIAN / VEECO: GEN II

    MBE Growth system Applications: Grow lasers Sources: 2"e. Wagon wheel prep chamber with Auger analysis Auxiliary chamber Growth chamber Manual valve Ion-pumped 4-effusion cell system (8) 2" Effusion cells (4) Upward-looking effusion cells All GaAs: InALGaAs based materials with Si and Be dopant sources (3) Ion pumps at the base (2) Sorption pumps Functional RHHed and QMS Spare parts and effusion cells available No phosphorous deposited 6-wafer load lock O2 Plasma source H2S Cracker cell H2S3 Cracker cell Eurotherm temperature controller System operation software and computer 1984 vintage.
  • VARIAN / VEECO GEN II

    VARIAN / VEECO: GEN II

    MBE Growth system Chamber with (8) source flange size 4.5” each Sources: Al, Ga, In, Be, Si, GaTe, As, Sb (2) Ion pumps: Main chamber (600 l/m) Preparation chamber (400 l/m) with (2) power supplies CTI8 Cryo pump for main chamber 6” Turbo pump with dry pump for load lock (2) Ti-Sublimation pumps With power supplies in the base of the main chamber 2" or 3" Sample manipulator with servo motors for rotation Position setting Control unit Beam flux monitor Controller Sample manipulator heater with power supply Temperature controller and display (3) Ion gauges: With (3) power supplies and controllers Main chamber Preparation chamber Load lock Load lock for 4-10 wafers With (1) heater for pre bake out at 150 C With its power supply Temperature controller Preparation chamber With (1) heater for bake out at 400 C With its power supply Temperature controller Electrical distribution panel Bake out panels with electrical connections (8) Shutters with their control units Utility distribution box for water, air, N2 QMS and RHEED with power supplies Operating system and computer (latest version of Moly, or AMBER, or EPIMAX) 4-6 sample holders All gaskets will be silver coated copper gaskets Pyrometer RHEED Camera and analysis software Turn key project Effusion cell: 4.5” flange Dual or single heater up to 1350 C 85-155 CC PBN crucible Power supply Temperature controller.
  • VARIAN / VEECO UHV

    VARIAN / VEECO: UHV

    System SS Chamber: O-ring sealed cover & has a 1 ½" viewport (2) sets of Curvac ports around the circumference Upper set of ports include four 2 ¾" and three 3-3/8" Curvac flanges Pumping system: (2) Ultek sorption roughing pumps including manifold & manual valving Veeco MI300 Mag Ion pump rated at 300 l/s complete w/ Model CU510 power supply Mounted on a compact table.
  • VARIAN / VEECO GEN II

    VARIAN / VEECO: GEN II

    MBE System Chamber with (8) source flange size 2.75” each MBE Components: RHEED System Sample manipulator with flux monitor QMS Head Glove box Pumps: Cryo pump Lon pump Turbo pump (2) Ion pumps: Main chamber (600 l/m) Buffer chamber (150 l/m) with (2) power supplies (2) Ti-Sublimation pumps With power supplies in the base of the main chamber 2" Sample manipulator with servo motors for rotation Position setting Control unit Heater power supply Thermo-couple controller Beam flux Monitor and controller (2) Ion gauges: With (2) power supplies and controllers Main chamber Load lock Load lock for 6 wafers With (1) heater for pre bake out with its power supply Temperature controller Electrical distribution panel Bake out panels with electrical connections Eight shutters with their control units Utility distribution box for water, air, N2 QMS and power supply and display unit Operating system and computer (6) Sample holders Baffles head for main chamber turbo pump All gaskets will be silver coated copper gaskets Mixing manifold With (2) leak valves and tubing for gas inceptor Sulfur automatic valved cracker with: (2) Temperature zones 100 CC quartz crucible (2) Power supplies (2) Temperature controllers Servo motor and controller and cable Oxygen plasma source with: RF Power supply Matching unit Leak valve Water flow meter and filter High temperature effusion cell with: One temperature zone up to 2000 C 10 CC crucible Power supply and temperature controller Low temperature effusion cell with: (2) Temperature zones (base and tip) 25 CC PBN crucible (2) Power supplies (2) Temperature controllers Gas injector with: Single heater Power supply Temperature controller and display Mixed manifold with two leak valves and tubing Options: QCM Integrated With machine for film thickness monitor RHEED System With 6" phosphorous screen and detector and camera E-beam gun with power supply and control unit.
  • RIBER CBE-32

    RIBER: CBE-32

    Reactor, 5", 2" x 1 Solid source :Si, Al, Ga, In×2, Be×2 Gas source: AsH3, PH3 Chambers: entrance, transfer, growth PHEEd, PYRO, LN2 liquid separate Scrubber for gas.
  • RIBER CBE-32

    RIBER: CBE-32

    Electron beam evaporator.
  • RIBER 2300

    RIBER: 2300

    MBE System Growth of GaAlAs (III-V compounds) Under vacuum Single wafer system, 2" Includes: Spare modules Vacuum pumps Spare parts REED / Auger attachments Manuals 1982 vintage.
  • OXFORD: VG 80

    MBE System.
  • VARIAN / VEECO GEN II

    VARIAN / VEECO: GEN II

    MBE System MBE Switching unit Low vacuum gauges Low vacuum and loading chamber vacuum measuring unit Loading chamber Magnetic-discharge pump Technological chamber with (8) molecular sources With diffractometer screen Units for residual gases control Backside equipment with idle cryo-pump Molecular sources control unit (Left) Manual cover sheet 1982 vintage.
  • VARIAN / VEECO GENXPLOR

    VARIAN / VEECO: GENXPLOR

    MBE Growth system Vacuum barrier VBC LN2 Piping system included kSA 400 Analytical RHEED system, 6" With k700-12 detector RF Plasma source for nitrogen GENxplor RF Source for nitrogen to change from phosphorus to nitrogen RF Automatic matching unit: Autotuner source N2 - Nitrogen plasma source Auto tuner power option: 110 - 110 VAC (2) Projects: GaP On sapphire (and Si), phosphorus-based red LED application GaN On sapphire MBE Growth chamber / Source flange assembly Includes: Growth chamber with flat seal flange Full panel liquid nitrogen cooled cryoshroud (10) 4.625" CF Effusion cell ports 4.625" x 4.5" Water-cooled source enclosures configured with sources (10) Pneumatic effusion cell shutter ports Shutter assemblies configured with sources Top 21.5" CF Flange: 8" Manipulator port with Z-motion single platen horizontal manipulator stage 3" Single zone substrate heater with non-contact Thermocouple and servo motor control for rotation Capable of 1000°C TIC temperature Capable of up to 60 RPM in either direction DC Power supply 2.75" CF With pneumatically actuated main substrate shutter (2) Liquid nitrogen feedthrus (Female bayonet) (4) 2.75" Effusion cell viewing ports with shutters Integral pumping chamber pumping package: 10" CF Pump port with cryo pump package Includes: 1,500 CTI CT8 Cryo pump VAT Pneumatic gate valve Cryo compressor Helium lines and cold head cables 8" CF Pump port with ion pump package 220 I/s Ion pump with control unit (3) 2.75" CF Ports: Ion gauge and control unit (GRANVILLE PHILLIPS P350) SRS Residual gas analyzer (0-100 amu) Titanium sublimation pump 8" CF Transfer port (Gate valve configured with buffer chamber) 4.5" CF Transfer viewport with manual shutter RHEED Package: Includes: 6" CF With RHEED screen with shutter 2 .75" CF With 15 keV RHEED gun, (staib) controller With beam rocking, beam blanking, power supply 4.5" CF With linear retractable beam flux monitor 4.5" CF Optical port 1802 opposite BFM (blank) (2) 4.5" CF Optical ports 1802 Opposed (blank) Single-body system support frame Integral cooling water manifold Compressed air distribution manifold with pneumatic control circuits (10) of these are for shutters Base flange assembly Includes: (4) 2.75" CF Ports 2.75" Heated viewport with manualsShutter (pyrometer port) BASF Pyrometer package (wavelength to be determined) (3) 2.75" Ports (blank) Effusion cell: (3) 60cc Hot lip single filament effusion cell packages For use with Indium and Gallium Including: 60cc Hot lip effusion cell 60cc Conical PBN crucible Linear-motion Pneumatic shutter with material-specific shutter blade per source Water cooled enclosure per source DC Power supply (2) 60cc Cold lip single filament effusion cell packages for aluminum Including: 60cc Conical PBN crucible Linear-motion Pneumatic shutter with material-specific shutter blade per source Water cooled enclosure per source DC Power supply Valved cracking effusion cell for use with P Includes: 500cc Mark V P valved cracker Linear-motion Pneumatic shutter with material-specific shutter blade per source Automated servo motor control package White zone temperature controller Water cooled enclosure (2) DC Power supplies Phosphorus recovery system package Includes: Phosphorus recovery system package Includes: 830 l/s Mag lev turbo pump with backing pump and controllers LN2 Cryotrap Gate valve Cold cathode gauge 5CC Dopant cell package for Si Includes: 5cc Dopant effusion cell 5cc PBN Crucible Linear-motion Pneumatic shutter with material-specific shutter blade Water cooled enclosure DC Power supply 60cc Single filament effusion cell packages for use with Zn Includes: 60cc Single Filament effusion cell 60cc Conical PBN crucible Linear-motion Pneumatic shutter with material-specific shutter blade per source Water cooled enclosure DC Power supply Transfer with load-lock and buffer modules: Entry / Exit load lock chamber Includes: 8" Quick access door with integral viewport Quartz lamps for heating to 200°C 8" CF Manual VAT gate valve for connection with the buffer chamber 250 l/s Turbo pump package with controller, roughing manifold, Backing scroll pump Convection gauge Ion gauge with control unit Buffer / Preparation chamber assembly Includes: 8" CF Viewports for transfer hand-off Manually driven UHV elevator transfer system (4) Storage shelves o One (1) Magnetically-Coupled Transfer Rod Assembly for use from Buffer Chamber to Growth Chamber 8" CF Pump port with 160 l/s ion pump and control unit 8" CF Manual gate valve (Connect with growth chamber) Ion gauge and control unit (Granville Phillips GP350) System electronics cabinets Includes: Two-bay electronics rack System controller Sixteen-loop PID temperature controller package Power supply: RF Source power supply DC Power module RF Plasma source RF generator RF Power connector option: 120VAC 2015 vintage.
  • OXFORD: VG 80H

    MBE System.
  • VARIAN / VEECO: GEN II

    MBE System P/N: 981-4001.
  • VARIAN / VEECO GEN II

    VARIAN / VEECO: GEN II

    MBE Growth system Combination of IV: Si / Ge / Sn Ports, 2.75" Chamber 1 (III-V): Arsenic valved cracker Indium effusion cell Gallium effusion cell Aluminum effusion cell Ga downward looking source Silicon effusion cell (5 cc) Beryllium effusion cell (5 cc) Chamber 2 (Group IV): Germanium effusion cell Silicon e-beam source Silicon high temperature source Tin effusion cell Arsenic valved cracker Boron dopant source.
  • VARIAN / VEECO: GEN II

    MBE System P/N: 981-4001.
  • VARIAN / VEECO GEN II

    VARIAN / VEECO: GEN II

    MBE System, 3" Sources: 4.5" Flange.
  • VARIAN / VEECO GEN II

    VARIAN / VEECO: GEN II

    MBE Growth system, 3" (10) ports for dopants Process: growth of arsenides and phosphides Can be used for nitride or oxide growth Liquid nitrogen lines and phase separator are available AlGaAs lasers Room temperature: 6 x 10-10 Vacuum: Growth chamber (GC): Triode ion pump: 400 l/sec Buffer chamber (BC): Triode ion pump: 200l/s (2) TSP Controllers Loadlock chamber (LC): CTI cryotor 100 cryopump (2) Vacshorption pumps Ventury pump In situ and calibration tools: RHEED system: 0-10 kev RHEED Oscillation growth rate calibration system Cells: EPI Valved cracker with valved controller Cables Riber three zone P valved cracker with valve controller Power supply (4) 400g Sumo cells Ga, In, Al (2) Dopont cells 19" Dual Electronic equipment rack: (12) solenson DC power suppliers Power supply Riber P valved cracker 2704 Dual channel Eurotherm controller Substrate and heated station (2) DC power supplies Substrate heater Heated station PC control system: Moly system with software Other tools: Ircon optical pyrometer GP dual ion gauge controller Growth chamber and beam flux (2) GP ion gauge controlers Buffer and loadlock chambers RHEED power supply RGA power supply unit TEK scope EPI Riber P valved cracker valve controller Riber P cracker power supply Pyrometer port heated viewport Substrate manipulator controller Loadlock chamber Lamp power and controller. HP chart record mounted RHEED Oscillation recording Trolleys for substrate handling.
  • RIBER EVA 32

    RIBER: EVA 32

    MBE System, 2" Group IV MBE Used to grow Germanium and Silicon Semiconductor thin films (SiGe) B and Sb as P- and n- type dopant RHEED System with power supply and control​ Residual gas analyzer and control (RGA / Mass spectrometer)​ ​XYZ Precision sample stage / Manipulator​ Sentinel flux montoring system with power supply and control​​ Load-lock chamber.
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