二手 AG ASSOCIATES Heatpulse 4108 #9146305 待售

Rapid thermal processor annealing system, 5"-8" Electronics Mass-flow-controlled gas handling Cooling ULPA filtration Mechanical assemblies Applications: Silicon dielectric growth Implant annealing Glass re-flow Silicide formation and annealing Nitridation of metals Contact alloying Oxygen donor annihilation Wafer handling: Automatic serial processing Standard cassettes Throughput: Process dependent Ramp-up rate: Programmable 1 – 180°C Per second Steady-state duration: 1 – 600 Seconds per step Ramp-down rate: Programmable 1 – 180°C Per second Ramp down rate is temperature Radiation dependent Maximum 150°C per second Recommended steady-state temperature range: 400 – 1200°C ERP Temperature accuracy: +3°C to -7°C Calibrated against an instrumented thermocouple wafer (ITC) Temperature repeatability: + 3°C Temperature uniformity: + 5°C.