二手 ALLWIN21 AW 1008 #9201817 待售
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ID: 9201817
晶圓大小: 3"- 6"
Plasma etcher, 3"- 6"
Wafer loading: 3-Axis robot
Plasma power: Microwave
Types:
Parallel
Single wafer process
Gas Lines: 1-4
Production-proven plasma stripper / Asher system
Frontside and backside isotropic removal
Microwave 1000W: 2.45GHz
Pressure control with throttle valve
Main frame with breakers, relays and wires
Keyboard, mouse, cables
EMO, interlocks, and watchdog function
Quartz tray:
3-4 inch, 4-6 inch, 5 inch, 6 inch, others
Fixed cassette stations:
One station
Two stations
Lamp heat module and quartz window
6" Quartz showerhead and 5" diffusion disk
Main control
Distributor PCB and DC
Integrated solid robot: H1-7 x 10.5
Waveguide and quartz plasma tube
Chamber top plate and body:
Close loop temperature control (CLTC)
Blowers:
Magnetron
Waveguide
MFCs:
1 MFC, 2 MFCs, 3 MFCs, 4 MFCs
CLTC:
AC Box
Lamp control PCB
Main vacuum valves:
Fast pump: Two, one
Slow pump: One
MKS Baratron
Throttle valve
Front EMO, interlocks
Touch screen GUI, 15"
Options:
EOP Module with PCB
Lamp tower alarm function
Vacuum pump
Downstream ashing: NO
Bulk resist removal
Single wafer process
High-dose implanted resist
Non-oxidizing metal processing
Descum
Pressure: 1.75 to 2.5 Torr
Gas flow:
O2: 4.5 SLPM
N2: 0.5 SLPM
Variable lamp time: 0-9999 seconds (AW)
Variable temperature: 150°C – 350°C
Vacuum chamber pump: 165 cfm
Cabinet exhaust: >250 cfm
Plumbed gases:
O2
N2
Asher rate: 1.5u-5u/min
Positive photoresist: >8u/min
Negative
Photoresist
Uniformity: 15% Process dependent
Particulate: <0.05 /cm2
Selectivity: >1000:1
MTBF / MTTN / MTTR: 450 Hours / 100 Hours / 3.5 Hours or better 95%
Electrical requirements:
208VAC
3 Phase
60Hz
30Amps.
ALLWIN21 AW 1008是一種快速熱處理器,設計用於對尺寸不超過8英寸的基板進行快速、精確和可靠的熱電處理。該設備適合於將晶體矽轉化為各種產品,如電源設備、集成電路(IC)和薄膜晶體管(TFT)。也可用於去除摻雜劑、生長極薄的柵極氧化物、鈍化層間電介質、平面化、清潔底物等後續應用。AW 1008快速散熱處理器的低散熱預算為0.5毫瓦-秒,可提高工藝保真度。它還具有快速溫度規劃(RTP)功能,提供精確的溫度控制和快速的熱響應.RTP使處理器能夠以高速度、準確性和可重復性將溫度調整到每周設定值。該系統采用加熱響應室和加熱卡盤,以實現均勻的溫度分布和有效的傳熱至基板。該裝置還設有專用熱電偶,使用先進的隔離熱電偶實時監測和控制基板溫度。機器的溫度範圍可以從-270°C調節到1100 °C,溫度精度在+/-1°C以內。ALLWIN21 AW 1008快速熱處理器還包括自動氣流控制和等離子體蝕刻等其他便利功能。此外,一個可選的一鍵式記憶體可讓您儲存多達10個預設的處理記憶體,以方便檢索。處理器還配備了觸摸屏控制控制臺,允許用戶監控和調整流程參數。該處理器非常適合廣泛的熱處理應用,如氧化物退火、柵極氧化物蝕刻、柵極氧化、等離子體輔助熱處理、摻雜、鈍化、有源區域清潔和層間介電沈積。它與標準的200 mm晶片和矽、矽、氮化的基板相容。總體而言,AW 1008是一款可靠高效的快速散熱處理器,旨在為各種應用程序提供出色的溫度控制、快速的響應時間和更高的工藝精度。
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