二手 ALLWIN21 AW 105R #9201878 待售

ID: 9201878
晶圓大小: 2"-6"
Plasma etcher, 2"-6" Wafer loading: 3-Axis robot Stationary cassette plate Plasma power: 600W Air-cooled Type: Parallel / Single wafer process Gas lines: 1-3 Lines MFCs Main frame with circuit breakers, solenoid valves Keyboard, mouse, cables Anodized reactor with door Chamber base plate with water sensor Upper and lower electrodes Quartz showerhead & diffusion disk Main control and distribution PCBs RF Matching network with PCBs RF Generator: 13.56MHz Center aligner / Cassette station: Two dimensions Four dimensions Base plate and ceramic ring: Reactor Chuck In-line filter and solenoid isolation valve: One MFC Two MFCs Three MFCs AC/DC Box: Temperature controller MKS Baratron: Isolation valve Throttle valve Main vacuum valve Front EMO, interlocks Touch screen GUI, 15" Asher rate: 0.5-1.5 um/Min (200 to 250 ºC) Bulk strip: 600 A/Min (100 ºC) Uniformity: <±8% (Max-min) Strip: <±5% (Max-min) Particulate: <0.05/cm2 Selectivity: >1000:1 MTBF / MTTA / MTTR: 450 Hours / 100 Hours / 3.5 Hours / Better Production-proven plasma asher / Descum Uniformity: Up to 3%-5% Frontside and backside isotropic removal Consistent wafer-to-wafer process cycle repeatability Element heating: Up to 250°C Wafer capability (50mm-150mm): Up to 6.25” substrate Thickness wafer: 50um Options: End-of-process (EOP) Vacuum pump Chiller: Chamber base plate Applications: GaAs, InP, GaN, SiC Wafer strip GaAs, InP, GaN, SiC Wafer descum Thin film head resist cleaning Opto-electronic devices cleaning MEMS Photoresist stripping: High dose implant Rework Post-polysilicon Post-metal Post-oxide Controlled resist removal: Post-develop descum Uniformity capability: (<5% 1σ) Plumbed process gases: O2, N2 Cooling water: GPM House circulating supply Facility exhaust: 100 CFM Power: 190-240VAC, single phase, 30A, 50/60Hz.
ALLWIN21 AW 105R快速熱處理器是一種精確的熱處理設備,非常適合廣泛的研究和工業應用。最先進的設備采用堅固的石墨加熱塊,在高達1250°C的溫度下具有一致的性能,並采用超精度溫度控制器,在操作過程中提供無與倫比的精度和穩定性。AW 105R的設計可實現快速加熱和冷卻周期,平均時間為5分鐘。這樣可以在不犧牲精度的情況下對任何尺寸的材料進行高效的加工。ALLWIN21 AW 105R采用額定功率為8.5kW,具有獨特的聯鎖門系統,在操作過程中最大限度地提高安全性。該單元包括直觀的圖形用戶界面、真空-熱學過程控制以及風速計/濕度計,以確保安全清潔的過程環境。該機設計方便維護,操作高效。AW 105R Rapid Thermal Processor具有簡單的真空抽水工具和獨立溫度測量的高質量石墨加熱塊。借助全自動控制面板,用戶可以以最小的安裝速度快速啟動和運行。ALLWIN21 AW 105R配備了強大的電動舞臺和各種配件,包括石英室、提升裝置和多個晶圓高度。該資產與多種材料基板兼容:矽片、聚合物薄膜、碳納米管陣列、生物傳感器等等。AW 105R能夠在微機電系統(MEMS)條件下進行處理,並使用傅立葉變換紅外(FT-IR)分析儀來確保獲得樣品的最高質量分析。整個機器是模塊化的,設計以適應各種未來的發展。簡而言之,ALLWIN21 AW 105R Rapid Thermal Processor是那些希望快速處理各種材料且具有完全精確度和溫度控制的人的理想設備選擇。憑借其高額定功率和易於使用的特性,研究人員可以確保他們的樣品完全按照要求進行處理,而不會犧牲任何精度水平。
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