二手 ALLWIN21 AW 2001R #9201803 待售

ALLWIN21 AW 2001R
ID: 9201803
晶圓大小: 2"-6"
Plasma etcher, 2"-6" Wafer loading: 3-Axis robot Plasma power: Microwave Type: Parallel / Single wafer process Stand alone Gas lines: (4) Lines Applications: BPSG Etcher LTO Etcher TEOS Etcher Thermal oxide etcher LPCVD Nitride etcher PECVD Nitride etcher Trench rounding Descum RIE Damage removal Sodium removal Planarization Backside etcher: Poly, nitride, oxide Nitride pattern removal: PBL, LOCOS With pad oxide: >400Å Low temp photoresist ashing over: Oxides, Poly, Al, W, Ti Main frame with breakers, relays and wires Pentium class PC Keyboard Mouse USS SW Backup and cables Fixed cassette stations: (2) Cassette stations One cassette station / One centering / Alignment station Door assembly Metal shower head Extended alumina plasma tube for better uniformity Orifice, gas cap Chamber body and top plate Main control, distributor PCB and DC H1-7 x 10.5 Integrated (3) Axis solid robot Water cooled MAGNETRON and wave guide Water cooled 1000W MAGNETRON / Wave guide with an AGL Microwave power generator: 2.45GHz (4) Isolated gas lines With pneumatic valves and MFC AC Box Main & slow vacuum valves MKS Baratron Throttle valve Front EMO Interlocks Touch screen GUI, 15" Options: GEM / SECS II Function Light tower Vacuum pump Chuck temperature: 60-110ºC (±2 ºC) Gases: NF3, CF4, HE, O2 Uniformity: 100 mm: ± 3% (5% 3 σ) 150 mm: ± 5% (8% 3 σ) Maximum - minimum / 2 x average Reproducibility (w-t-w): 10% 3 σ Particulate: 0.05p / cm2 > 0.3µm Vacuum chamber pump: 165 cfm Cabinet exhaust: >250 cfm Plumbed gases: CF4 O2 He NF3 Electrical requirements: 208 VAC, 3 Phase, 6 Hz, 30 Amps.
ALLWIN21 AW 2001R是一種快速熱處理器,它使用其獨特的專利設計,為各種應用執行快速熱處理。該處理器非常適合晶圓級封裝以及MEMS和復合半導體器件制造。AW 2001R具有獨特的雙面平行線性熱區,用戶可以在其中監視和控制每個區的溫度設置。此功能可確保晶片表面均勻加熱。專利控制和監控設備對每個熱區的溫度和速率進行獨立的連續控制和監控,自動控制最靠近晶圓的熱浴,以補償晶圓的任何不均勻加熱。ALLWIN21 AW 2001R采用了強大的5千瓦五區脈沖激光加熱系統,以確保精確的熱控制。先進的電源控制裝置旨在快速響應工藝配方或熱條件的變化。該2000R配有3 kW金屬鹵化物燈,用於退火和擴散應用。AW 2001R還提供了一種可編程的氣體流動機,可以精確控制熱區以外的環境。這兩個單獨的可控氣體輸入端口可用於氧氣和氮氣等氣體混合物,也可用於冷卻操作期間的氮氣/氙氣凈化。這為使用相同的設備執行不同的過程提供了靈活性。ALLWIN21 AW 2001R結構堅固,並配有安全工具以進行適當操作。該資產有助於確保設備的安全可靠運行。利用這些功能,AW 2001R為用戶提供了一個可靠且易於操作的熱處理模型,用於半導體行業的各種應用。
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