二手 ALLWIN21 AW 2001R #9201803 待售
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ID: 9201803
晶圓大小: 2"-6"
Plasma etcher, 2"-6"
Wafer loading: 3-Axis robot
Plasma power: Microwave
Type: Parallel / Single wafer process
Stand alone
Gas lines: (4) Lines
Applications:
BPSG Etcher
LTO Etcher
TEOS Etcher
Thermal oxide etcher
LPCVD Nitride etcher
PECVD Nitride etcher
Trench rounding
Descum
RIE Damage removal
Sodium removal
Planarization
Backside etcher: Poly, nitride, oxide
Nitride pattern removal:
PBL, LOCOS With pad oxide: >400Å
Low temp photoresist ashing over: Oxides, Poly, Al, W, Ti
Main frame with breakers, relays and wires
Pentium class PC
Keyboard
Mouse
USS
SW Backup and cables
Fixed cassette stations:
(2) Cassette stations
One cassette station / One centering / Alignment station
Door assembly
Metal shower head
Extended alumina plasma tube for better uniformity
Orifice, gas cap
Chamber body and top plate
Main control, distributor PCB and DC
H1-7 x 10.5 Integrated (3) Axis solid robot
Water cooled MAGNETRON and wave guide
Water cooled 1000W MAGNETRON / Wave guide with an AGL
Microwave power generator: 2.45GHz
(4) Isolated gas lines
With pneumatic valves and MFC
AC Box
Main & slow vacuum valves
MKS Baratron
Throttle valve
Front EMO
Interlocks
Touch screen GUI, 15"
Options:
GEM / SECS II Function
Light tower
Vacuum pump
Chuck temperature: 60-110ºC (±2 ºC)
Gases: NF3, CF4, HE, O2
Uniformity:
100 mm: ± 3% (5% 3 σ)
150 mm: ± 5% (8% 3 σ)
Maximum - minimum / 2 x average
Reproducibility (w-t-w): 10% 3 σ
Particulate: 0.05p / cm2 > 0.3µm
Vacuum chamber pump: 165 cfm
Cabinet exhaust: >250 cfm
Plumbed gases:
CF4
O2
He
NF3
Electrical requirements: 208 VAC, 3 Phase, 6 Hz, 30 Amps.
ALLWIN21 AW 2001R是一種快速熱處理器,它使用其獨特的專利設計,為各種應用執行快速熱處理。該處理器非常適合晶圓級封裝以及MEMS和復合半導體器件制造。AW 2001R具有獨特的雙面平行線性熱區,用戶可以在其中監視和控制每個區的溫度設置。此功能可確保晶片表面均勻加熱。專利控制和監控設備對每個熱區的溫度和速率進行獨立的連續控制和監控,自動控制最靠近晶圓的熱浴,以補償晶圓的任何不均勻加熱。ALLWIN21 AW 2001R采用了強大的5千瓦五區脈沖激光加熱系統,以確保精確的熱控制。先進的電源控制裝置旨在快速響應工藝配方或熱條件的變化。該2000R配有3 kW金屬鹵化物燈,用於退火和擴散應用。AW 2001R還提供了一種可編程的氣體流動機,可以精確控制熱區以外的環境。這兩個單獨的可控氣體輸入端口可用於氧氣和氮氣等氣體混合物,也可用於冷卻操作期間的氮氣/氙氣凈化。這為使用相同的設備執行不同的過程提供了靈活性。ALLWIN21 AW 2001R結構堅固,並配有安全工具以進行適當操作。該資產有助於確保設備的安全可靠運行。利用這些功能,AW 2001R為用戶提供了一個可靠且易於操作的熱處理模型,用於半導體行業的各種應用。
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