二手 ALLWIN21 AW 901e #9201807 待售
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ID: 9201807
晶圓大小: 3"-6"
Plasma etcher, 3"-6"
Wafer loading: 3-Axis robot
Stationary cassette plate
Plasma power: RF 13.56 MHz
Type: Parallel / Single wafer process
Stand alone
Gas lines: 1-3 Lines
Throughput: 30-60 WPH, Process dependent
Temperature: 6-65ºC (±2 ºC) Capability
Gas lines: (4) Gas lines with MFCs
Etcher rate:
AW-901eR: 0-8000A / minute
AW-903eR: 0-4000A / minute
Process dependent
Uniformity: Up to ±3%, Process dependent
Particulate: <0.05 / cm2
Selectivity:
901eR: 2-20:1
AW-903eR: 2-20:1
Process dependent
MTBF / MTTA / MTTR: 450 Hours / 100 Hours / 3.5 Hours
Options:
EOP Module with PCB
GEM/SECS II Function
Lamp tower alarm with buzzer
Throttle valve pressure control
Vacuum pump
Chiller for chuck and chamber
Through the wall
Main frame, standard
Pentium class PC with
Keyboard
Mouse
USB
SW Backup
Cables
Chuck:3"-6"
Wafer aligner / Cooling station
3-Axis integrated solid robot:
H-Zero (Standard)
H1-7 x 10.5 (TTW)
Fixed cassette station:
Chuck assembly
901eR Non-anodized
903eR Anodized with flat
903eR Anodized with flat
903eR Non-anodized with flat
Reactor Assembly:
901eR Non-anodized
903eR Anodized
903eR Non-anodized
903eR High performance
Direct cooling
Non direct cooling
Pins:
Quartz
Ceramic SST
Centering ring:
Aluminum
Ceramic
Main control board:
Gas box with (4) inline gas lines, MFC, filters, and pneumatic valves
RF Matching network with PCB
RF Generator: 13.56 MHz
MKS Elite: 300 HD
MKS Elite: 600 HD
MKS Elite: 1000 HD
ENI ACG 3
ENI ACG 10
AC / DC Box
ATM Sensor
UPC Pressure control
225 SCCM: 901eR
2000 SCCM: 903eR
MKS Baratron with peumatic Iiolation valve
Main vacuum valves
Front EMO interlocks
Touch screen GU, 15"
AW-901eR AW-903eR
Material etched Polysilicon / Nitride Oxide,SOG,Nitride
Main etchant gases SG6, O2 / SF6,O2 CHF3,SF6,He
Other gases CHCLF2 / None None
Pressure (mTorr) 200-450 / 250-350 1600-3000
RF Power (Watts) 100-250 / 200-300 400-600
Temperature (C) 30 / 30 23
AC Power:
AC Module: 200-240 VAC Selectable, 50/60 Hz, 3-wire single-phase
Temperature controller: 200-240 VAC, 50/60 Hz, 3-wire single-phase
Vacuum pump: 208-230 / 460 VAC, 60 Hz or 200-220 / 380 VAC, 50Hz, 3 Phase
RF Generator: 200-240 VAC
PC / Monitor: 115 VAC
Cabinet exhaust: 100 cfm.
ALLWIN21 AW 901e是一種用於各種半導體和電子器件制造過程的快速熱處理器（RTP）。它是一種多區設備，結合了高速樣品裝卸、獨立加熱/冷卻、精確的溫度控制和可選的降氫能力。其設計使系統比傳統RTP系統運行更快、效率更高，節省了時間和資源。AW 901e采用動態優化控制單元（DOCS）,可根據負載的物理特性精確調整各個加熱和冷卻速率。這樣可以確保過程的均勻性和可重復性,而不管處理的材料如何。它還配備了車載數據采集機和各種報警功能，可以對過程的各個方面進行詳細的監測和記錄。ALLWIN21 AW 901 e采用三階段工藝，確保了準確和可重復的加熱和冷卻。第一階段是溫度坡道，迅速達到目標溫度。第二階段是浸泡循環，使樣品達到熱平衡。接下來是快速冷卻過程，快速降低溫度，防止樣品損壞。AW 901 e設計為用戶友好,具有自動配方和序列控制設置,可以快速輕松地設置整個過程。它還具有各種安全功能,例如風扇覆蓋和超溫檢測。這樣可以安全操作,並確保過程的準確性。ALLWIN21 AW 901e可用於各種氧化物去除、快速退火、快速冷卻、固化、高溫烘烤和焊接應用。它靈活的設計允許定制過程,緊湊的尺寸允許在不同的位置進行安裝。對於許多要求苛刻的應用程序,它是一個可靠、經濟高效的解決方案。
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