二手 ALLWIN21 AW 903e #9201808 待售

ALLWIN21 AW 903e
ID: 9201808
晶圓大小: 3"-6"
Plasma etcher, 3"-6" Wafer loading: 3-Axis robot Stationary cassette plate Plasma power: RF 13.56 MHz Type: Parallel / Single wafer process Stand alone Gas lines: 1-3 Lines Throughput: 30-60 WPH, Process dependent Temperature: 6-65ºC (±2 ºC) Capability Gas Lines: (4) Gas lines with MFCs Etcher rate: AW-901eR: 0-8000A / minute AW-903eR: 0-4000A / minute Process dependent Uniformity: Up to ±3%, Process dependent Particulate: <0.05 / cm2 Selectivity: 901eR: 2-20:1 AW-903eR: 2-20:1 Process dependent MTBF / MTTA / MTTR: 450 Hours / 100 Hours / 3.5 Hours Options: EOP Module with PCB GEM/SECS II Function Lamp tower alarm with buzzer Throttle valve pressure control Vacuum pump Chiller for chuck and chamber Through the wall Main frame, standard Pentium class PC with Keyboard Mouse USB SW Backup Cables Chuck:3"-6" Wafer aligner / Cooling station 3-Axis integrated solid robot: H-Zero (Standard) H1-7 x 10.5 (TTW) Fixed cassette station: Chuck assembly 901eR Non-anodized 903eR Anodized with flat 903eR Anodized with flat 903eR Non-anodized with flat Reactor Assembly: 901eR Non-anodized 903eR Anodized 903eR Non-anodized 903eR High performance Direct cooling Non direct cooling Pins: Quartz Ceramic SST Centering ring: Aluminum Ceramic Main control board: Gas box with (4) inline gas lines, MFC, filters, and pneumatic valves RF Matching network with PCB RF Generator: 13.56 MHz MKS Elite: 300 HD MKS Elite: 600 HD MKS Elite: 1000 HD ENI ACG 3 ENI ACG 10 AC / DC Box ATM Sensor UPC Pressure control 225 SCCM: 901eR 2000 SCCM: 903eR MKS Baratron with peumatic Iiolation valve Main vacuum valves Front EMO interlocks Touch screen GU, 15" AW-901eR AW-903eR Material Etched Polysilicon / Nitride Oxide,SOG,Nitride Main etchant gases SG6, O2 / SF6,O2 CHF3,SF6,He Other gases CHCLF2 / None None Pressure (mTorr) 200-450 / 250-350 1600-3000 RF Power (Watts) 100-250 / 200-300 400-600 Temperature (C) 30 / 30 23 AC Power: AC Module: 200-240 VAC Selectable, 50/60 Hz, 3-wire single-phase Temperature controller: 200-240 VAC, 50/60 Hz, 3-wire single-phase Vacuum pump: 208-230 / 460 VAC, 60 Hz or 200-220 / 380 VAC, 50Hz, 3 Phase RF Generator: 200-240 VAC PC / Monitor: 115 VAC Cabinet exhaust: 100 cfm.
ALLWIN21 AW 903e快速熱處理器(RTP)是一種高度先進的半導體器件測試和封裝設備。與其他熱處理系統相比,它具有極高的速度和卓越的效率。AW 903e是一個多級熱處理系統,包括一個具有先進溫度控制單元的爐,一個LED模具溫度管理(DTM)模塊,以及一個用於精確辨別表面氧化物的壓力傳感器。RTP爐設計為在加工室內產生均勻的溫度,以確保準確的結果。它可以被編程為快速達到高溫,並且可以減少高達90%的循環時間。先進的溫度控制機允許通過觸摸面板功能設置爐子的確切溫度。此高級溫度控制可確保性能一致。LED模具溫度管理模塊可確保晶片內的每個模具都加熱到所需溫度。這確保了所取得成果的統一性。它還通過減少晶片之間的等待時間來提高吞吐量。壓力傳感器用於檢測表面氧化物,這會影響結果的準確性。通過檢測這些表面氧化物,ALLWIN21 AW 903e可以消除它們的形成。這樣可以確保結果的準確性不受影響。AW 903e在設計時也考慮到了靈活性。它可以加入晶圓加熱工具(Wafer Heating Tool)和晶圓映射資產(Wafer Mapping Asset)等附加模塊,以獲得額外的精度。它是完全自動化的,設計時考慮到了安全和維護,使其成為一個非常高效的設備。ALLWIN21 AW 903 e是一種高度先進的RTP,其設計目的是在處理晶片時提供最高精度和吞吐量。其均勻的溫度和先進的DTM確保了均勻的性能,並且能夠集成其他模塊以提高精度和效率,因此非常適合許多應用程序。它高效、安全、維護和操作,並且易於與現有系統集成。
還沒有評論