二手 ALLWIN21 AW 903e #9201808 待售
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ID: 9201808
晶圓大小: 3"-6"
Plasma etcher, 3"-6"
Wafer loading: 3-Axis robot
Stationary cassette plate
Plasma power: RF 13.56 MHz
Type: Parallel / Single wafer process
Stand alone
Gas lines: 1-3 Lines
Throughput: 30-60 WPH, Process dependent
Temperature: 6-65ºC (±2 ºC) Capability
Gas Lines: (4) Gas lines with MFCs
Etcher rate:
AW-901eR: 0-8000A / minute
AW-903eR: 0-4000A / minute
Process dependent
Uniformity: Up to ±3%, Process dependent
Particulate: <0.05 / cm2
Selectivity:
901eR: 2-20:1
AW-903eR: 2-20:1
Process dependent
MTBF / MTTA / MTTR: 450 Hours / 100 Hours / 3.5 Hours
Options:
EOP Module with PCB
GEM/SECS II Function
Lamp tower alarm with buzzer
Throttle valve pressure control
Vacuum pump
Chiller for chuck and chamber
Through the wall
Main frame, standard
Pentium class PC with
Keyboard
Mouse
USB
SW Backup
Cables
Chuck:3"-6"
Wafer aligner / Cooling station
3-Axis integrated solid robot:
H-Zero (Standard)
H1-7 x 10.5 (TTW)
Fixed cassette station:
Chuck assembly
901eR Non-anodized
903eR Anodized with flat
903eR Anodized with flat
903eR Non-anodized with flat
Reactor Assembly:
901eR Non-anodized
903eR Anodized
903eR Non-anodized
903eR High performance
Direct cooling
Non direct cooling
Pins:
Quartz
Ceramic SST
Centering ring:
Aluminum
Ceramic
Main control board:
Gas box with (4) inline gas lines, MFC, filters, and pneumatic valves
RF Matching network with PCB
RF Generator: 13.56 MHz
MKS Elite: 300 HD
MKS Elite: 600 HD
MKS Elite: 1000 HD
ENI ACG 3
ENI ACG 10
AC / DC Box
ATM Sensor
UPC Pressure control
225 SCCM: 901eR
2000 SCCM: 903eR
MKS Baratron with peumatic Iiolation valve
Main vacuum valves
Front EMO interlocks
Touch screen GU, 15"
AW-901eR AW-903eR
Material Etched Polysilicon / Nitride Oxide,SOG,Nitride
Main etchant gases SG6, O2 / SF6,O2 CHF3,SF6,He
Other gases CHCLF2 / None None
Pressure (mTorr) 200-450 / 250-350 1600-3000
RF Power (Watts) 100-250 / 200-300 400-600
Temperature (C) 30 / 30 23
AC Power:
AC Module: 200-240 VAC Selectable, 50/60 Hz, 3-wire single-phase
Temperature controller: 200-240 VAC, 50/60 Hz, 3-wire single-phase
Vacuum pump: 208-230 / 460 VAC, 60 Hz or 200-220 / 380 VAC, 50Hz, 3 Phase
RF Generator: 200-240 VAC
PC / Monitor: 115 VAC
Cabinet exhaust: 100 cfm.
ALLWIN21 AW 903e快速熱處理器(RTP)是一種高度先進的半導體器件測試和封裝設備。與其他熱處理系統相比,它具有極高的速度和卓越的效率。AW 903e是一個多級熱處理系統,包括一個具有先進溫度控制單元的爐,一個LED模具溫度管理(DTM)模塊,以及一個用於精確辨別表面氧化物的壓力傳感器。RTP爐設計為在加工室內產生均勻的溫度,以確保準確的結果。它可以被編程為快速達到高溫,並且可以減少高達90%的循環時間。先進的溫度控制機允許通過觸摸面板功能設置爐子的確切溫度。此高級溫度控制可確保性能一致。LED模具溫度管理模塊可確保晶片內的每個模具都加熱到所需溫度。這確保了所取得成果的統一性。它還通過減少晶片之間的等待時間來提高吞吐量。壓力傳感器用於檢測表面氧化物,這會影響結果的準確性。通過檢測這些表面氧化物,ALLWIN21 AW 903e可以消除它們的形成。這樣可以確保結果的準確性不受影響。AW 903e在設計時也考慮到了靈活性。它可以加入晶圓加熱工具(Wafer Heating Tool)和晶圓映射資產(Wafer Mapping Asset)等附加模塊,以獲得額外的精度。它是完全自動化的,設計時考慮到了安全和維護,使其成為一個非常高效的設備。ALLWIN21 AW 903 e是一種高度先進的RTP,其設計目的是在處理晶片時提供最高精度和吞吐量。其均勻的溫度和先進的DTM確保了均勻的性能,並且能夠集成其他模塊以提高精度和效率,因此非常適合許多應用程序。它高效、安全、維護和操作,並且易於與現有系統集成。
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