二手 AIXTRON 3000 #9121782 待售
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ID: 9121782
Planetary reactor system
P/N: 31010224
(95) Hi volume reactors, 2"
MO-IR3000 Heating unit
MOE-3000 Growth cabinet
MO-V300 Low pressure system
MO-EO Control cabinet
MO-GO Gas blending cabinet
Process materials:
Trimethylaluminum: (ch3)3al
Trimethylgallium: (ch3)3ga
Trimethylindium: (ch3)3in
Dimethylzinc: (ch3)2zn
Phosphine: ph3
Arsine: ash3
MO-R3000 AIX MOCVD Reactor:
Integrated in stainless steel glovebox
Water cooled stainless steel
Aluminum reactor
Quartz plate
Gas distributor
Exhaust gas collector
Hydraulic lift for reactor lid
Double O-ring system
LEYBOLD d1.6 pump
Graphite susceptor:
Current configuration: (95) 2" Wafers
Supply: (4) 8" Wafers
Tools for handling transfer system unit
Mo-IR3000 AIX 3000 infrared heating unit:
(30) IR Stripe heaters
Power control unit (thyristor system)
Current distribution
Fused
Individual control
Electronic control system
Water cooling system
MOE-3000 Growth cabinet:
Glove box with automatic pressure control containing:
Planetary reactor AIX 3000
Inert gas purification system for glove box
Achievable gas purity 1 ppm H2O and O2
Filters regenerative
Control panel for glove box
Low pressure operating unit MO-V3000 AIX 3000
Transfer chamber for reactor parts
Wafer transfer chamber
N2 Blow off gun
Hydraulic system for reactor lid operation
MO-V3000 Low pressure system:
High capacity particulate filter
Pressure sensor
Throttle valve
Pressure control
(2) IF 100 Particle traps
Vacuum valves
Vacuum tweezers
N2 Purge of pump
Dual port MKS pressure readout
PIS Indication system
MO-EO Control cabinet:
Ventilated steel cabinet for electronic control units
Power supplies for reactor heater and electronics
Control panel for reactor temperature with EUROTHERM 818s pid
Control panel for reactor pressure regulation with MKS 652
Control panel for pneumatic valves in gas blending system
Control panel for reactor cooling
Control panel for double O-ring leak monitoring
Control panel for moisture sensor
Safety control:
Hard-wired
Pal programmable logic
Computer control console
Printer
Emergency power off button
Power distribution
Signal distribution
Mo-go gas blending cabinet:
Exhausted steel cabinet
Metalorganic
Hydride sources
Controlled temperature baths
Integrated N2H2 distribution manifold
Asec pressure regulators
Run and vent lines
Auxiliary lines for reactor
Gas foil rotation
Particle filters
Check valves in all gas supply lines
Pneumatic distribution panel
Signal distribution panel
Integrated pd-diffuser.
AIXTRON 3000是一種專門生產超高質量半導體材料的化學氣相沈積(CVD)反應器,用於生產先進的電子器件。它的模塊化設計和獨特的專利特性使其非常適合在實驗室環境和更大的生產作業中使用。3000由一個沈積室組成,包含一個單源電子束槍和兩個目標電極。能量來源是650°C的隔離電子束,為生產優質材料而優化。在真空密室內部,來自槍的高能電子與氣態反應物材料相互作用,在目標基板上產生物質沈積。由此產生的響應是高度統一和可重復的,為受控生產過程提供了基礎。AIXTRON 3000的設計目的是對沈積環境進行無與倫比的控制,從而能夠對壓力、溫度和沈積速率等參數進行精確的監測和隨意調整。其他功能包括先進的自動供氣系統和先進的晶圓處理機器人,用於快速高效的基板傳輸。AILTRON 3000材料有多種選擇,包括IV類、III-V類和II-VI類化合物。這些化合物是專門配制的,以提供沈積過程的均勻性和可重復性,並確保設備生產的最高質量。該反應堆還具有合並一系列底物的能力,包括氧化矽、氧化鋁和氮化物。AIXTRON 3000在生產先進電子設備方面有著廣泛的應用。值得註意的用途包括高效率的紅外探測器、光學數據存儲設備、先進的超薄膜和無傳輸光刻。它還用於石墨烯基材料的成功制造,用於生物技術和納米電子學。
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