二手 AIXTRON 3000 #9121782 待售

製造商
AIXTRON
模型
3000
ID: 9121782
Planetary reactor system P/N: 31010224 (95) Hi volume reactors, 2" MO-IR3000 Heating unit MOE-3000 Growth cabinet MO-V300 Low pressure system MO-EO Control cabinet MO-GO Gas blending cabinet Process materials: Trimethylaluminum: (ch3)3al Trimethylgallium: (ch3)3ga Trimethylindium: (ch3)3in Dimethylzinc: (ch3)2zn Phosphine: ph3 Arsine: ash3 MO-R3000 AIX MOCVD Reactor: Integrated in stainless steel glovebox Water cooled stainless steel Aluminum reactor Quartz plate Gas distributor Exhaust gas collector Hydraulic lift for reactor lid Double O-ring system LEYBOLD d1.6 pump Graphite susceptor: Current configuration: (95) 2" Wafers Supply: (4) 8" Wafers Tools for handling transfer system unit Mo-IR3000 AIX 3000 infrared heating unit: (30) IR Stripe heaters Power control unit (thyristor system) Current distribution Fused Individual control Electronic control system Water cooling system MOE-3000 Growth cabinet: Glove box with automatic pressure control containing: Planetary reactor AIX 3000 Inert gas purification system for glove box Achievable gas purity 1 ppm H2O and O2 Filters regenerative Control panel for glove box Low pressure operating unit MO-V3000 AIX 3000 Transfer chamber for reactor parts Wafer transfer chamber N2 Blow off gun Hydraulic system for reactor lid operation MO-V3000 Low pressure system: High capacity particulate filter Pressure sensor Throttle valve Pressure control (2) IF 100 Particle traps Vacuum valves Vacuum tweezers N2 Purge of pump Dual port MKS pressure readout PIS Indication system MO-EO Control cabinet: Ventilated steel cabinet for electronic control units Power supplies for reactor heater and electronics Control panel for reactor temperature with EUROTHERM 818s pid Control panel for reactor pressure regulation with MKS 652 Control panel for pneumatic valves in gas blending system Control panel for reactor cooling Control panel for double O-ring leak monitoring Control panel for moisture sensor Safety control: Hard-wired Pal programmable logic Computer control console Printer Emergency power off button Power distribution Signal distribution Mo-go gas blending cabinet: Exhausted steel cabinet Metalorganic Hydride sources Controlled temperature baths Integrated N2H2 distribution manifold Asec pressure regulators Run and vent lines Auxiliary lines for reactor Gas foil rotation Particle filters Check valves in all gas supply lines Pneumatic distribution panel Signal distribution panel Integrated pd-diffuser.
AIXTRON 3000是一種專門生產超高質量半導體材料的化學氣相沈積(CVD)反應器,用於生產先進的電子器件。它的模塊化設計和獨特的專利特性使其非常適合在實驗室環境和更大的生產作業中使用。3000由一個沈積室組成,包含一個單源電子束槍和兩個目標電極。能量來源是650°C的隔離電子束,為生產優質材料而優化。在真空密室內部,來自槍的高能電子與氣態反應物材料相互作用,在目標基板上產生物質沈積。由此產生的響應是高度統一和可重復的,為受控生產過程提供了基礎。AIXTRON 3000的設計目的是對沈積環境進行無與倫比的控制,從而能夠對壓力、溫度和沈積速率等參數進行精確的監測和隨意調整。其他功能包括先進的自動供氣系統和先進的晶圓處理機器人,用於快速高效的基板傳輸。AILTRON 3000材料有多種選擇,包括IV類、III-V類和II-VI類化合物。這些化合物是專門配制的,以提供沈積過程的均勻性和可重復性,並確保設備生產的最高質量。該反應堆還具有合並一系列底物的能力,包括氧化矽、氧化鋁和氮化物。AIXTRON 3000在生產先進電子設備方面有著廣泛的應用。值得註意的用途包括高效率的紅外探測器、光學數據存儲設備、先進的超薄膜和無傳輸光刻。它還用於石墨烯基材料的成功制造,用於生物技術和納米電子學。
還沒有評論