二手 AMAT / APPLIED MATERIALS Centura 200 EPI #9384326 待售
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ID: 9384326
優質的: 2021
PECVD System, 8"
Chambers:
Chamber A: ATM Epi
Chamber B: ATM Epi
Chamber C: ATM Epi
Chamber F: Single slot cooldown
STD Transfer
Wide body loadlock
System voltage: 480V
Frequency: 60Hz
Transformer capacity: 480V to 208V / 300Amps
CB1 Current rating: 300 Amps
Leak detectors: Gas panel, H2
Mainframe exhaust: H2
Clean room monitor: TFT Stand alone
Maintenance room monitor: TFT Stand alone
Gas panels:
Gas panel type: Configuable FUJIKIN
Gas panel exhaust position: CH-A (Only for configurable type)
Platter mixer
Platter chamber-A
Platter chamber-B
Platter chamber-C
(2) Mixed dopants
(1) Silicon source
Fujikin FCST
Main H2: 100 slm
Slit H2: 30 slm
Minimum HCl: 1 slm
Maximum HCl: 30 slm
TCS: 20 slm
Dope (INJ): 300 sccm
Dope mixer (SRC): 500 sccm
Dope mixer (DIL H2): 20 slm
Pressure transducer (gauge) range: 0-45
Cabinet exhaust switch type: AMAT
Mainframe:
EPICREW Blower and heat exchanger
Blower voltage: 480 VAC
YASKAWA Variable speed blower
Mainframe cabinet exhaust: Channel A side
AMAT Lamp fuse tray and fuses
AMAT Lamp C/B
AMAT Lamp contactor
AMAT Lamp harness assembly
AMAT Gas lines (From gas panel to floor plate)
AMAT Chamber tray
AMAT Facilities water supply/Return connections
Stainless steel water fittings
Remote frame:
CB1 Current rating: 300 Amp
Umbilical cable length: 25 Feet
V452 SBC Board
AMAT Video card
SSD 1 GB Hard Disk Drive (HDD)
Chamber interface board: Chamber A, B and C
AMAT SCR Driver
AMAT SCR C/B
AMAT SCR Contactor with fuses
AMAT H/A Breaker to contactor
Load lock chambers:
Universal platform
Wide body
Wafer mapping
Wafer slide detect
Fast backfill
Cooldown chamber:
Type: Non-contact
Center finder : On-the-fly
N2 Purge restrictor size: 5 slm
Transfer chamber:
Transfer chamber lid hoist
Robot type: HP
AMAT Slit valve
N2 Purge restrictor size: 5 slm x 3
Chamber A:
Wafer sizes: 8"
Standard process: ATM
Ushio -B3G Lamps
Rotation rev.R3.4
Exhaust line cone baffles (ATM)
Reflector cones
SWAGELOK Isolation valve
Chamber B:
Wafer size: 8"
Standard process (ATM)
USHIO B3G Lamps
Rotation rev.R3.4
Reflector cones
SWAGELOK Isolation valve
Chamber C:
Wafer size: 8"
Standard process (ATM)
USHIO B3G Lamps
Rotation rev.R3.4
Reflector cones
SWAGELOK Isolation valve
Pallets for FUJIKIN:
Model / Positions / Process gas / MFC Size
FCST / 1 / H2 / 20000
FCST / 3 / H2 / 500
FCST / 5 / HC1-Hi / 30000
FCST / 6 / HC1-Lo / 1000
FCST / 7 / H2 / 100000
FCST / 8 / H2 / 30000
2021 vintage.
AMAT/APPLIED MATERIALS Centura 200 EPI(外延工藝集成)設備是一種晶圓級、基於真空的加工反應器,用於在半導體晶圓上提供層的外延沈積。這種晶圓制造反應堆是專門為提高電介質膜、金屬膜和復合半導體材料(如砷化氙、砷化鋁,以及改用氘基化合物)的性能、可靠性和吞吐量而設計的。適用於廣泛的行業,包括微電子、光電、電信、生物電子等。該系統旨在克服維持高增長率同時保持沈積物質均勻分布的困難。該工藝為多晶矽和二氧化矽的多層提供了支持,並為超薄層的生長和多向外延操作提供了能力。它還提供高溫熱處理選項,如退火和通道。AMAT Centura 200 EPI使用射頻(RF)激發源實現高通量增長率。該單元利用單壁圓柱形加熱室,其中多個小型間接等離子體發生器沿該室的方向產生均勻的電場。均勻的電場和高效的射頻耦合使得APPLIED MATERIALS Centura 200 EPI適用於低溫和高溫過程。該機在能耗方面也很高效,能夠實現低成核密度,具有較高的沈積選擇性。利用附帶的軟件控制,可以在非常低的副產品形成下實現層的均勻性和穩定性。此外,Centura 200 EPI可以與其他沈積系統結合使用,采用高密度基板的群集配置。該工具采用模塊化體系結構設計,可實現自動化選項,包括基於機器人的晶圓處理。它采用緊湊、堅固的外殼,適合集成到潔凈室工作流程中。AMAT/APPLIED MATERIALS Centura 200 EPI由強大的真空資產提供動力,可全面控制晶圓溫度和工藝參數。總體而言,AMAT Centura 200 EPI模型提供了一種非常可靠的外延沈積解決方案,適用於廣泛的應用。它高效的能耗和模塊化的體系結構使其成為需要可靠和一致性能的設備制造商的理想選擇。
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