二手 AMAT / APPLIED MATERIALS Centura 5200 ACP / EPI #160377 待售
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ID: 160377
晶圓大小: 12"
優質的: 2007
Systems, 12"
Application: CMOS EG Elevated source drain
(4) Chambers: (RH3) Reduced pressure EPI
RP Chambers:
Recipe control AssuSETT: Yes
Lamp type: USHIO BNA6
Susceptor type: Silicon carbide coated graphite
Pin type: Hollow silicon carbide coated graphite
Preheat ring: Slotted silicon carbide, coated graphite
Susceptor support shaft: Centerpost
Upper heat shield: 6 Deg flared-in upper outer
Gas delivery options:
Gas panel feed: Bottom
MFC type: STEC Z500
Pump purge: yes
Regulators and displays: Transducers and regulators
Transducer display type: English (PSI)
H2 leak detector: Yes
Gas pallets:
Slot 1: H2 Main 50 SLM normally open
Slot 2: H2 SLIT 10 SLM normally open
Slot 4 MFC: HCI Wafer clean 200 sccm
Slot 4 Restrictor: HCI Chamber clean 15 SLM restrictor
Slot 5: HCI 20 SLM
Slot 8: DCS 300 sccm
Slot 9: DCS 1 SLM MLD
Mainframe:
Mainframe type: Core ENP block 2
Loadlocks: Batch load lock
Chamber interface: Vented stainless steel insert and door with viton
DVR record license:Yes
Water hose fittings: Yes
Chamber common and integration:
Mass flow verification: MFV for 4 Chamber system
Multi wafer clean: MWC for 4 chamber system
Factory interface options:
WIP delivery type: OHT WIP delivery
Number of load ports: 2 load ports
eDiagnostics ready: Yes
Load port types: Enhanced 25 wafer FOUP V2
Load port operator interface: Standard 8 light
Configurable colored lights: Yes
Air intake system: Top intake
E84 Carrier handoff: Upper E84 interface enabled OHT
E84 PIO Sensors and cables: Upper E84 sensors and cables
E99 Carrier ID: Keyence with BCR
Operator access switch: Yes
Light towers: 4 Color configurable light tower
Platform application: EPI ACP block 2
Remote options:
Monitor 1: 17" Flat panel with keyboard on ergo arm
Monitor 2: Remote 17" flat panel on stand
Monitor 2 Cable: 50 feet with 41 feet effective
Pumps:
Process chamber pumps: Edwards IH1000 pump interface only
Pump isolation valve: Yes
Currently powered off
2007 vintage.
AMAT/APPLIED MATERIALS Centura 5200 ACP/EPI是一種用於半導體制造過程的工具,設計用於生產高質量的集成電路和晶圓級封裝。它是一種先進的沈積蝕刻反應器,提供了現代先進節點所需的均勻性、重復性和工藝精度。AMAT Centura 5200 ACP/EPI為先進的材料沈積和蝕刻工藝提供了最佳平臺。它是一個單晶片負載鎖定系統,有一個單獨的蝕刻室,用於幹蝕刻過程。這使得沈積和蝕刻可以內聯完成,而不是為每個工藝步驟依次使用單獨的工具。該工具也非常適合晶圓級鈍化工藝。APPLIED MATERIALS Centura 5200 ACP/EPI包含模塊化基板轉桿,支持晶圓定向以進行均勻蝕刻。與傳統工具相比,此設計功能提供了更好的可重復性和過程一致性。Centura 5200 ACP/EPI還具有強大的Robot Handler和單向傳輸方法。此功能可確保基板在加工模塊之間傳輸時的精確對齊和安全處理。AMAT/APPLIED MATERIALS Centura 5200 ACP/EPI提供了增強的工藝室設計,提高了等離子體的均勻性、可重復性和吞吐量。等離子體由電子回旋共振(ECR)和感應耦合等離子體(ICP)源產生。它還具有射頻(RF)發電機,使用戶能夠快速準確地調整功率水平。使用者也可以設定壓力水平,而晶體石英窗溫度探頭則能夠進行工藝溫度的檢查和監控。AMAT Centura 5200 ACP/EPI提供技術和性能,能夠生產出最先進的集成電路和復雜的晶圓級封裝。其出色的沈積和蝕刻均勻性滿足了最新先進節點具有挑戰性的工藝要求。該工具的高級設計確保了最佳的基板傳輸和處理,以及盡可能最好的可重復性和工藝精度。APPLIED MATERIALS CENTURA 5200 ACP/EPI具有射頻發電機、壓力控制、溫度探頭和模塊化轉桿等功能,是實現先進半導體制造工藝最高性能的有效工具。
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