二手 AMAT / APPLIED MATERIALS Centura 5200 DxZ #9198724 待售
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ID: 9198724
晶圓大小: 8"
CVD System, 8"
Loadlock Indexer
Process chamber lift
HP Robot
System information:
(3) Chambers:
Chamber A: DXZ SiN
Chamber B: DXZ SiN
Chamber C: DXZ SiN
Chamber E: MS Cool
LLA: Narrow
LLB: Narrow
Mainframe:
System placement: Through the wall
Robot type: HP Robot
Robot blade: Nickel coated AL
OTF
W/F Position sensor
Loadlock:
Loadlock cassette: Narrow
Wafer mapping: Basic
N2 Purge type: Tylan 2900
Chamber A, B and C:
Clean method: RF
Frequency: Single HF
Throttle valve type: Dual spring
Manometer: Dual 10/100 torr
Electrical:
Line frequency: 50/60 Hz
Line voltage: 200/208 V
Line amperage: 240A
System monitors:
1st Monitor: Through the wall
2nd Monitor: Stand alone
Generator (AC) rack:
(3) Generators: AE RFG 2000-2V
Umbilicals:
Monitor: 55ft
Signal cable length (S/C ~ MF): 50ft
HX Cable length: 55ft
Gas delivery options:
MFC Type: STEC 4400 MC
Valves: Veriflo 10 Ra Max
Filters: Millipore
Transducers: MKS with out display
Regulators: Veriflo
System cabinet exhaust: Top
Gas pallet configuration:
Chamber A, B & C: SEC4400
System controller:
Slot Top rack BD
2 System reset
3 Lk Det 1&2 orConv/TC
5 Lk Det 5&6 orConv/TC
6 Lk Det 7&8 orConv/TC
9 EWOB Centerfinder
12 Floppy disk drive
13 Hard disk drive
14 Chamber A interface
15 Chamber B interface
16 Chamber C interface
18 Chamber E interface
19 Mainframe interface
20 Loadlock interface
21 Chamber A Dl/O 1
22 Chamber A Dl/O 2
23 Chamber B Dl/O 1
24 Chamber B Dl/O 2
25 Chamber C Dl/O 1
26 Chamber C Dl/O 2
29 Chamber E DI/O
30 Synergy SBC(V440)
32 Video
33 I/O Expansion
34 SEI
35 Chamber A Al/O
36 Chamber B Al/O
37 Chamber C Al/O
39 Mainframe Al/O 1
40 Chamber E/MF Al/O 2
41 Mainframe Dl/O 1
42 Mainframe Dl/O 2
43 Mainframe Dl/O 3
44 Mainframe Dl/O 4
45 Mainframe Dl/O 5
46 Mainframe Dl/O 6
47 Stepper 1
48 Stepper 2
49 Stepper 3
50 OMS (VMEX)
RF Generator:
Chamber Maker Model
A, B & C AE RFG 2000-2V 3155053-003B
RF Match box (Match multifunction adapter with interlock 7-J14 OHM):
Chamber Maker Model
A AE 3155077-003B
B & C AE 3155077-003A
Heat exchanger:
APPLIED MATERIALS AMAT0 Heat exchanger, 0010-70008.
AMAT/APPLIED MATERIALS Centura 5200 DxZ是一種半導體反應堆，配備了微電子制造的新的精度和性能水平。它利用AMAT先進的制造技術來生產小巧、精確和一致的特性。反應堆采用先進的離子源設計，具有快速添加和去除蝕刻室離子的能力，以提高工藝性能。高端離子源為精密蝕刻提供了卓越的控制和精度。AMAT Centura 5200 DxZ也配備了下一代的腔室設計。該腔室有四面墻壁，全部設計成手工工作，以產生高質量、精確的蝕刻和最小化的材料損失。墻壁作為高度精確的墻壁來劃定蝕刻配方，除了在操作過程中提供優越的溫度和壓力控制。墻壁也促進了更安靜的操作，同時仍然保證了完美的精確度。APPLIED MATERIALS Centura 5200 DxZ使用專有基板支架將基板牢固地固定到位,以確保精確蝕刻。反應堆還包括一個計算機控制的自動氣體混合系統，確保將適量的氣體輸送到蝕刻室進行精確蝕刻。使用的氣體是氮氣、氙氣和氧氣。接口RF發生器提供正確蝕刻過程所需的電源。Centura 5200 DxZ專為半導體和MEMS制造環境而設計。它能夠處理大小尺寸小至25納米的大小晶片。這座反應堆的發電站非常適合設計、稀釋、蝕刻和鈍化特性，精度無與倫比。此外,它還設計用於多種蝕刻環境和蝕刻配方,包括幹蝕刻、濕蝕刻、等離子體蝕刻、反應性離子蝕刻、深反應性離子蝕刻和電離物理蝕刻。這使得AMAT/APPLICED MATERIALS Centura 5200 DxZ成為生產功能強大、精確且一致的產品的理想選擇。
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