二手 AMAT / APPLIED MATERIALS Centura 5200 Epi #9034366 待售
看起來這件物品已經賣了。檢查下面的類似產品或與我們聯系,我們經驗豐富的團隊將為您找到它。
單擊可縮放
已售出
ID: 9034366
System, 8"
(3) Selective Epi chambers RP
Process: SEG (Selective Epitaxial Growth)
Software version: B6.40
Wafer shape: SNNF (Semi Notch No Flat)
Wafer cassette: 8" PEEK Miraial
Wafer transfer: Robot: HP+ENP, Wafer centering: On the fly
SMIF Interface: No
System configuration:
Chamber A; SEG
Chamber B: SEG
Chamber C: N/A
Chamber D: N/A
Chamber F: Single cool down
Chamber A, B, and C:
Manometer: MKS (1 Torr, 100 Torr, 1000 Torr)
Clean type: HCI Clean
RGA Port: Yes (connection port to the foreline)
(2) Pyrometers (upper/lower): Iron: MR-T399-99C, K118 (AMAT: 0090-35052)
Gas Pallet Configuration:
Gas name: MFC size
H2/N2 (H2 Main): H2: 100 L
H2/N2 (H2 Slit): H2: 20 L
HCl: HCl: 300 cc
SiH4: SiH4: 1 L
GeH4: H2: 500 cc
Direct-Dopant 1: H2: 300 cc
Mixed-Dopant: H2: 300 cc
SiH2Cl2: SiH2Cl2: 1 L
Direct-dopant 2: H2: 300 cc
Gas Delivery:
MFC: Type: Unit (C8100AF, C3101AF)
Valves: Veriflo
Rim pressure compressor: Pump CPRSR air with RSVR 1 MPA
Filters: Pall Teflon filter
Transducers: Measurement: MKS 852861PCH2GD, Display: MKS LDM-14793
Regulators: Veriflo Parker
Coating: SUS316EP
Single line drop (SLD): No
System cabinet exhaust: Top and side
(3) H2 Leak detector: Control Inst: SNT476-1000 ppm-H2 (AMAT: 0820-01021
(1)System controller: Remote AC Controller
Transformer: N/A (480 V Direct connection)
Chamber process kit: Quartz, carbon parts
QTY | AMAT P/N | Parts Name
(1) 0200-36727 SUSCEPTOR, 200MM EPI W/O CENTER TOSHIB
(1) 0200-35081 RING, PREHEAT GRAPHITE BETA COATING
(4) 0200-36642 PIN, 200MM EPI WAFER LIFT (LIFT+LINER LOCK PIN)
(3) 0200-00207 TIP, SUSCEPTOR SHAFT OUTSIDE
(1) 0200-35007 DOME, UPPER RP
(1) 0200-35042 DOME, LOWER QTZ W/BALL
(1) 0200-35162 LINER, CHMBR UPPER BRKT/CEN (25x)
(1) 0200-35161 LINER, CHMBR LOWER BRKT/CEN (25x)
(2) 0200-35916 INSERT, INJECT 3 ZONE QTZ (25x)
(2) 0021-00571 INSERT,EXHAUST SST
(1) 0200-35159 BAFFLE, INJECT 3 ZONE (25x)
(1) 0200-00412 SHAFT, SUSCEPTOR W/RMVBL PINS NO CEN EPI
(1) 0200-35424 LIFT, WAFER 8" POLY QUARTZ
Foreline heater: Heater jacket from tool to pump 4", temp controller (not included in scope)
Dry pumps: Stored inside of Helios Zenith (not included in scope)
Load lock: iL70N New Look
Transfer: iL70N New Look
Chamber A: iH-35SE
Chamber B: iH1000
Chamber C: iH1000
Gas abatement: (not included in scope)
(1) Boc Edwards Helios Zenith
(1) Kurita water circulation unit
Full load current: 280 A
Maximum system rating: 87 KVA
Ampere rating of largest load: 100 A
Interrupting current: 10,000 Amps I.C.
480 VAC, 3-Ph, 50/60 Hz, 4-Wires
2003 vintage.
AMAT/APPLIED MATERIALS Centura 5200 Epi是一種現代半導體加工工具,用於將多晶材料薄層沈積到基板上。該反應堆適用於多種外延處理應用,如外延、應變層異質結構、高移動性緩沖層、位錯緩減和低缺陷器件層。AMAT Centura 5200 Epi利用大氣室和壓力控制設備誘導高溫原位外延生長。該反應堆為安全控制反應環境和工藝條件提供了高精度系統。其特點是采用低壓石英雙室設計,對基板進行逐區溫度控制。這確保了可重現和均勻的外延生長。APPLIED MATERIALS Centura 5200 Epi附有一個燃料輸送裝置,設計用於精確穩定地控制引入腔室的反應物氣體。它配備了集成的遙感質量流控制器,可不斷調整壓力,在一定壓力範圍內保持精確的氣流和組成。本機防止汙染物和雜質進入反應堆室。Centura 5200 Epi還包括一個互鎖的旁通閥和壓力監測工具。這消除了對資產進行頻繁維護的需要。此外,其先進的吹掃面板有兩級加熱模型。這提供了高效的板載塑化劑去除和顆粒控制設備。這樣可以提高工藝氣體穩定性和提高工藝均勻性。AMAT/APPLIED MATERIALS Centura 5200 Epi也被設計成具有強大的快速響應加熱和冷卻系統。此機制可確保從低至500 °C和高至700 °C的溫度中精確控制溫度。高溫控制器提供精確的溫度均勻性,以實現準確和可重復的工藝性能。AMAT Centura 5200 Epi是一款先進、精密的epi處理工具,旨在滿足各種現代半導體制造需求。它在各種各樣的epi處理應用中提供了均勻性和可靠性,使其成為現代半導體制造商的理想工具。
還沒有評論