二手 AMAT / APPLIED MATERIALS Centura 5200 Phase I #9133092 待售

ID: 9133092
Oxide etcher, 8" Wafer shape: JMF Chamber Type/ Location Selected Option System Configuration BASE Position A Oxide Main Etch Position B Oxide Main Etch Position C Oxide Main Etch Position F ORIENTER Position A Configuration Oxide Main Etch Position B Configuration Oxide Main Etch Position C Configuration Oxide Main Etch Position D Configuration System Safety Equipment Selected Option EMO Switch Type TURN TO RELEASE EMO ETI COMPLIANT EMO Guard Ring INCLUDED Smoke Detector At MF No Skin YES Smoke Detector At Gen Rack YES Smoke Detector At AC Rack YES Water and Smoke Detector ALARM System Labels ENGLISH CHA - CHA - OXIDE Chamber Options Selected Option Process Kit USED Turbo Pump Seikoseiki 301 Emission Endpoint Type Monocro Oxide ESC USED Flat BIAS RF GEN OEM-28B MxP Oxide Throttle Butter fly MxP Oxide Gate Valve VAT CHB - CHB - OXIDE Chamber Options Selected Option Process Kit USED Turbo Pump Seikoseiki 301 Emission Endpoint Type Monocro Oxide ESC USED Flat BIAS RF GEN OEM-28B MxP Oxide Throttle Butter fly MxP Oxide Gate Valve VAT CHC - CHC - OXIDE Chamber Options Selected Option Process Kit USED Turbo Pump Seikoseiki 301 Emission Endpoint Type Monocro Oxide ESC USED Flat BIAS RF GEN OEM-28B MxP Oxide Throttle Butter fly MxP Oxide Gate Valve VAT Gas Delivery Options Pallet Options Selected Option Valve Fujikin Regulator Fujikin Gas Panel Pallet A Gas Panel Pallet A Gas Line Requirement Selected Option Pallet Pallet Gas Line Configuration Selected Option Pallet Corrosive Gas Line Qty 3 Pallet Inert Gas Line Qty 5 Filter Qty 8 Gas Panel Pallet B Gas Panel Pallet B Gas Line Requirement Selected Option Pallet Pallet Gas Line Configuration Selected Option Pallet Corrosive Gas Line Qty 3 Pallet Inert Gas Line Qty 5 Filter Qty 8 Gas Panel Pallet C Gas Panel Pallet C Gas Line Requirement Selected Option Pallet Pallet Gas Line Configuration Selected Option Pallet Corrosive Gas Line Qty 3 Pallet Inert Gas Line Qty 5 Filter Qty 8 Gas Panel Features Gas Panel Features Gas Panel Features Selected Option Gas Panel Controller VME I Mainframe General Mainframe Options Selected Option Facilities Type REGULATED Facilities Orientation MAINFRAME FACILITIES BACK CONNECTION Loadlock/Cassette Options Selected Option Loadlock Type NBLL W/ AUTO-ROTATION Loadlock Cover Finish ANTI-STATIC PAINTED Loadlock Slit Valve Oring Type VITON Wafer Mapping STD Wafer Out of Cassette Sensor YES Cassette Present Sensor YES Transfer Chamber Options Selected Option Transfer Ch Manual Lid Hoist YES Robot Type CENTURA HP ROBOT Wafer On Blade Detector BASIC Loadlock Vent BOTTOM VENT Front Panel Selected Option Front Panel ANTI-STATIC PAINTED Signal Light Tower 4 COLOR SIGNAL LIGHT TOWER INCLUDING RED LIGHT 4 Color Signal Light Tower Configuration Selected Option Top Light Color RED Second Light Color YELLOW Third Light Color GREEN Fourth Light Color BLUE Signal Light Tower Buzzer ENABLED Second Signal Light Tower YES Remote System Controller Selected Option Controller Type 86 INCH COMMON CONTROLLER Cntrlr Electrical Interface BOTTOM FEED Controller Exhaust TOP EXHAUST Controller Cover Option YES System Monitors Selected Option System Monitor 2 TTW / different cable lengths Monitor Cursor 2 BLINKING CURSOR AC Rack Selected Option GFI 30mAMP AC Rack Types 84 INCH SLIM AC GEN RACK Exhaust Collar 84 INCH SLIM RACK EXHAUST COLLAR Umbilical Selected Option Ctrlr to Mainframe Umbilical 25Ft HX Control Cable Length 50Ft Heat Exchanger Hose Length 65Ft Pump Cable Length 65Ft RF Generator Cable 65Ft Pump Interface Only Selected Option Pump Interface Qty Interface Only.
AMAT/APPLIED MATERIALS Centura 5200 I期是為半導體制造而設計的反應堆。它具有具有SiH4/NH3/DOP射頻源的56MHz端點蝕刻,並且能夠利用基於三氯化磷(PCl3)的蝕刻模塊將蝕刻深度降至8.5微米。該腔室由不銹鋼制成,具有低溫操作,以更好的蝕刻/工藝兼容性。反應堆配有一個過程控制箱和一個單獨的氣閘,用於裝卸腔室。AMAT Centura 5200 I期具有一個內部加熱、氣密的大型工藝室。該腔室設計用於防止微粒和蝕刻試劑在蝕刻過程中進入晶片。可容納高達2英寸(5.08厘米)和8000磅(3.63噸)的半導體晶圓。該室設有真空設備和帶偏轉擋板的排氣煙囪,以確保均勻蝕刻和低背面汙染。內置端點控制器通過測量腔室內部的壓力、氣體輸送系統的狀態以及通過電源磁控管的電流來監控蝕刻過程。該工藝室還包含一個自動溫度補償模塊(ATCM),以提高工藝一致性和性能。ATCM的範圍從180°到260 °C,並提供了廣泛的工藝優化調整。它還具有靈活的溫度控制和用戶可選擇的參數來優化工藝參數。端點蝕刻工藝旨在對蝕刻深度進行高效、精確的控制。APPLIED MATERIALS Centura 5200 Phase I具有自調56 MHz射頻電源和全波形過程控制單元。這臺機器允許操作員蝕刻具有不同蝕刻深度的晶片,也有助於防止晶片的損壞和疤痕。最後,Centura 5200第一階段旨在提供安全、可靠和可重復的過程,並具有出色的最終效果。它具有內置的安全功能,可以在發生潛在故障時提醒操作員。該工具還具有內置的維護和故障排除功能,便於分析和故障排除。因此,AMAT/APPLIED MATERIALS Centura 5200 I期是高效生產半導體晶片的理想資產。
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