二手 AMAT / APPLIED MATERIALS Centura 5200 Phase I #9133092 待售
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ID: 9133092
Oxide etcher, 8"
Wafer shape: JMF
Chamber Type/ Location Selected Option
System Configuration BASE
Position A Oxide Main Etch
Position B Oxide Main Etch
Position C Oxide Main Etch
Position F ORIENTER
Position A Configuration Oxide Main Etch
Position B Configuration Oxide Main Etch
Position C Configuration Oxide Main Etch
Position D Configuration
System Safety Equipment Selected Option
EMO Switch Type TURN TO RELEASE EMO ETI COMPLIANT
EMO Guard Ring INCLUDED
Smoke Detector At MF No Skin YES
Smoke Detector At Gen Rack YES
Smoke Detector At AC Rack YES
Water and Smoke Detector ALARM
System Labels ENGLISH
CHA - CHA - OXIDE
Chamber Options Selected Option
Process Kit USED
Turbo Pump Seikoseiki 301
Emission Endpoint Type Monocro
Oxide ESC USED Flat
BIAS RF GEN OEM-28B
MxP Oxide Throttle Butter fly
MxP Oxide Gate Valve VAT
CHB - CHB - OXIDE
Chamber Options Selected Option
Process Kit USED
Turbo Pump Seikoseiki 301
Emission Endpoint Type Monocro
Oxide ESC USED Flat
BIAS RF GEN OEM-28B
MxP Oxide Throttle Butter fly
MxP Oxide Gate Valve VAT
CHC - CHC - OXIDE
Chamber Options Selected Option
Process Kit USED
Turbo Pump Seikoseiki 301
Emission Endpoint Type Monocro
Oxide ESC USED Flat
BIAS RF GEN OEM-28B
MxP Oxide Throttle Butter fly
MxP Oxide Gate Valve VAT
Gas Delivery Options
Pallet Options Selected Option
Valve Fujikin
Regulator Fujikin
Gas Panel Pallet A Gas Panel Pallet A
Gas Line Requirement Selected Option
Pallet Pallet
Gas Line Configuration Selected Option
Pallet Corrosive Gas Line Qty 3
Pallet Inert Gas Line Qty 5
Filter Qty 8
Gas Panel Pallet B Gas Panel Pallet B
Gas Line Requirement Selected Option
Pallet Pallet
Gas Line Configuration Selected Option
Pallet Corrosive Gas Line Qty 3
Pallet Inert Gas Line Qty 5
Filter Qty 8
Gas Panel Pallet C Gas Panel Pallet C
Gas Line Requirement Selected Option
Pallet Pallet
Gas Line Configuration Selected Option
Pallet Corrosive Gas Line Qty 3
Pallet Inert Gas Line Qty 5
Filter Qty 8
Gas Panel Features Gas Panel Features
Gas Panel Features Selected Option
Gas Panel Controller VME I
Mainframe
General Mainframe Options Selected Option
Facilities Type REGULATED
Facilities Orientation MAINFRAME FACILITIES BACK CONNECTION
Loadlock/Cassette Options Selected Option
Loadlock Type NBLL W/ AUTO-ROTATION
Loadlock Cover Finish ANTI-STATIC PAINTED
Loadlock Slit Valve Oring Type VITON
Wafer Mapping STD
Wafer Out of Cassette Sensor YES
Cassette Present Sensor YES
Transfer Chamber Options Selected Option
Transfer Ch Manual Lid Hoist YES
Robot Type CENTURA HP ROBOT
Wafer On Blade Detector BASIC
Loadlock Vent BOTTOM VENT
Front Panel Selected Option
Front Panel ANTI-STATIC PAINTED
Signal Light Tower 4 COLOR SIGNAL LIGHT TOWER INCLUDING RED LIGHT
4 Color Signal Light Tower Configuration Selected Option
Top Light Color RED
Second Light Color YELLOW
Third Light Color GREEN
Fourth Light Color BLUE
Signal Light Tower Buzzer ENABLED
Second Signal Light Tower YES
Remote
System Controller Selected Option
Controller Type 86 INCH COMMON CONTROLLER
Cntrlr Electrical Interface BOTTOM FEED
Controller Exhaust TOP EXHAUST
Controller Cover Option YES
System Monitors Selected Option
System Monitor 2 TTW / different cable lengths
Monitor Cursor 2 BLINKING CURSOR
AC Rack Selected Option
GFI 30mAMP
AC Rack Types 84 INCH SLIM AC GEN RACK
Exhaust Collar 84 INCH SLIM RACK EXHAUST COLLAR
Umbilical Selected Option
Ctrlr to Mainframe Umbilical 25Ft
HX Control Cable Length 50Ft
Heat Exchanger Hose Length 65Ft
Pump Cable Length 65Ft
RF Generator Cable 65Ft
Pump Interface Only Selected Option
Pump Interface Qty Interface Only.
AMAT/APPLIED MATERIALS Centura 5200 I期是為半導體制造而設計的反應堆。它具有具有SiH4/NH3/DOP射頻源的56MHz端點蝕刻,並且能夠利用基於三氯化磷(PCl3)的蝕刻模塊將蝕刻深度降至8.5微米。該腔室由不銹鋼制成,具有低溫操作,以更好的蝕刻/工藝兼容性。反應堆配有一個過程控制箱和一個單獨的氣閘,用於裝卸腔室。AMAT Centura 5200 I期具有一個內部加熱、氣密的大型工藝室。該腔室設計用於防止微粒和蝕刻試劑在蝕刻過程中進入晶片。可容納高達2英寸(5.08厘米)和8000磅(3.63噸)的半導體晶圓。該室設有真空設備和帶偏轉擋板的排氣煙囪,以確保均勻蝕刻和低背面汙染。內置端點控制器通過測量腔室內部的壓力、氣體輸送系統的狀態以及通過電源磁控管的電流來監控蝕刻過程。該工藝室還包含一個自動溫度補償模塊(ATCM),以提高工藝一致性和性能。ATCM的範圍從180°到260 °C,並提供了廣泛的工藝優化調整。它還具有靈活的溫度控制和用戶可選擇的參數來優化工藝參數。端點蝕刻工藝旨在對蝕刻深度進行高效、精確的控制。APPLIED MATERIALS Centura 5200 Phase I具有自調56 MHz射頻電源和全波形過程控制單元。這臺機器允許操作員蝕刻具有不同蝕刻深度的晶片,也有助於防止晶片的損壞和疤痕。最後,Centura 5200第一階段旨在提供安全、可靠和可重復的過程,並具有出色的最終效果。它具有內置的安全功能,可以在發生潛在故障時提醒操作員。該工具還具有內置的維護和故障排除功能,便於分析和故障排除。因此,AMAT/APPLIED MATERIALS Centura 5200 I期是高效生產半導體晶片的理想資產。
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