二手 AMAT / APPLIED MATERIALS Centura 5200 #146830 待售

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圖為 已使用的 AMAT / APPLIED MATERIALS Centura 5200 待售
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反應爐
製造商
AMAT / APPLIED MATERIALS
模型
Centura 5200
ID: 146830
晶圓大小: 8"
優質的: 1996
DxZ System with 3 Chambers, 8" RF cleaning type Application: CVD Platform Type CENTURA I BODY SBC Board V452 Chamber Type Position A DxZ Nitride Position B DxZ Nitride Position C DxZ Nitride Position D Blank Position E MULTI COOLDOWN Position F CHA - DxZ CHAMBER Chamber Options Process Kit Customer Option Baratron Guage 10Torr / 1Torr Match AE 3155094-003A Heater Lift 0010-38426 RF Generator RFG 2000-2V EPD 0500-01047 Heater Driver 0190-09419 CHB - DxZ CHAMBER Chamber Options Selected Option Process Kit Customer Option Baratron Guage 10Torr / 1Torr Match AE 3155094-003A Heater Lift 0010-38426 RF Generator RFG 2000-2V EPD 0500-01047 Heater Driver 0190-09419 CHC - DxZ CHAMBER Chamber Options Selected Option Process Kit Customer Option Baratron Guage 10Torr / 1Torr Match AE 3155094-003A Heater Lift 0010-38426 RF Generator RFG 2000-2V EPD Heater Driver 0190-09419 CHE - COOLDOWN CHAMBER Type Multi cooldown CHF - (OA) ORIENTER Orienter Standard Gas Delivery Options Pallet Options Component Selection STANDARD Valve Veriflo Transducer MKS Regulator Filter Transducer Displays MFC Type STEC 4400 Gas Panel Pallet A Gas Line Requirement Gas Line Configuration Line 1 Gas NH3 MFC Size 2 SLM Line 2 Gas N2 MFC Size 5SLM Line 3 Gas SiH4 MFC Size 200 SCCM Line 4 Gas NF3 MFC Size 1 SLM Line 5 Gas N2O MFC Size 1 SLM Line 6 Gas CF4 MFC Size 3 SLM Line 7 Gas N20 MFC Size 4V 239.7 SCCM / 2V 119.8SCCM Line 8 Gas N2 MFC Size 5 SLM Line 9 Gas HE MFC Size 5SLM Gas Panel Pallet B Gas Line Requirement Gas Line Configuration Line 1 Gas NH3 MFC Size 2 SLM Line 2 Gas N2 MFC Size 5SLM Line 3 Gas SiH4 MFC Size 200 SCCM Line 4 Gas NF3 MFC Size 1 SLM Line 5 Gas N2O MFC Size 1 SLM Line 6 Gas CF4 MFC Size 3 SLM Line 7 Gas N20 MFC Size 4V 239.7 SCCM / 2V 119.8SCCM Line 8 Gas N2 MFC Size 5 SLM Line 9 Gas HE MFC Size 5SLM Gas Panel Pallet C Gas Line Requirement Gas Line Configuration Line 1 Gas NH3 MFC Size 2 SLM Line 2 Gas N2 MFC Size 5SLM Line 3 Gas SiH4 MFC Size 200 SCCM Line 4 Gas NF3 MFC Size 1 SLM Line 5 Gas N2O MFC Size 1 SLM Line 6 Gas CF4 MFC Size 3 SLM Line 7 Gas N20 MFC Size 4V 239.7 SCCM / 2V 119.8SCCM Line 8 Gas N2 MFC Size 5 SLM Line 9 Gas HE MFC Size 5SLM Transfer Chamber Transfer Ch Manual Lid Hoist YES Robot Type CENTURA HP ROBOT Robot Blade Option Ceramic Blade Remotes Heat Exchanger AMAT 0 Currently stored in a cleanroom 1996 vintage.
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AMAT/APPLIED MATERIALS Centura 5200反應堆是一種先進的等離子體增強化學氣相沈積（PE-CVD）系統，為半導體器件制造提供幹凈、低溫的工藝環境。它是一種超高真空、水平運行的反應堆，並通過廣泛的CVD工藝配方和材料提供了極致的靈活性。AMAT Centura 5200利用微波頻率、離子鍍層和等離子體增強反應源，實現了更可控、更可重復的工藝，將薄膜層鋪設在基板上，提高了器件性能和可靠性。儀器可以精確精確地控制源氣體溫度和所需工藝參數的流速，以及基板本身的溫度。APPLIED MATERIALS Centura 5200具有多區放熱加熱爐系統以最大限度地提高生產率,以及在每個反應區精心放置的一組端點傳感器,以保證均勻的過程,從而一致形成高質量的薄膜層。最終，均勻的薄膜厚度，伴隨著先進的深層剖面分析（DPA）、過程監測和反饋回路，保證了即使是極其復雜的過程的可重復性。增加一個大面積的基板支架提供了以最小的占地面積同時運行兩個不同的進程的靈活性。此外,Centura 5200先進的自動RF/DC發電機提供了精確的電源控制,比傳統系統更快的加速時間。最後,AMAT/APPLICED MATERIALS Centura 5200包括用戶友好的軟件,可實現更快的流程設置、結果分析、配方形成等。它已在世界各地的關鍵實驗室進行了廣泛的測試和認證，被認為是現有的最先進和最高效的PE-CVD系統之一。
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