二手 AMAT / APPLIED MATERIALS Centura 5200 #9061043 待售

AMAT / APPLIED MATERIALS Centura 5200
ID: 9061043
晶圓大小: 8"
優質的: 1996
Etcher, 8" Cassette nest plastic, 8" Wafer shape: SNNF (Semi notch no flat) System information: Platform type: Centura (3) Process chambers SECS / GEM: Yes Chamber location / Type / Current process: Position A / MxP / Poly etch Position B / MxP / Poly etch Position C / MxP / Poly etch Position F / Orienter (Laser assy not available) Etch chamber: Chamber type: MxP Wafer clamp: Polyimide ESC BS He cooling: Yes He dump line: Yes Turbo pump: SEIKO STP-301CVB Endpoint type: Stand alone Monochrometer: Per chamber Generator model: ENI OEM-12B3 Max power: 1250w Lid temp control: PID Control Gate valve: Heated gate valve Matcher: SMA-1000 Process manometer: MKS 1Torr Gas panel: Manual valve: Yes Transducer: Yes Transducer displays: Yes Regulator: Yes Filter: Yes Gas panel facilities hook up: Single line drop bottom feed (Left side) Exhaust: Top Gas panel door interlock: Yes Gas panel exhaust interlock: Yes Gas panel pallet: Corrosive gas line: (2) Lines per chamber Inert gas line: (6) Lines per chamber MFC type: STEC SEC-7440MC Gas line (gas name, MFC size) ChA Line 1: CL2 / 80 / SEC-7440 Line 2: HBR / 100 / SEC-7440 Line 3: NF3 / 100 / SEC-7440 Line 4: CHF3 / 70 / SEC-7440 Line 5: O2 / 40 / SEC-7440 Line 6: CF4 / 100 / SEC-7440 Line 7: Ar / 100 / SEC-7440 Line 8: N2 / 100 / SEC-7440 ChB Line 1: CL2 / 83 / SEC-7440 Line 2: HBR / 100 / SEC-7440 Line 3: NF3 / 100 / SEC-7440 Line 4: CHF3 / 70 / SEC-7440 Line 5: O2 / 40 / SEC-7440 Line 6: CF4 / 100 / SEC-7440 Line 7: Ar / 100 / SEC-7440 Line 8: N2 / 100 / SEC-7440 ChC: Line 1: CL2 / 80 / SEC-7440 Line 2: HBR / 100 / SEC-7440 Line 3: NF3 / 100 / SEC-7440 Line 4: CHF3 / 70 / SEC-7440 Line 5: O2 / 40 / SEC-7440 Line 6: CF4 / 100 / SEC-7440 Line 7: Ar / 100 / SEC-7440 Line 8: N2 / 100 / SEC-7440 Mainframe: Facilities type: Regulated Loadlock type: Wide body Loadlock auto-rotation: Yes Wafer mapping type: Fast Wafer mapping sensor: Yes Cassette present sensor: Yes Transfer chamber manual lid hoist: Yes Robot type: HP Emo button: Front side Water leak detector: Yes Signal tower (front): Green, yellow, red (2) System monitor displays / controller: Front, remote Remotes: System controller & AC rack EMO button: Yes Smoke detector: Yes Line frequency and voltage: 50/60Hz, 208VAC, 3ph Remote UPS interface: Yes Generator rack EMO button: Yes Smoke detector: Yes Water leak detector: Yes Heat exchanger type: For wall: RISSHI CS-400SW-2 (0 - 80°C) For cathode: RISSHI CS-400SW-2 (0 - 80°C) Pumps type: LL Chamber: EBARA A30W Transfer chamber: EBARA A30W Ch A: EBARA A30W Ch B: EBARA A30W Ch C: EBARA A30W Gas scrubber: EBARA GTE-3 1996 vintage.
AMAT/APPLIED MATERIALS Centura 5200是專門為生產尖端半導體而設計的高性能反應堆。它結合了先進的沈積技術和集成的自動化能力,以實現最佳的過程靈活性和控制。AMAT Centura 5200具有獨特的混合沈積室設計,便於進行積極的過程,允許進行低溫和高溫反應。由於混合沈積方法通過減少與交換室相關的停機時間來增加吞吐量,這使得用戶能夠更快地進行處理。該反應堆允許用戶生產更均勻、更一致、吞吐量更高的薄膜。APPLIED MATERIALS Centura 5200還具有許多可用的過程和可定制的軟件,允許用戶根據其特定要求自定義產品。用戶可以使用此軟件定制沈積配方和工藝流程,最佳地調整反應堆的功能以滿足他們的需求。這也允許用戶快速修改和重復流程,以提高流程優化和可靠性。Centura 5200反應堆采用先進的遠程診斷系統,能夠快速、方便地進行維修和故障排除。集成的自動化控制和診斷系統為用戶提供了從研發到生產的各種任務所需的靈活性。這些靈活的控件還使用戶能夠最大限度地提高吞吐量並實時監控流程參數。此外,AMAT/APPLIED MATERIALS Centura 5200反應堆的設計考慮到安全性。它具有廣泛的安全和環境保障措施,包括保護警衛和室內聯鎖裝置,以確保反應堆的運行符合環境條例。AMAT Centura 5200是一個功能廣泛的先進反應堆,因此成為市場上最好的高性能反應堆之一。其先進的沈積室設計、集成的自動化功能和靈活的控制使其成為從研發到生產的各種任務的理想解決方案。
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