二手 AMAT / APPLIED MATERIALS Centura 5200 #9071275 待售

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ID: 9071275
晶圓大小: 8"
Epi Reactor, 8" Application: Sige Bipolar/BICMOS Chamber type | Selected option: Chamber A: (RH) Reduced pressure EPI Chamber B: (RH) Reduced pressure EPI Chamber C: (RH) Reduced pressure EPI Chamber D: Empty Chamber E: Empty Chamber F: (CA) Single slot cooldown EMO Guard ring Chamber A/B/C: Thickness control options: Accusett 2 Recipe control software: No Third manometer: P/N 0220-35949, 200 Torr Gas line isolation: Yes Leak check port: None RGA port and valve: None Gas delivery options: ATM Capability in GP Only: No Gas panel type: Configurable Gas panel exhaust: Chamber B side MFC: P/N: 0221-18389, Unit 8561 MFC's Filter: Millipore Pump purge: Yes Chamber A/B/C Gas Option: SiHCl3: Not applicable SiH2Cl2: Yes SiH4: Yes GEH4: Yes Direct inject dopant: 2 Mixed dopant 1: Yes Mixed dopant 2: Yes Mainframe: Loadlock type: P/N: 0220-35948 Narrow body load locks with tilt-out WBLL Equalization: No Cassette platform type: Universal Common chamber options: Variable speed blower: Yes SW Monitor quartz pyrometer kit: 3 Lamps type: Ushio log life Susceptors: Tabbed susceptor Brands: Toshiba Lift pin type: Hollow silicon carbide Susceptor support shaft: NCP Susceptor support shaft Tips: Silicon carbide removable tips Exhaust inserts: Stainless steel Lower liners: Non-vented Pump isolation valve: No Exhaust deposit reduction: N/A Transfer chamber: Wafer sensing: On the fly cneterfinding Transfer chamber lid hoist: Yes Robot: HP + ENP Transfer chamber purge, 15 SLM: Yes Diagnostics and control: SECSTrace: Yes Vacuum pumps: Pump brand: Edwards Loadlock chamber pump: Edwards iQDP40 Transfer chamber pump: Edwards iQDP40 Proces chamber pump: Edwards iH1000 Monitors: (1) Through the wall and (1) Table mount Manual Set Tools and kits: Centura HT Temp profiling kit Upper dome centering ring kit HT Level 1 Consumable kit (2) Additional Level 1 consumable kit Additional Epi quartz and graphite spares: (2) Reduced pressure upper dome (2) Lower dome (4) Spare susceptors (4) Preheat rings Manually input spare: P/N: 3920-01120, 10-120 lb-in torque wrench 480 V with transformer, 60 Hz, 600 A Currently installed 2005 vintage.
AMAT/APPLIED MATERIALS Centura 5200是一種反應堆設備,設計用於先進的電鍍、蝕刻和介電加工應用。它配有高精度的光刻口罩,用於圖樣處理。該系統旨在快速高效地在大面積的基板上應用物理和化學處理。AMAT Centura 5200采用厚厚的不銹鋼外殼構造,提供可靠耐用的防腐蝕和其他環境條件。在外殼內部,采用了最先進的控制模塊和機器人傳輸單元,以確保機器過程的準確性和可重復性。該工具還配備了一系列自動化的泵、閥門和其他運動控制部件,以確保材料的可靠和準確輸送。該資產可以容納多種類型的浴池配置以及多種基材,使其適合各種應用。此外,用戶可以根據所處理的材料選擇適當的批處理持續時間和過程參數。該模型還支持嵌入式可編程邏輯,使其能夠監視和控制特定過程的所有必要參數,從而允許對過程條件進行更多的控制。反應堆提供從RT(室溫)到350°C的廣泛運行溫度,最大流量為175升/分鐘;使其適用於高速、高精度的鍍層工藝。用戶還可以指定自定義參數,例如所需的蒸發速率,並且設備能夠檢測和存儲任何過程結果以供將來參考。APPLIED MATERIALS Centura 5200是一種可靠的反應堆,配備了先進的技術,提供精確、可重復和高效的鍍層、蝕刻和介電工藝。它可以很容易地配置為處理許多不同類型的底物和浴池配置,使其成為可靠和多用途的反應堆。
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