二手 AMAT / APPLIED MATERIALS Centura DPS+ #9395287 待售
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ID: 9395287
晶圓大小: 6"
Poly etcher, 6"
Mainframe:
Position A, B: DPS Plus poly
Position F: Orienter
Front panel: Anti-static painted
Signal light tower: 3 Color (R, A, G)
Type: AC Rack
Type: EMO Switch
EMO Guard ring
Flow sensor chamber:
Wall
Cathode
Turbo pump 4
DPS
Type: Wide body loadlock
Slit valve: O-Ring type (viton)
Wafer mapping: Enhanced (fast)
Type: HP and robot
Robot blade option
Wafer on blade detector: Basic
Vent filter: Ceramic
Heater
Loadlock vent: Top
Orienter chamber:
Type: Hoop
DTCU: ES
Voltage distributor
Mount ring
Lower chamber cover: STD
Type: Lip seal
EDWARDS TMP
Pressure gauge: CM 100 Mt (MKS)
Pressure gauge: CM 10 Torr (MKS)
ESC HV Module P/N: 0010-30139
BIAS RF Matcher P/N: 0010-00854
Source RF Matcher: Install
HE Pressure controller
Type: MKS649A (50 SCCM)
ATLAS 2012 Source RF Generator
ACG-6B RF Generator (BIAS)
Throttling Gate Valve (TGV)
EDWARDS TMP Etcher pump pipe line
With heater
Cathode assy type: HE Single supply
Upper chamber: Full A-coat
Ceramic dome P/N: 0200-39137
Gas panel:
MFC Type: AERA FC-D980C
Position / Gas / MFC Size
Gas 1, 11 / CL2 / 200 SCCM
Gas 2, 12 / HBR / 200 SCCM
Gas 6, 16 / CF4 / 200 SCCM
Gas 7, 17 / CHF3 / 100 SCCM
Gas 8, 18 / O2 / 100 SCCM
Gas 9, 19 / SF6 / 100 SCCM
Gas 10, 20 / AR / 200 SCCM
Gas panel facilities:
BD Side
SLD Box bottom feed
AC Chamber TOP side
VMEII Gas panel controller
VERIFLO Valve
MKS 872 Transducer
VERIFLO SQ2 Regulator
MILIPORE Filter
Transducer display per stick
CRT Endpoint monitor
Rack mount
Type: (2) Monochromators
Type: V452 SBC Controller
Umbilicles: 40 Feet base
Mainframe umbilical: 40 ft
AC Mainframe umbilical: 40 ft
Chiller control cable length: 40 ft
Chiller hose length: 50 ft
Pump signal cable length: 50 ft
RF RACK To MF Cable length: 75 ft
Type: SMC H2000 Chiller
Cathode (chamber A, B): SMC H2000
Wall (chamber A, B): SMC H2000
Dome (chamber A, B): Facility cooling water
Coolant Type: DI and EG
(2) Chiller power lines (Tool C/B Chiller)
Type: (4) Chiller hoses (50 Ft)
Signal I/O
EBARA AA40W / AA10
(4) Pump interfaces
(4) Pump power lines (Tool C/B Pump)
M/F Utility connection: Rear side
UPS
Lamp CB: 20 A
RF Generator CB: (B)15 A / (S)30 A
Pump CB: 30 A
CRT Monitor
Type: DTCU Hoist
Power supply: 200 - 208 VAC, 60 Hz, 100 mA.
AMAT/APPLIED MATERIALS Centura DPS是一種用於基於等離子體的工業制造應用的高性能集成設備。它專為生產先進技術節點、平板顯示器、計算機內存芯片和微處理器等半導體器件而設計。該系統采用串聯驅動機構,具有6個區域的負載鎖和幾個智能的終端效應器,可實現準確和可重復的產品放置。該反應堆能夠同時處理多達25個晶片，可重復和可重復的結果。該單元包括一臺具有實時配方生成選項、高級安全功能和專有硬件的自動配方控制機器,在定制處理參數時具有近乎無限的靈活性。這使工具能夠輕松適應不斷變化的生產需求,例如新產品設計或過程更改。AMAT Centura DPS可以處理多種先進的材料和基材，包括純單晶矽、金屬和聚合物。它能夠提供多種沈積和蝕刻過程，如原子層、電子束和離子束處理。該資產還具有先進的分析和監測能力，使沈積和蝕刻過程具有高精度和可重復性，從而在生產過程中實現高產和提高質量。APPLIED MATERIALS Centura DPS旨在適應最新的高級流程步驟,並且與高級流程自動化工具和技術（如自動對齊、自動調整和機器視覺等）兼容。這樣可以實現更快、更高效的處理,同時保持最高的質量和準確性。機器沒有活動部件,允許它全天候運行,優化資源並將停機時間縮短到最低限度。Centura DPS模型符合歐盟的安全、報告和環境標準,是工業環境的理想選擇。AMAT/APPLICED MATERIALS Centura DPS除了具有強大的高性能處理優勢外,還易於使用和維護。它具有用戶友好的界面、現場人員培訓和實時故障排除支持,使其成為市場上最可靠、最具成本效益的生產工具之一。
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