二手 AMAT / APPLIED MATERIALS Centura HP PVD #9266424 待售
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ID: 9266424
優質的: 1995
Sputtering system, 6"
Chamber type:
Chamber A: AL
Chamber B: AL
Chamber C: PC-II
Chamber D: TiTiN
Chamber E (Orient / Degas)
Chamber F (Orient / Degas)
Chamber A:
Heater type: 4F
Source type: 11.3"
Body: STD
Adaptor: STD
Manometter: Single 0.1 torr (6274A)
Ion gauge: Nude
Lift cylinder: STD
Basic motorize
Gate vavle: 2P
Cryo pump: EHN-OB8F
Chamber B:
Heater type: 4F
Source type: 11.3"
Body: STD
Adaptor: STD
Manometter: Single 0.1 torr (6274A)
Ion gauge: nude
Lift cylinder: STD
Basic motorize
Gate vavle: 2P
Cryo pump: EHN-OB8F
Chamber D (PVD):
Heater type: 101
Source type: 11.3"
Body: STD
Adaptor: STD
Manometter: Single 0.1 torr (6274A)
Ion gauge: nude
Lift cylinder: STD
Basic motorize
Gate vavle: 3P
Cryo pump: EHN-OB8F
Chamber C (PC-II):
Resonator: STD
Body: Turbo
Basic pedestat
Turbo adaptor: Short
Manometter: Single 0.1 torr (6274A)
LEYBOLD 361C Turbo pump
Match box: 6"
Lift cylinder
Electrical requirements:
Controller type: Centura standard
Electrical interface: Top feed AC cable
Main frame:
Type: Main frame I
System placement: Stand alone
Robot type: HP Robot
Robot blade: NICKEL Coated AI
Loadlock:
Loadlock cassette: Wide body
Index type: With rotation
Cassette handler: Metal
Basic loadlock wafer mapping
Dual stage vent type
Gas delivery:
Filters:
Veriflo 10 Ra Max
Pall
Generator:
Chamber A:
MDX Power: MDX-L12-650
Chamber B:
MDX Power:
MDX-L12M
MDX-L12
Chamber C: LF-10A Generator
CPS-1001S Missing
Chamber D:
MDX Power: MDX-L12
NESLAB-I Heat exchanger
(2) 9600 Compressors
Umbilicals:
MF - AC rack: 300"
Pumps:
System: A30W
PC-II: A07
Includes:
Serial isolator
System reset
Lk Det 5 and 6 / Conv / TC
(3) Lk Det 7 and 8 / Conv / TC
Floppy Disk Drive (FDD)
Hard Disk Drive (HDD)
Chamber A, B, C, D & E: Interface
Mainframe interface
Loadlock interface
Chamber A, B, C & D:
Dl/O 1
Dl/O 2
Chamber E: Dl/O
Synergy SBC
Video
SEI
Chamber A, B, C & D: Al/O
Chamber E/MF: Al/O 2
Mainframe:
Al/O 1
Dl/O 1
Dl/O 2
Dl/O 3
Dl/O 4
Dl/O 5
Dl/O 6
(3) Steppers
OMS
No shutter (Chamber A, B & D)
1995 vintage.
AMAT/APPLIED MATERIALS Centura HP PVD（物理氣相沈積）反應器是一種下一代沈積設備，旨在提供先進、高性能的薄膜沈積能力。這一創新系統通過多個工具和腔室提供各種沈積配方，並針對提高工藝靈活性和生產效率進行了優化。AMAT Centura HP PVD反應堆能夠沈積多種材料，包括但不限於銅、鋁、氮化鈦和鎢等。利用多種選擇性氣體和惰性氣體精確控制物料來源，創造最佳薄膜沈積所需的完美環境和壓力。Select Source™ （SS）線性加速器和Turbo-Pumped™電源（TPP）確保保持過程所需的無功壓力和溫度。APPLIED MATERIALS Centura HP PVD單元還具有溫度控制的升空/蝕刻模塊和集成的高溫烘烤。此模塊設計用於在提升和蝕刻過程中自動控制基板周圍的溫度,以最大程度地減少有害熱接觸的影響。它還具有快速熱掃描功能，以準確地描述薄膜的生長和蝕刻深度。除了卓越的PVD功能外,Centura HP PVD反應堆的設計還提供卓越的正常運行時間和工作效率。機器的模塊化配置允許快速輕松地加載工具,並帶有功能強大的軟件和圖形用戶界面,任何技能級別的操作員都可以輕松使用。該工具還帶有自動配方功能，通過節省用戶時間和精力簡化沈積過程。總體而言,AMAT/APPLIED MATERIALS Centura HP PVD反應器是一種先進的沈積資產,具有出色的薄膜沈積能力和卓越的工藝靈活性。其溫度控制的升降/蝕刻模塊、Select Source線性加速器、Turbo-Pumped電源和自動配方功能使其成為高性能薄膜沈積的理想工具。
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