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AMAT / APPLIED MATERIALS Centura I P1
ID: 9133087
WxZ system, 6" Chamber Type/ Location Position A WXZ Position B WXZ Position C WxP Position D WxP Position E MULTE COOLDOWN Position F ORIENTER Electrical Requirements Line Voltage 200/208 VAC Line Frequency 50~60 Hz System Safety Equipment EMO Guard Ring INCLUDED Water and Smoke Detector ALARM System Labels ENGLISH with Chinese simplified Wxz Chamber Options Bias Generator STANDARD ENI 12B3 Slit Valve Oring STANDARD Throttle Valve STANDARD THROTTLE Wxz Chamber Options Bias Generator STANDARD ENI 12B3 Slit Valve Oring STANDARD Throttle Valve STANDARD THROTTLE Wxz Chamber Options Bias Generator STANDARD ENI 12B3 Slit Valve Oring STANDARD Throttle Valve STANDARD THROTTLE Wxz Chamber Options Bias Generator STANDARD ENI 12B3 Slit Valve Oring STANDARD Throttle Valve STANDARD THROTTLE Orienter Chamber Options Chamber Type MULTE COOL DOWN Pallet Options General Mainframe Options Facilities Type REGULATED Facilities Orientation MAINFRAME FACILITIES BOTTOM CONNECTION Weight Dispersion Plates Mainframe And Remote Chamber Flow Switch Options Loadlock/Cassette Options Loadlock Type Narrow Body AUTO ROTATION Loadlock Platform UNIVERSAL Cassette Type Supported 200 mm Loadlock Cover Finish ANTI-STATIC PAINTED Loadlock Slit Valve Oring Type VITON Wafer Mapping ENHANCED Integrated Cassette Sensor YES Transfer Chamber Options Transfer Ch Manual Lid Hoist YES Robot Type HP Robot Blade Option ROUGHENED AL BLADE Wafer On Blade Detector BASIC Loadlock Vent BOTTOM VENT System Controller Controller Type Cntrlr Electrical Interface BOTTOM FEED Controller Exhaust TOP EXHAUST System Monitors System Monitor 1 STANDALONE Monitor Cursor BLINKING CURSOR AC Rack Controller Facility Interface REMOTE UPS INTERFACE ONLY
AMAT/APPLIED MATERIALS Centura I P1是用於半導體制造的單晶片集群工具。它旨在創建獨特的低溫淺溝槽隔離(STI)工藝,以減少由於拋光、蝕刻和真空處理而產生的器件應力。該反應堆支持低k和介電拋光工藝,使設備結構具有更高的縮放能力和更好的性能。它還擁有先進的晶圓轉移機制,以提高制造過程中工藝步驟的準確性和可重復性。AMAT Centura I P1反應堆是一種熱化學氧化物(TCO)聚類工具,旨在提供高性能的STI溶液,同時減輕不利的環境和制造風險。該工具的核心是DEIONIZED WATER (DI) Ultrashower,它在處理過程中確保精確且可重復的晶圓溫度曲線。該工具執行一個DI流和一組特定的氣態前體,在晶圓中形成孤立的溝槽或凹坑。其結果是一個真正統一的晶片規模的STI過程,降低設備應力水平和提高性能。APPLIED MATERIALS Centura I P1反應堆還配備了低溫端點探測器(LTEP),可精確測量過程的端點。LTEP保持了科學、技術和創新進程的預設統一性,從而產生了幹凈、可重復和統一的結果。該工具還提供低k拋光能力,減少相鄰晶體管節點之間的寄生電容。對於需要更多擴展和改進性能的設備結構,這是一個關鍵過程。該工具還配備了先進的晶圓傳遞機制,方便晶圓的加載和卸載。它提供垂直晶片對準,在過程中對晶片邊緣進行更精確的跟蹤,從而提高晶片到基板的可重復性。Centura I P1反應堆非常適合那些需要低成本和高性能STI工藝應用的人。它具有低k拋光和晶片傳輸能力,是一種經濟高效且可靠的工具,適用於那些需要產量臨界、應力減輕、可持續重復和統一的STI結果的用戶。
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