二手 AMAT / APPLIED MATERIALS Centura Ultima HDP CVD #115605 待售
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ID: 115605
晶圓大小: 8"
優質的: 2000
Etcher, 8"
(2) Ultima chambers
Technology :IMD
Wafer Size : 200mm
Wafer Shape : SNNF (Semi Notch No Flat)
Software Version : B4.3.14
Ch A : Ultima HDP-CVD
Ch B : Ultima HDP-CVD
Ch D : Ultima + HDP-CVD
Ch E : Multislot Cool Down
Ch F : Orienter
CHAMBER A,B Ultima HDP-CVD :
Nozzle : Long/Long Side
Clean Gas Distribution : Baffle
Turbo Pump : Ebara ET1600WS w/ HVA
Wafer Temperature Monitoring : Yes
Top Gas Feed : Without Top O2
Dual Independent He Control : Standard 10/10 TORR
Clean Method : Microwave
CHAMBER D - Ultima + HDP-CVD :
Nozzle : Long/Long Side
Clean Gas Distribution : Baffle
Turbo Pump : Ebara ET1600WS w/ HVA
Wafer Temperature Monitoring : Yes
Top Gas Feed : Without Top O2
Dual Independent He Control : Standard 10/10 TORR
Clean Method : Top Mount
Line Frequency : 60Hz
Line Voltage : 200/208V
Line Amperage : 600A Platform
EMO type : Turn to release EMO
EMO Guard Ring : Yes
System Labels : English w/Chinese Non-simplified
System Smoke Detector : Controller
EXISTING MAINFRAME :
Mainframe Type : Ultima HDP w/Multislot
Frame Type : Standard Frame
System Placement : Through the Wall
Mainframe Skins : No
Mainframe Exhaust Duct : No
Mainframe Facilities Connection : Back
Robot Type : HP Robot
Robot Blade : Ceramic
Narrow body Loadlocks : Cassette Present Sensor
Loadlock Wafer Mapping : Basic
N2 Purge Type : STEC 4400MC 10 Ra Max
Gas Panel Surface Finish : Standard Gas Panel
MFC Type : STEC 4400MC 10 Ra Max
Valves : Fujikin 5 Ra Max
Filters : Pall Ni 10 Ra Max
Transducers : MKS w/ Display
Regulators : Veriflo
System Cabinet Exhaust : Top
Gas Panel Gas/Flow Direction Labels : Yes
APC Seriplex Cover : Yes
Gas Panel Doors : Solid
Gas Pallet Configuration :
Chamber A, B, D
Gas Stick/Process Gas/MFC size/Regulator/Transducer
#1 SiF4 100 Y Y
#2 O2 400 Y Y
#3 SiH4 200 Y Y
#4 Ar 300 Y Y
#5 SiH4 20 Y Y
#6 Ar 50 Y Y
#7 NF3 2000 Y Y
#8 Ar 2000 Y Y
RF Generator Rack - Ultima Gen. Rack
Chamber A, B :ASTEX 80S09mW (2)
Chamber D : ENI Genesis Nova -50A-04
Ultima Stand-Alone RF Generator Rack : Yes
Generator Rack Cooling - RF Gen Rack Manifold with Quick Disconnect
Ultima Gen Rack H20 Connection - Barbed Brass
Heat Exchanger : SMC Thermo
System Controller Signal Cable Length : 55ft
RF Gen Rack Cable Length : 50ft
Ultima Stand-Alone Generator Rack : 98 ft
HX Hose Length : 50ft
HX Cable Length : 50ft
Pump Cable : 50ft
Ultima Microwave Generator Cable Length : 50 ft
Ultima WTM Cable Length : 32.8 ft (10m)
Vacuum Pumps, Exhaust Scrubber not included in sale
System Can be inspected
Currently Crated
2000 vintage.
AMAT Centura Ultima高密度等離子體(HDP)化學氣相沈積(CVD)反應器是一種多合一工藝設備,可在大小晶片上提供精確、準確和經濟高效的薄膜和薄膜堆棧沈積。這種CVD反應器利用高沈積速率的高效等離子體源,以便在一系列復雜的底物上沈積超薄膜。這款高性能工具提供了成熟的流程窗口、令人難以置信的可重復性以及晶圓廠環境中無與倫比的性能和魯棒性。AMAT/APPLIED MATERIALS Centura Ultima HDP CVD利用高功率和高頻率的先進等離子體源來確保對沈積速率和均勻性的精確控制。該系統旨在處理高密度等離子體操作,使用戶在一系列薄膜材料上實現高均勻性和高沈積吞吐量。該裝置在大(200毫米)和小(150毫米)直徑的基板上提供精確、可重復的沈積,使其成為工業領先的復合基板上薄膜沈積反應器。AMAT Centura Ultima HDP CVD機器設計具有一系列安全和人體工程學特性,確保用戶安全和易於操作。機器人臂設計為提供安全可靠的晶圓傳輸,最大限度地減少了整個過程周期。該工具的單室設計確保了由於消除了腔室之間的轉移操作而提高了安全性。資產優化的人體工程學為人員提供了一個安全的環境,減少了操作員失誤和其他事故的可能性。APPLICED MATERIALS Centura Ultima HDP CVD是一種高性能的模型,能夠精確精確地沈積薄膜。這種設備使用先進的等離子體源,並在一系列基材尺寸和形狀上提供高均勻性。該系統符合人體工程學,安全,與一系列先進的薄膜材料完全兼容。這種CVD反應器是大型半導體制造設施和研發環境中薄膜沈積的理想工具。
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