二手 AMAT / APPLIED MATERIALS Centura Ultima HDP CVD #115605 待售

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ID: 115605
晶圓大小: 8"
優質的: 2000
Etcher, 8" (2) Ultima chambers Technology :IMD      Wafer Size : 200mm      Wafer Shape : SNNF (Semi Notch No Flat)      Software Version : B4.3.14 Ch A : Ultima HDP-CVD Ch B : Ultima HDP-CVD Ch D : Ultima + HDP-CVD Ch E : Multislot Cool Down Ch F : Orienter CHAMBER A,B Ultima HDP-CVD : Nozzle : Long/Long Side Clean Gas Distribution : Baffle Turbo Pump : Ebara ET1600WS w/ HVA Wafer Temperature Monitoring : Yes Top Gas Feed : Without Top O2 Dual Independent He Control : Standard 10/10 TORR Clean Method : Microwave CHAMBER D - Ultima + HDP-CVD : Nozzle : Long/Long Side Clean Gas Distribution : Baffle Turbo Pump : Ebara ET1600WS w/ HVA Wafer Temperature Monitoring : Yes Top Gas Feed : Without Top O2 Dual Independent He Control : Standard 10/10 TORR Clean Method : Top Mount Line Frequency : 60Hz Line Voltage : 200/208V Line Amperage : 600A Platform EMO type : Turn to release EMO EMO Guard Ring : Yes System Labels : English w/Chinese Non-simplified System Smoke Detector : Controller EXISTING MAINFRAME : Mainframe Type : Ultima HDP w/Multislot Frame Type : Standard Frame System Placement : Through the Wall Mainframe Skins : No Mainframe Exhaust Duct : No Mainframe Facilities Connection : Back Robot Type : HP Robot Robot Blade : Ceramic Narrow body Loadlocks : Cassette Present Sensor Loadlock Wafer Mapping : Basic N2 Purge Type : STEC 4400MC 10 Ra Max Gas Panel Surface Finish : Standard Gas Panel MFC Type : STEC 4400MC 10 Ra Max Valves : Fujikin 5 Ra Max Filters : Pall Ni 10 Ra Max Transducers : MKS w/ Display Regulators : Veriflo System Cabinet Exhaust : Top Gas Panel Gas/Flow Direction Labels : Yes APC Seriplex Cover : Yes Gas Panel Doors : Solid Gas Pallet Configuration : Chamber A, B, D Gas Stick/Process Gas/MFC size/Regulator/Transducer #1 SiF4 100 Y Y #2 O2 400 Y Y #3 SiH4 200 Y Y #4 Ar 300 Y Y #5 SiH4 20 Y Y #6 Ar 50 Y Y #7 NF3 2000 Y Y #8 Ar 2000 Y Y RF Generator Rack - Ultima Gen. Rack Chamber A, B :ASTEX 80S09mW (2) Chamber D : ENI Genesis Nova -50A-04 Ultima Stand-Alone RF Generator Rack : Yes Generator Rack Cooling - RF Gen Rack Manifold with Quick Disconnect Ultima Gen Rack H20 Connection - Barbed Brass Heat Exchanger : SMC Thermo System Controller Signal Cable Length : 55ft RF Gen Rack Cable Length : 50ft Ultima Stand-Alone Generator Rack : 98 ft HX Hose Length : 50ft HX Cable Length : 50ft Pump Cable : 50ft Ultima Microwave Generator Cable Length : 50 ft Ultima WTM Cable Length : 32.8 ft (10m) Vacuum Pumps, Exhaust Scrubber not included in sale System Can be inspected Currently Crated 2000 vintage.
AMAT Centura Ultima高密度等離子體(HDP)化學氣相沈積(CVD)反應器是一種多合一工藝設備,可在大小晶片上提供精確、準確和經濟高效的薄膜和薄膜堆棧沈積。這種CVD反應器利用高沈積速率的高效等離子體源,以便在一系列復雜的底物上沈積超薄膜。這款高性能工具提供了成熟的流程窗口、令人難以置信的可重復性以及晶圓廠環境中無與倫比的性能和魯棒性。AMAT/APPLIED MATERIALS Centura Ultima HDP CVD利用高功率和高頻率的先進等離子體源來確保對沈積速率和均勻性的精確控制。該系統旨在處理高密度等離子體操作,使用戶在一系列薄膜材料上實現高均勻性和高沈積吞吐量。該裝置在大(200毫米)和小(150毫米)直徑的基板上提供精確、可重復的沈積,使其成為工業領先的復合基板上薄膜沈積反應器。AMAT Centura Ultima HDP CVD機器設計具有一系列安全和人體工程學特性,確保用戶安全和易於操作。機器人臂設計為提供安全可靠的晶圓傳輸,最大限度地減少了整個過程周期。該工具的單室設計確保了由於消除了腔室之間的轉移操作而提高了安全性。資產優化的人體工程學為人員提供了一個安全的環境,減少了操作員失誤和其他事故的可能性。APPLICED MATERIALS Centura Ultima HDP CVD是一種高性能的模型,能夠精確精確地沈積薄膜。這種設備使用先進的等離子體源,並在一系列基材尺寸和形狀上提供高均勻性。該系統符合人體工程學,安全,與一系列先進的薄膜材料完全兼容。這種CVD反應器是大型半導體制造設施和研發環境中薄膜沈積的理想工具。
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