二手 AMAT / APPLIED MATERIALS Centura Ultima HDP CVD #62203 待售

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ID: 62203
晶圓大小: 8"
優質的: 2000
Etcher, 8" (2) Ultima chamber (1) Ultima plus chamber Technology :IMD      Wafer Size : 8"      Wafer Shape : SNNF (Semi Notch No Flat)      Software Version : B4.3.14      CHAMBER TYPE AND LOCATION      Ch A : Ultima HDP-CVD      Ch B : Ultima HDP-CVD      Ch C : Ultima + HDP-CVD      Ch E : Multislot Cool Down      Ch F : Orientor      CHAMBER A,B Ultima HDP-CVD :     Nozzle : Long/Long Side      Clean Gas Distribution : Baffle      Turbo Pump : Ebara ET1600WS w/ HVA      Wafer Temperature Monitoring : Yes      Top Gas Feed : Without Top O2      Dual Independent He Control : Standard 10/10 TORR      Clean Method : Microwave      CHAMBER C - Ultima + HDP-CVD :      Nozzle : Long/Long Side      Clean Gas Distribution : Baffle      Turbo Pump : Ebara ET1600WS w/ HVA      Wafer Temperature Monitoring : Yes      Top Gas Feed : Without Top O2      Dual Independent He Control : Standard 10/10 TORR      Clean Method : Top Mount      EXISTING ELECTRICAL REQUIREMENTS      Line Frequency : 60Hz      Line Voltage : 200/208V      Line Amperage : 600A Platform      EXISTING SAFETY EQUIPMENT :      EMO type : Turn to release EMO      EMO Guard Ring : Yes      System Labels : English w/Chinese Non-simplified      System Smoke Detector : Controller      EXISTING MAINFRAME :      Mainframe Type : Ultima HDP w/Multislot      Frame Type : Standard Frame      System Placement : Through the Wall      Mainframe Skins : No      Mainframe Exhaust Duct : No      Mainframe Facilities Connection : Back      Robot Type : HP Robot      Robot Blade : Ceramic      Loadlock Cassette : Narrow Body      Narrow body Loadlocks : Cassette Present Sensor      Loadlock Wafer Mapping : Basic      N2 Purge Type : STEC 4400MC 10 Ra Max      EXISTING GAS DELIVERY :      Gas Panel Surface Finish : Standard Gas Panel      MFC Type : STEC 4400MC 10 Ra Max      Valves : Fujikin 5 Ra Max      Filters : Pall Ni 10 Ra Max      Transducers : MKS w/ Display      Regulators : Veriflo      System Cabinet Exhaust : Top      Gas Panel Gas/Flow Direction Labels : Yes      APC Seriplex Cover : Yes      Gas Panel Doors : Solid      Gas Pallet Configuration :      Chamber A, B, C      Gas Stick/Process Gas/MFC size/Regulator/Transducer      #1 SiF4 100 Y Y      #2 O2 400 Y Y      #3 SiH4 200 Y Y      #4 Ar 300 Y Y      #5 SiH4 20 Y Y      #6 Ar 50 Y Y      #7 NF3 2000 Y Y      #8 Ar 2000 Y Y      REMOTES :      RF Generator Rack - Ultima Gen. Rack      ASTEX 80S09mW (3)      Quantity : Two      Ultima Stand-Alone RF Generator Rack : Yes      Generator Rack Cooling - RF Gen Rack Manifold with Quick Disconnect Ultima Gen Rack H20 Connection - Barbed Brass      Existing Heat Exchanger : SMC Thermo      Umbilicals :      System Controller Signal Cable Length : 55ft      RF Gen Rack Cable Length : 50ft      Ultima Stand-Alone Generator Rack : 98 ft      HX Hose Length : 50ft      HX Cable Length : 50ft      Pump Cable : 50ft      Ultima Microwave Generator Cable Length : 50 ft      Ultima WTM Cable Length : 32.8 ft (10m)      Vacuum Pumps, Exhaust Scrubber not included in sale Currently crated and stored      System Can be inspected 1999-2000 vintage.
AMAT/APPLIED MATERIALS Centura Ultima HDP CVD是一種化學氣相沈積(CVD)反應器,具有專有的熱壁輸送等離子體(HWDP)處理室。這種反應堆是專門為便利化學氣相沈積一系列具有優化的熱均勻性和等離子體均勻性的材料而設計的。反應堆使用化學前體在金屬、矽或陶瓷等基板上創建材料層。該反應器能夠產生難以置信的高密度等離子體輔助沈積(HDP)薄保形層,是從半導體封裝和先進互連到生物醫學和納米技術相關應用的理想工具。AMAT Centura Ultima HDP CVD反應堆設計為在CVD過程中提供最大的均勻性和可重復性。HWDP處理室的設計允許前體的精確蒸發,這些前體在與熱等離子體源接觸時轉化為等離子體狀態。這個等離子體源具有高度的均勻性,為得到的塗層在整個基板上提供了一致的層厚度。此外,HWDP腔室設計消除了冷卻的需要,允許更高的溫度控制,以改善層密度。在整個腔室中使用溫度傳感器還可以實現精確的溫度控制,以改善層的均勻性和性能控制。APPLICED MATERIALS Centura Ultima HDP CVD反應堆也被設計為促進高通量性能。加工室設計為在低壓下運行,允許前體和過程控制氣體的高流量。可以利用這種高吞吐量最大限度地提高產量和產量,同時保持最高級別的工藝和質量控制。Centura Ultima HDP CVD是各種CVD應用的絕佳工具。從制造半導體封裝的高密度層到生物醫學材料和納米技術,這種反應器的特點是能夠促進塗層的沈積,提高了均勻性和可重復性。這種反應器非常適合需要精確控制層厚度、溫度和均勻性的應用,能夠為最先進的技術沈積HDP層。
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