二手 AMAT / APPLIED MATERIALS Centura Ultima HDP CVD #62203 待售
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ID: 62203
晶圓大小: 8"
優質的: 2000
Etcher, 8"
(2) Ultima chamber
(1) Ultima plus chamber
Technology :IMD
Wafer Size : 8"
Wafer Shape : SNNF (Semi Notch No Flat)
Software Version : B4.3.14
CHAMBER TYPE AND LOCATION
Ch A : Ultima HDP-CVD
Ch B : Ultima HDP-CVD
Ch C : Ultima + HDP-CVD
Ch E : Multislot Cool Down
Ch F : Orientor
CHAMBER A,B Ultima HDP-CVD :
Nozzle : Long/Long Side
Clean Gas Distribution : Baffle
Turbo Pump : Ebara ET1600WS w/ HVA
Wafer Temperature Monitoring : Yes
Top Gas Feed : Without Top O2
Dual Independent He Control : Standard 10/10 TORR
Clean Method : Microwave
CHAMBER C - Ultima + HDP-CVD :
Nozzle : Long/Long Side
Clean Gas Distribution : Baffle
Turbo Pump : Ebara ET1600WS w/ HVA
Wafer Temperature Monitoring : Yes
Top Gas Feed : Without Top O2
Dual Independent He Control : Standard 10/10 TORR
Clean Method : Top Mount
EXISTING ELECTRICAL REQUIREMENTS
Line Frequency : 60Hz
Line Voltage : 200/208V
Line Amperage : 600A Platform
EXISTING SAFETY EQUIPMENT :
EMO type : Turn to release EMO
EMO Guard Ring : Yes
System Labels : English w/Chinese Non-simplified
System Smoke Detector : Controller
EXISTING MAINFRAME :
Mainframe Type : Ultima HDP w/Multislot
Frame Type : Standard Frame
System Placement : Through the Wall
Mainframe Skins : No
Mainframe Exhaust Duct : No
Mainframe Facilities Connection : Back
Robot Type : HP Robot
Robot Blade : Ceramic
Loadlock Cassette : Narrow Body
Narrow body Loadlocks : Cassette Present Sensor
Loadlock Wafer Mapping : Basic
N2 Purge Type : STEC 4400MC 10 Ra Max
EXISTING GAS DELIVERY :
Gas Panel Surface Finish : Standard Gas Panel
MFC Type : STEC 4400MC 10 Ra Max
Valves : Fujikin 5 Ra Max
Filters : Pall Ni 10 Ra Max
Transducers : MKS w/ Display
Regulators : Veriflo
System Cabinet Exhaust : Top
Gas Panel Gas/Flow Direction Labels : Yes
APC Seriplex Cover : Yes
Gas Panel Doors : Solid
Gas Pallet Configuration :
Chamber A, B, C
Gas Stick/Process Gas/MFC size/Regulator/Transducer
#1 SiF4 100 Y Y
#2 O2 400 Y Y
#3 SiH4 200 Y Y
#4 Ar 300 Y Y
#5 SiH4 20 Y Y
#6 Ar 50 Y Y
#7 NF3 2000 Y Y
#8 Ar 2000 Y Y
REMOTES :
RF Generator Rack - Ultima Gen. Rack
ASTEX 80S09mW (3)
Quantity : Two
Ultima Stand-Alone RF Generator Rack : Yes
Generator Rack Cooling - RF Gen Rack Manifold with Quick Disconnect Ultima Gen Rack H20 Connection - Barbed Brass
Existing Heat Exchanger : SMC Thermo
Umbilicals :
System Controller Signal Cable Length : 55ft
RF Gen Rack Cable Length : 50ft
Ultima Stand-Alone Generator Rack : 98 ft
HX Hose Length : 50ft
HX Cable Length : 50ft
Pump Cable : 50ft
Ultima Microwave Generator Cable Length : 50 ft
Ultima WTM Cable Length : 32.8 ft (10m)
Vacuum Pumps, Exhaust Scrubber not included in sale
Currently crated and stored
System Can be inspected
1999-2000 vintage.
AMAT/APPLIED MATERIALS Centura Ultima HDP CVD是一種化學氣相沈積(CVD)反應器,具有專有的熱壁輸送等離子體(HWDP)處理室。這種反應堆是專門為便利化學氣相沈積一系列具有優化的熱均勻性和等離子體均勻性的材料而設計的。反應堆使用化學前體在金屬、矽或陶瓷等基板上創建材料層。該反應器能夠產生難以置信的高密度等離子體輔助沈積(HDP)薄保形層,是從半導體封裝和先進互連到生物醫學和納米技術相關應用的理想工具。AMAT Centura Ultima HDP CVD反應堆設計為在CVD過程中提供最大的均勻性和可重復性。HWDP處理室的設計允許前體的精確蒸發,這些前體在與熱等離子體源接觸時轉化為等離子體狀態。這個等離子體源具有高度的均勻性,為得到的塗層在整個基板上提供了一致的層厚度。此外,HWDP腔室設計消除了冷卻的需要,允許更高的溫度控制,以改善層密度。在整個腔室中使用溫度傳感器還可以實現精確的溫度控制,以改善層的均勻性和性能控制。APPLICED MATERIALS Centura Ultima HDP CVD反應堆也被設計為促進高通量性能。加工室設計為在低壓下運行,允許前體和過程控制氣體的高流量。可以利用這種高吞吐量最大限度地提高產量和產量,同時保持最高級別的工藝和質量控制。Centura Ultima HDP CVD是各種CVD應用的絕佳工具。從制造半導體封裝的高密度層到生物醫學材料和納米技術,這種反應器的特點是能夠促進塗層的沈積,提高了均勻性和可重復性。這種反應器非常適合需要精確控制層厚度、溫度和均勻性的應用,能夠為最先進的技術沈積HDP層。
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