二手 AMAT / APPLIED MATERIALS Centura Ultima HDP #9223731 待售

ID: 9223731
晶圓大小: 8"
優質的: 2001
CVD System, 8" System general: Mainframe: Centura 5200 DCVD Wafer type: Notch Chamber position A, B, C: HDP Ultima plus chamber, 8" Chamber E position: Multi-slot cool down chamber Chamber F position: Wafer orienter chamber System controllers: SBC V452 Board VGA Board P3 Board Facility and safety configurations: EMO Switch type: Turn to release EMO EMO Guard ring EMO Shunt trip Bracket standoff adapter Water and smoke detect output: Alarm Facility power indicator System water leak detector Main frame: Facilities type: Phase II System placement: Stand alone Front panel: Steel white polymer finish Facilities connection: VCR Facilities orientation: Mainframe facilities bottom connection Facilities water: Phase II water Controller IO interface option: I/O Expansion base card with seriplex gas panel card Interface: GEM Interface Load lock chamber type: Narrow body Transfer chamber: Transfer chamber manual lid lift Transfer chamber sensor Process chamber slit valve A, B, C: Bonded door with KALREZ O'ring Robot type: HP+ Robot (Dual speed) Basic wafer on blade detector N2 Purge MFC type: Unit instrument (UFC-1661) 1L Buffer purge slow vent flow: 500 sccm Dedicated transfer rough pump: EDWARDS Pump interface Mainframe inert gas lines: Chamber N2 supply Chambers N2 surface finish: 10 Ra Mainframe N2 supply Mainframes N2 surface finish: 10 Ra Chamber A configuration: Type: HDP Ultima plus chamber Frequency type: Top, side and bias RF Heater type: 0190-46458 Thermalogic board Manometer type: DUAL 10/100 TORR MKS Throttle valve: Turbo throttle valve plus rough throttle valve Gate valve type: 3870-04276, Pendulum ISO250 (Actuator 52.3) Turbo pump type: EBARA ET1600W Turbo pump controller: 1604W Turbo pump ring type: 0010-11762, CTR Ring assy, HDP-CVD Ultima plus Chamber O'ring type: KALREZ 9100 Clean method: RPS 0190-26744, MKS Astroni AX7670 Clean gas: NF3 Chamber A process kit: 0010-03090 ESC Cathode (WTM Type) 0040-18219 ESC (WTM Type) 0190-18430 WTM Probe 0200-18109 Collar 0200-18081 Cover ceramic 0200-01009 Top nozzle 0200-18093 Side nozzle 0200-01006 Dome 0040-04650 Gas ring with (24) nozzles 0200-40156 Lift pin ceramic Chamber B configuration: Type: HDP Ultima plus chamber Frequency type: Top, side and bias RF Heater type: 0190-46458 Thermalogic board Manometer type: Dual 10/100 TORR MKS Throttle valve: Turbo throttle valve plus rough throttle valve Gate valve type 3870-04276, Pendulum ISO250 Actuator 52.3 Turbo pump type: EBARA ET1600W Turbo pump controller: 1606W TF Turbo pump ring type: 0010-11762, CTR Ring assy, HDP-CVD Ultima plus Chamber o ring type: KALREZ 9100 Clean method: RPS 0190-26744RPS, MKS Astroni AX7670 Clean gas: NF3 EDWARDS Rough pump interface 0010-03090 ESC Cathode (WTM Type) 0040-18219 ESC (WTM Type) 0190-18430 WTM Probe 0200-18109 Collar 0200-18081 Cover ceramic 0200-01009 Top nozzle 0200-18093 Side nozzle 0200-01006 Dome 0040-04650 Gas ring with (24) nozzles 0200-40156 Lift pin ceramic Gas panel configurations: Gas panel type: HP 10 Ra Cabinet exhaust: Top exhaust Gas panel door Gas feed: Single-line drop (Bottom feed) Valve type: FUJIKIN 5 Ra max Filter: MILLIPORE Ni 10 ra max Fitting: VCR MFC: SEC-4400 MC (D-Sub 9 pins) Veriflo Regulator MKS Transducer with display unit Gas line configuration chamber A, B, C: Gas pallet: HDP Ultima plus Gas feed: Single-line drop (Bottom feed) Automatic gas line purging capability Gas 1: SiH4, 200 sccm Gas 2: NF3, 2000 sccm Gas 3: SiH4 Top, 20 sccm Gas 4: SIF4, 20 sccm Gas 5: AR Top, 50 sccm Gas 6: AR, 300 sccm Gas 7: HE, 200 sccm Gas 8: SIF4, 100 sccm Gas 9: O2, 400 sccm Gas 10: AR-MW, 2000 sccm System controller: Controller Type: Phase I Controller Controller GFCI: 30MA GFCI Controller UPS: Facilities ups interface Controller electrical interface: Top feed AC cables Controller exhaust: Top exhaust Cursor type: Blinking cursor Heat exchanger type: SMC Themo chiller, INR-498-001D Heat exchanger water fittings: Stainless steel Generator rack: Chamber A, B, and C top RF generator: ENI NOVA-50A Chamber A, B and C side RF generator: ENI NOVA-50A Chamber A, B and C bias RF generator: ENI GHW-50A Power: 200/208 VAC, 50 Hz, 400 A 2001 vintage.
AMAT/APPLIED MATERIALS Centura Ultima HDP Reactor是幹式就地蝕刻和保形塗層領域的先進工具。該設備的設計使制造商能夠以最小的努力和最小的復雜性實現高精度。HDP代表高密度等離子體,這是一種最新的等離子體技術,旨在對各種過程提供最高級別的性能和周期控制。AMAT Centura Ultima HDP反應堆滿足了全球半導體制造商日益復雜的需求。該系統的高級功能和模塊化體系結構為各種應用程序提供了快速實施、靈活性和可擴展性。這包括了纖薄的保形塗層、深反應性離子蝕刻(DRIE)、電鍍銅升空(ECLO)等應用。應用材料CENTURA ULTIMA+HDP反應堆通過優化的吞吐量和周期控制提供了高水平的生產率。其多頻射頻等離子體源和水冷陰極可實現較小的特征尺寸控制和較低的薄膜應力,而線性質量流控制器則可實現對過程氣體的精確控制。它的模塊化體系結構使它能夠以最小的幹擾重新配置,並配置在多個機房中,從而能夠快速、準確地並行處理眾多部件。HDP反應堆采用等離子體源技術的最新進展,以優化蝕刻和保形塗層工藝。其全新設計的等離子體源和腔室允許高長寬比蝕刻和塗層。HDP反應堆的高級過程控制功能有助於實現嚴格的過程分布,從而減少了操作員手動調整的需要。該單位的實時過程監控允許快速決策和快速糾正行動。該機集成了智能診斷功能,可實現快速錯誤反饋和最小停機時間。它的在線模擬功能使用戶能夠快速調整配方並進行必要的更改,而無需長時間設置。此外,其數據輸出可用於記錄相關流程細節和提高流程監控能力。AMAT/APPLIED MATERIALS CENTURA ULTIMA+HDP Reactor是世界上最新型、最先進的幹版蝕刻和保形塗層工具。該工具專為尋求具有高精度和重復性的可靠高效資產的半導體制造商而設計。它的高級功能和模塊化體系結構實現了快速的實施和可擴展性,使其能夠以最小的中斷進行重新配置,並配置在多個機房中,以涵蓋各種應用程序。AMAT CENTURA ULTIMA+HDP Reactor提供了高水平的生產力,並配備了等離子源技術的最新進步,讓用戶達到復雜工藝所需的精度。
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