二手 AMAT / APPLIED MATERIALS Centura Ultima X #9107256 待售
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ID: 9107256
晶圓大小: 12"
優質的: 2003
CVD System, 12"
Wafer Shape JMF
Position A ULTIMA X HDP-CVD
Position B ULTIMA X HDP-CVD
Position C ULTIMA X HDP-CVD
Position D NA
Position A Process OXIDE - USG / STI
Position B Process OXIDE - USG / STI
Position C Process OXIDE - USG / STI
Position D Process NA
Line Voltage 208 VAC
Line Amperage PRIMARY 320A, SECONDARY 240A
(A) ULTIMA X HDP-CVD
Ultima X Chamber Options Selected Option
Integrated Process Module IPM : YES
Turbo Pump TMP-3203LMC-A1
Nozzle Type
Gas Ring 36 PORT
Top Baffle
Upper Chamber ENHANCED
Process Application USG / STI
Process Kit STANDARD
Clean Method NPP RPS (NEW POWER PLASMA)
Independent Helium Cooling ENABLED
(B) - (Z7) ULTIMA X HDP-CVD
Ultima X Chamber Options Selected Option
Integrated Process Module IPM : YES
Turbo Pump TMP-3203LMC-A1
Nozzle Type
Gas Ring 36 PORT
Top Baffle
Upper Chamber ENHANCED
Process Application USG / STI
Process Kit STANDARD
Clean Method NPP RPS (NEW POWER PLASMA)
Independent Helium Cooling ENABLED
(C) - (Z7) ULTIMA X HDP-CVD
Ultima X Chamber Options Selected Option
Integrated Process Module IPM : YES
Turbo Pump TMP-H3603LMC-A1
Nozzle Type
Gas Ring 36 PORT
Top Baffle
Upper Chamber ENHANCED
Process Application USG / STI
Process Kit STANDARD
Clean Method NPP RPS (NEW POWER PLASMA)
Independent Helium Cooling ENABLED
Gas Delivery Options
Gas Panel Selected Option
Gas Feed BOTTOM
Gas Panel Exhaust BOTTOM
MFC Type UNIT 8565 & 8565C
Gas Panel Door STANDARD
Valves VERIFLO
Display Gas Pallets
Gas Lines
Transducers NONE
Regulators NONE
Filters Millipore/Mykrolis/NAS Clean
A - (Z7) ULTIMA X HDP-CVD PALLET Selected Option
Gas Pallet
Line 1 Upper N2 PURGE
Line 1 Lower O2 - 1L
Line 2 H2 (MFC Missing)
Line 3 HE - 600SCCM
Line 4 SiH4 - 400SCCM
Line 5 AR - 1L
Line 6 HE - 600SCCM
Line 7 H2 - 1L
Line 8 SiH4 - 50SCCM
Line 9 AR - 50SCCM
Line 10 NF3 - 400SCCM
Line 11 NF3 - 15SLM
Line 12 Ar - 3L
Line 13 Lower
Line 13 Upper N2 PURGE
Plasma Detect YES
B - (Z7) ULTIMA X HDP-CVD PALLET
Gas Pallet
Line 1 Upper N2 PURGE
Line 1 Lower O2 - 1L
Line 2 H2 (MFC Missing)
Line 3 HE - 600SCCM
Line 4 SiH4 - 400SCCM
Line 5 AR - 1L
Line 6 HE - 600SCCM
Line 7 H2 (MFC Missing)
Line 8 SiH4 - 50SCCM
Line 9 AR - 50SCCM
Line 10 NF3 - 400SCCM
Line 11 NF3 - 15SLM
Line 12 Ar - 10SLM
Line 13 Lower
Line 13 Upper N2 PURGE
Plasma Detect YES
C - (Z7) ULTIMA X HDP-CVD PALLET
Gas Pallet
Line 1 Upper N2 PURGE
Line 1 Lower O2 - 400SCCM
Line 2 NF3 - 400SCCM
Line 3 H2 - 1L
Line 4 SiH4 - 400SCCM
Line 5 HE - 600SCCM
Line 6 AR - 50SCCM
Line 7 H2 - 1L
Line 8 SiH4 - 50SCCM
Line 9 HE - 600SCCM
Line 10 NF3 - 400SCCM
Line 11 NF3 - 15SLM
Line 12 Ar - 3L
Line 13 Lower
Line 13 Upper N2 PURGE
Plasma Detect YES
Mainframe Options
Process Chamber Isolation
CHAMBER A SLIT VALVE
CHAMBER B SLIT VALVE
CHAMBER C SLIT VALVE
Mainframe and FI Alignment MF AND FI ALIGNMENT FIXTURES
CFW Manifold YES
LL and Xfer Ch Vac and Vent
Mainframe Type AP MAINFRAME
SWLL Doors AP STD SWLL DOOR
SWLL Cooldown
Wafer Hoop Type WAFER HOOP
Transfer Chamber Robot Blades
Transfer Chamber Robots STD REACH DUAL BLADE ROBOT
Transfer Chamber Lid CLEAR LID
Factory Interface Options
WIP Delivery Type OHT WIP DELIVERY
Number of Load Ports 2 LOAD PORTS
Atmospheric Robots KAWASAKI 2 FIXED ROBOTS WITH EDGE GRIP(C61D-B001)
Load Port Types ENHANCED 25 WAFER FOUP
E84 Carrier Handoff UPPER E84 INTERFACE ENABLED OHT
OHT Light Curtain LIGHT CURTAIN
Operator Access Switch YES
Configurable Colored Lights YES
Light Towers
Air Intake Systems
Remote Options
Sytem Monitors Selected Option
Monitor 1 FLAT PANEL WITH KEYBOARD ON STAND
Monitor 2
Heat Exchanger Selected Option
Heat Exchanger Type NA
Umbilicals Selected Option
Heat Exchanger Hose Length
Pumps Selected Option
Pump Supplied By NA
Pump Interface Type NA
AC Racks Selected Option
Facilities UPS Interface YES
Chamber Generator Type ENI GENERATOR RACK
SMC HX H2O Connection NA
QIL HX Qty
Ch A RF Generator Type ENI GENERATOR RACK (SPECTRUM B-10513)
Ch B RF Generator Type ENI GENERATOR RACK (SPECTRUM 11002-00)
Ch C RF Generator Type ENI GENERATOR RACK (SPECTRUM 11002-00)
Heat Exchanger Cable Length
Pump Interface Cable Length
Monitor 1 Cables
Monitor 2 Cables
Missing Parts
Turbo Throttle Valve
Ch#B Gas Panel DIO Board
HDD
Currently warehoused
2003 vintage.
AMAT/APPLIED MATERIALS Centura Ultima X是為半導體制造而設計的下一代、高通量、晶圓大小的反應器。它能夠處理多達8英寸的晶圓,並提供廣泛的處理功能,從分層材料到處理溝槽、墊片和互連。該設備旨在滿足半導體行業最先進的制造需求。利用Ultima X平臺,AMAT提供了一個集成的晶圓制造解決方案,具有高級芯片開發項目所需的擴展工藝能力。AMAT Centura Ultima X有兩個晶圓處理室,有一個9千瓦的加工室和一個3千瓦的二級輔助室。這兩個腔室都連接到一個具有高真空密封的通用工藝閥站,並具有一個通用的氣體分配系統來供應工藝氣體。反應堆的氣體分配單元由單一的中央自動化控制器控制,並在整個機器中提供可靠的均勻氣體分配。Ultra X還配備了一個電子隔離閥站,這有助於確保與工藝氣體相關的任何潛在汙染最小化。Ultima X還提供了低溫退火模塊,確保晶片在盡可能低的溫度下進行處理以獲得最佳性能。該工具還可以配置一系列附加功能和附件,包括附加傳感器、濺射目標和等離子體處理室。APPLIED MATERIALS Centura Ultima X是為了與多種爐型設計相容而設計的,包括水平和垂直的熱壁管爐和多級水平冷晶片反應堆。它具有與通用半導體控制系統一致的接口,使其成為一個可以滿足您所有制造需求的多功能集成解決方案。Ultima X還提供了多種高級功能,包括嵌入金屬模塊,該模塊允許您在不需要將晶片暴露於環境中的情況下對其他金屬化層進行分層。此功能還有助於減少周期時間,並使設備制造更加高效和經濟高效。Ultima X的高級控制系統還確保所有晶片的工藝配方和溫度一致。總之,Centura Ultima X是一款先進的高通量半導體制造工具,提供多種工藝功能。Ultima X高度集成的平臺有助於創建可靠的流程,其高級功能縮短了周期時間,並有助於創建具有可靠性能和持久可靠性的經濟高效的晶圓。
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