二手 AMAT / APPLIED MATERIALS Endura 5500 HP #9223524 待售
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ID: 9223524
晶圓大小: 8"
PVD System, 8"
Multi-chamber sputtering system
Process: Copper
Dry pump type: EBARA AA40W (System)
LLA
LLB
(2) Al
(2) Ta PVD
(2) PCII
(2) DG
System controller
SMIF System:
(2) LPT 2200
(2) Load locks
Handler system:
Buffer Hp
Transfer VHp
(2) Hoisters
Process chambers:
(2) ImpTa
(2) ClampAl
(2) PcII
(2) Degas
Main AC
NESLAB Chiller
(3) General racks
(2) Compressors
(4) EBARA Pumps
Chamber 1: B101 IMP Ta
Shutter disk
Body type: WB
Source type: Vectra IMP
Magnet type: RH-2
MFCs: Ar 140sccm
DC Generator: ADVANCED ENERGY MDX-L6
RF Generator:
ADVANCED ENERGY HFV8000 (RF Coil)
COMDEL CX-600S (AC Bias)
RF Match:
HE
BIAS
Vectra IMP
010CAP 2MHz (RF Coil)
13.56 MHz (AC Bias)
Cryo Pump: CTI On-Board 8F
No turbo pump
Chamber 2 & 3: Clamp Al
Body type: WB
Source type: 12.9''
Magnet type: Al A, 12.9''
DC Generator: ADVANCED ENERGY MDX-L12M
MFCs:
Ar 140sccm
Ar-H 70sccm
Cryo pump: CTI On-board 8F
No shutter disk
No RF Generator
No RF Match
No turbo pump
Chamber: 4 B101 IMP Ta
Shutter disk
Body type: WB
Source type: Vectra IMP
Magnet type: RH-2
MFCs: Ar 140 sccm
ADVANCED ENERGY MDX-L6 DC Generator
RF Generator:
ADVANCED ENERGY HFV8000 RF Coil
COMDEL CX-600S AC Bias
RF Match:
HE
BIAS
Vectra IMP
010CAP 2MHz (RF Coil)
13.56MHz (AC Bias)
Cryo pump: CTI On-board 8F
No turbo pump
Chamber A & B: Cool down
Dry pump: EBARA AA20N
Pedestal type: Clncool
Chamber C & D: PCII
Process: Etch
PK Type: PIKII Pinless
Dry pump: EBARA AA20N
Turbo pump: LEYBOLD TMP
RF Generator:
COMDEL CPS1001S 13.56MHz
RFPP LF10A 400KHz
RF Match: PC II 13.56MHz
MFCs:
Ar 28sccm
Ar 420sccm
No DC Generator
No cryo pump
Chamber E & F: O/D
Degas type: Standard
Buffer & Transfer:
Cryo pump: CTI On-board 8F
Robot type: HP
Load lock:
Body type WB
Venting & pumping mode:
Soft slow
Fast
Wafer mapping: Standard
No scrubber / CDO
Heat exchanger: NESLAB III (PVD Chm)
Cryo compressor: Water cooled 9600
CIM Linked.
AMAT/APPLIED MATERIALS Endura 5500 HP Reactor是一種緊湊、自動化的CVD工具,旨在為高級材料應用可靠地進行高精度處理。該反應堆具有無與倫比的速度和精度能力，其微米級精度和長達10分鐘的垂直掃描時間。AMAT Endura 5500 HP配備了一個設計強大的腔室,非常適合大批量作業和最復雜的作業。它利用雙頻等離子體在廣泛的工藝條件下實現優化沈積能力。雙引擎、高性能射頻動力模塊、多個獨立沈積源和可調腔室溫度為最先進的應用提供了一套高度可重復的工藝參數。Endura的突出功能包括強大的控制和自動化功能。它有一個先進的機器人手臂，帶有集成的端效應器，使它能夠精確控制晶圓載體通過腔室的軌跡。Endura還提供了一個用戶友好的Graphical User Interface系統,該系統允許快速更改參數和實時監控流程。機動室元件，如機械手臂、石英室和氣體輸送系統，使APPLIED MATERIALS Endura 5500 HP可以無限調整超精確薄膜功能。該反應堆可用於使用有機金屬試劑的沈積過程，如基於臭氧的過程，以及使用固相前體的沈積過程。Endura 5500 HP旨在提供卓越的可靠性和性能。它的高級功能提供靈活的流程開發功能,包括流程分析、診斷、遠程監視和數據日誌記錄。反應堆還具有各種安全功能，以保護操作員和系統本身免受潛在危害。AMAT/APPLIED MATERIALS Endura 5500 HP是一種高效可靠的反應堆，可以處理最具挑戰性的沈積應用。它是先進材料應用的理想選擇，允許以前所未有的產量生產高質量的薄膜和表面。
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