二手 AMAT / APPLIED MATERIALS Endura 5500 #166248 待售
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ID: 166248
Sputtering system, 8"
Process: AlCu / TiN / Ti
Specifications:
Robot:
Buffer: AMAT HP, ceramic blade
Transfer: AMAT HP, metal blade
System monitor:
1: stand alone
2: through the wall
3: stand alone
(1) each monitor rack
Load lock:
Narrow body with tits in and out
No sliding sensor kit
Chamber A
- Chamber type: Pass through
- Chamber Lid: Metal Lid
- Cooling method: NA
Chamber B
- Chamber type: Cool down
- Chamber Lid: Metal lid
- Cooling method: By PCW
Chamber C
- Chamber type: N/A
- Chamber process:
- RF Gen/DC power supply
- Turbo pump:
- Process gas
Chamber D
- Chamber type: Preclean I
- Chamber process:
- RF Gen/DC power supply1:
- RF Gen/DC power supply2:
- Turbo pump
Chamber F:
- Chamber type: Orient/Degas
Chamber 1
- Chamber type: Standard body
- Chamber process: AlCu, Preheat
- Process kit type/items/material: UNKNOWN
- RF Gen/DC power supply1: AE, MDX-10K SLAVE
- RF Gen/DC power supply2: A, MDX-20K MASTER
- Chamber pump: CTI CRYO 8F 2phase
- Source (Lid) type: P/N 0010-20059
- Pedestal type: A101 HEATER, Lifter : P/N 0010-20300
- Process gas: Ar, N2
Chamber 2
- Chamber type: Wide Body
- Chamber process: TiN
- Process kit type/items/material: UNKNOWN
- RF Gen/DC power supply1: AE, MDX-10K MASTER
- RF Gen/DC power supply2: N/A
- Chamber pump: : CTI CRYO 8F 2phase
- Source(Lid) type : P/N 0010-20059
- Pedestal type: A101 HEATER, Lifter : P/N 0010-20300
- Process gas: Ar, N2
Chamber 3
- Chamber type: Wide Body
- Chamber process: Ti
- Process kit type/items/material: UNKNOWN
- RF Gen/DC power supply1: AE, MDX-10K MASTER
- RF Gen/DC power supply2: N/A
- Chamber pump: CTI CRYO 8F 2phase
- Source (Lid) type: P/N 0010-70059
- Pedestal type: A101 HEATER, Lifter : P/N 0010-20300
- Process gas: Ar, N2
Chamber 4
- Chamber type: Wide body
- Chamber process: Ti, Preheat
- Process kit type/items/material: UNKNOWN
- RF Gen/DC power supply1: AE MDX-10K MASTER
- RF Gen/DC power supply2: N/A
- Chamber pump: CTI CRYO 8F 2phase
- Source (Lid) type: P/N 0010-20059
- Pedestal type: A101 HEATER, Lifter : P/N 0010-20300
- Process gas: Ar, N2
Includes:
- Heat exchanger type: Neslab III 1ea
- Compressor type: CTI 8500 2ea
- EMO on source cover : No
- Shutter : No
- SBC : V440
- KSI Shild Treatment DC Power Supply 1ea
- AE, MDX-052, SHILD TREATMENT CONTROLLER
- COMDEL, CPS-1001 RF POWER SOURCE 60.00Hz
- 15V P.S. ASSEMBLY / 24V P.S. ASSEMBLY
Installed
1994 vintage.
AKT/AMAT/APPLICED MATERIALS/AKT Endura 5500反應堆是為滿足現代半導體器件制造商的需求而設計的下一代等離子蝕刻設備。該反應堆系統能夠為各種先進的CMOS、3D NAND和DRAM存儲器和邏輯設備提供精確的蝕刻過程。AKT Endura 5500采用專有集成噴嘴和高密度等離子體源,可提供出色的蝕刻速率、大晶圓區域的高均勻性以及快速腔室循環以提高吞吐量。AMAT ENDURA 5500配有強大的真空泵單元和較高的動力壓力,便於從工藝室內快速清除排氣材料。該機配備了最新的等離子體源和分布技術,允許用戶實時調整蝕刻參數,微調蝕刻結果,最大限度地減少加工過程中對細膩表面的損傷。該工具的塑料外殼旨在抑制聲響,保護資產的精密部件免受振動和電磁幹擾。它還包含一個集成的氣體輸送模型和散裝氣體供應,允許精確輸送和控制多個蝕刻氣體。APPLIED MATERIALS ENDURA 5500配備了可配置的工作站和控制器,允許用戶根據材料或產品要求存儲、召回和調整蝕刻配方。其他功能包括多流程功能、手動/自動流控制、可配置的批處理參數、診斷和報告。AMAT Endura 5500專為在Class 1 Clean Room環境中進行清潔操作而設計,它具有多種靈活操作配置,包括手動/遠程/控制臺操作。這種反應堆設備的制造達到了最高質量標準,提供了可靠和可重復的結果。它在一個靈活的平臺上提高了產量、吞吐量和操作經濟性。
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