二手 AMAT / APPLIED MATERIALS Endura 5500 #166249 待售
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ID: 166249
優質的: 1993
Sputtering system, 8"
Wafer size: 8" flat (not notch)
Configuration:
Chamber 1: AlCu
Chamber 2: TiN
Chamber 3: Ti
Chamber 4: Ti
Preheat
Etch
Clean bench
Clamp (not electrostatic chuck)
Robot:
Buffer: AMAT HP, ceramic blade
Transfer: AMAT HP, metal blade
System monitor:
1: stand alone
2: through the wall
3: stand alone
(1) each monitor rack
Load lock:
Narrow body with tits in and out
No sliding sensor kit
Chamber A
- Chamber type: Pass through
- Chamber Lid: Metal Lid
- Cooling method: NA
Chamber B
- Chamber type: Cool down
- Chamber Lid: Metal lid
- Cooling method: By PCW
Chamber D
- Chamber type: Preclean I
- Chamber process:
- RF Gen/DC power supply1:
- RF Gen/DC power supply2:
- Turbo pump
Chamber F:
- Chamber type: Orient/Degas
Chamber 1
- Chamber type: Standard body
- Chamber process: AlCu, Preheat
- Process kit type/items/material: UNKNOWN
- RF Gen/DC power supply1: AE, MDX-10K SLAVE
- RF Gen/DC power supply2: A, MDX-20K MASTER
- Chamber pump: CTI CRYO 8F 2phase
- Source (Lid) type: P/N 0010-70086
- Pedestal type: A101 HEATER, Lifter : P/N 0010-20300
- Process gas: Ar, N2
Chamber 2
- Chamber type: Wide Body
- Chamber process: TiN
- Process kit type/items/material: UNKNOWN
- RF Gen/DC power supply1: AE, MDX-10K MASTER
- RF Gen/DC power supply2: N/A
- Chamber pump: : CTI CRYO 8F 2phase
- Source(Lid) type : UNIDENTIFIED
- Pedestal type: A101 HEATER, Lifter : P/N 0010-20300
- Process gas: Ar, N2
Chamber 3
- Chamber type: Wide Body
- Chamber process: Ti
- Process kit type/items/material: UNKNOWN
- RF Gen/DC power supply1: AE, MDX-10K MASTER
- RF Gen/DC power supply2: N/A
- Chamber pump: CTI CRYO 8F 2phase
- Source (Lid) type: UNIDENTIFIED
- Pedestal type: A101 HEATER, Lifter : P/N 0010-20300
- Process gas: Ar, N2
Chamber 4
- Chamber type: Wide body
- Chamber process: Ti, Preheat
- Process kit type/items/material: UNKNOWN
- RF Gen/DC power supply1: AE MDX-10K MASTER
- RF Gen/DC power supply2: N/A
- Chamber pump: CTI CRYO 8F 2phase
- Source (Lid) type: UNIDENTIFIED
- Pedestal type: A101 HEATER, Lifter : P/N 0010-20300
- Process gas: Ar, N2
Includes:
- Heat exchanger type: Neslab III 1ea
- Compressor type: CTI 8500 2ea
- EMO on source cover : No
- Shutter : No
- SBC : V440
- KSI Shild Treatment DC Power Supply 1ea
- AE, MDX-052, SHILD TREATMENT CONTROLLER
- COMDEL, CPS-1001 RF POWER SOURCE 60.00Hz
- 15V P.S. ASSEMBLY / 24V P.S. ASSEMBLY
- 2Board MISC. on MASS STROAGE BOARD
Includes pumps
Installed
1994 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一種等離子體蝕刻反應器,設計用於高精度加工和生產精細微電子元件。AKT Endura 5500是一種全封閉設備,由一個工藝室、一個外部真空泵和一些其他外圍部件組成。該系統旨在提供可靠、一致的工藝結果,非常適合蝕刻、制圖和其他精密的微電子加工需要。AMAT ENDURA 5500的製程室是一個鋁圓頂的外殼,內襯陶瓷窗口,以保護內部的製程元件。反應堆使用各種氣體和能源來創建和定義錯綜復雜的模式。氣瓶或歧管可以連接到腔室,視應用情況而定,並提供反應化學,按照可編程控制器的指示與表面材料相互作用。還安裝了電磁場發生器,為過程控制提供必要的離子能。ENDURA 5500允許可調壓力、流量和溫度控制設置,由反應性氣體閥和腔室熱電偶管理。壓力由兩級外部真空泵維持,啟動時自動除氣。這樣可以確保在生產開始之前,工藝室沒有任何雜質.除了控制外,AMAT/APPLIED MATERIALS/AKT ENDURA 5500還為操作員提供先進的監測和診斷工具,以確保最大限度的生產力。其中包括實時數據顯示、壓力監視器和可設置用於管理流程持續時間的精確計時器。此外,該裝置還具有超壓和過熱防護等內置安全功能。這確保了最高質量的產品和高效的生產率。Endura 5500以可靠性著稱,一貫提供高品質的蝕刻效果。這使得它成為各種微電子加工需求的理想選擇。其可調的控制、診斷工具和內置的安全功能也確保了機器高效,並呈現出優異的效果。
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