二手 AMAT / APPLIED MATERIALS Endura 5500 #166249 待售

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ID: 166249
優質的: 1993
Sputtering system, 8" Wafer size: 8" flat (not notch) Configuration: Chamber 1: AlCu Chamber 2: TiN Chamber 3: Ti Chamber 4: Ti Preheat Etch Clean bench Clamp (not electrostatic chuck) Robot: Buffer: AMAT HP, ceramic blade Transfer: AMAT HP, metal blade System monitor: 1: stand alone 2: through the wall 3: stand alone (1) each monitor rack Load lock: Narrow body with tits in and out No sliding sensor kit Chamber A - Chamber type: Pass through - Chamber Lid: Metal Lid - Cooling method: NA Chamber B - Chamber type: Cool down - Chamber Lid: Metal lid - Cooling method: By PCW Chamber D - Chamber type: Preclean I - Chamber process: - RF Gen/DC power supply1: - RF Gen/DC power supply2: - Turbo pump Chamber F: - Chamber type: Orient/Degas Chamber 1 - Chamber type: Standard body - Chamber process: AlCu, Preheat - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K SLAVE - RF Gen/DC power supply2: A, MDX-20K MASTER - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: P/N 0010-70086 - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 2 - Chamber type: Wide Body - Chamber process: TiN - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: : CTI CRYO 8F 2phase - Source(Lid) type : UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 3 - Chamber type: Wide Body - Chamber process: Ti - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 4 - Chamber type: Wide body - Chamber process: Ti, Preheat - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Includes: - Heat exchanger type: Neslab III 1ea - Compressor type: CTI 8500 2ea - EMO on source cover : No - Shutter : No - SBC : V440 - KSI Shild Treatment DC Power Supply 1ea - AE, MDX-052, SHILD TREATMENT CONTROLLER - COMDEL, CPS-1001 RF POWER SOURCE 60.00Hz - 15V P.S. ASSEMBLY / 24V P.S. ASSEMBLY - 2Board MISC. on MASS STROAGE BOARD Includes pumps Installed 1994 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一種等離子體蝕刻反應器,設計用於高精度加工和生產精細微電子元件。AKT Endura 5500是一種全封閉設備,由一個工藝室、一個外部真空泵和一些其他外圍部件組成。該系統旨在提供可靠、一致的工藝結果,非常適合蝕刻、制圖和其他精密的微電子加工需要。AMAT ENDURA 5500的製程室是一個鋁圓頂的外殼,內襯陶瓷窗口,以保護內部的製程元件。反應堆使用各種氣體和能源來創建和定義錯綜復雜的模式。氣瓶或歧管可以連接到腔室,視應用情況而定,並提供反應化學,按照可編程控制器的指示與表面材料相互作用。還安裝了電磁場發生器,為過程控制提供必要的離子能。ENDURA 5500允許可調壓力、流量和溫度控制設置,由反應性氣體閥和腔室熱電偶管理。壓力由兩級外部真空泵維持,啟動時自動除氣。這樣可以確保在生產開始之前,工藝室沒有任何雜質.除了控制外,AMAT/APPLIED MATERIALS/AKT ENDURA 5500還為操作員提供先進的監測和診斷工具,以確保最大限度的生產力。其中包括實時數據顯示、壓力監視器和可設置用於管理流程持續時間的精確計時器。此外,該裝置還具有超壓和過熱防護等內置安全功能。這確保了最高質量的產品和高效的生產率。Endura 5500以可靠性著稱,一貫提供高品質的蝕刻效果。這使得它成為各種微電子加工需求的理想選擇。其可調的控制、診斷工具和內置的安全功能也確保了機器高效,並呈現出優異的效果。
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